JPS55500707A - - Google Patents
Info
- Publication number
- JPS55500707A JPS55500707A JP50159179A JP50159179A JPS55500707A JP S55500707 A JPS55500707 A JP S55500707A JP 50159179 A JP50159179 A JP 50159179A JP 50159179 A JP50159179 A JP 50159179A JP S55500707 A JPS55500707 A JP S55500707A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US05/941,776 US4171489A (en) | 1978-09-13 | 1978-09-13 | Radiation mask structure |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS55500707A true JPS55500707A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1980-09-25 |
| JPH0225247B2 JPH0225247B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1990-06-01 |
Family
ID=25477045
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP54501591A Expired - Lifetime JPH0225247B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1978-09-13 | 1979-09-06 |
Country Status (6)
Families Citing this family (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4253029A (en) * | 1979-05-23 | 1981-02-24 | Bell Telephone Laboratories, Incorporated | Mask structure for x-ray lithography |
| JPS5610928A (en) * | 1979-07-07 | 1981-02-03 | Shinetsu Sekiei Kk | Preparation of electronic device |
| AT371947B (de) * | 1979-12-27 | 1983-08-10 | Rudolf Sacher Ges M B H | Freitragende maske, verfahren zur herstellung derselben und verfahren zum maskieren von substraten |
| DE3119682A1 (de) * | 1981-05-18 | 1982-12-02 | Philips Patentverwaltung Gmbh, 2000 Hamburg | "verfahren zur herstellung einer maske fuer die mustererzeugung in lackschichten mittels strahlungslithographie" |
| US4522842A (en) * | 1982-09-09 | 1985-06-11 | At&T Bell Laboratories | Boron nitride X-ray masks with controlled stress |
| DE3435177A1 (de) * | 1983-09-26 | 1985-04-11 | Canon K.K., Tokio/Tokyo | Maske fuer lithographische zwecke |
| US5112707A (en) * | 1983-09-26 | 1992-05-12 | Canon Kabushiki Kaisha | Mask structure for lithography |
| US4632871A (en) * | 1984-02-16 | 1986-12-30 | Varian Associates, Inc. | Anodic bonding method and apparatus for X-ray masks |
| US4539278A (en) * | 1984-03-12 | 1985-09-03 | Eaton Corporation | Mask structure for X-ray lithography and method for making same |
| DE3524196C3 (de) * | 1984-07-06 | 1994-08-04 | Canon Kk | Lithografiemaske |
| US4668336A (en) * | 1985-07-23 | 1987-05-26 | Micronix Corporation | Process for making a mask used in x-ray photolithography |
| US4608268A (en) * | 1985-07-23 | 1986-08-26 | Micronix Corporation | Process for making a mask used in x-ray photolithography |
| US4708919A (en) * | 1985-08-02 | 1987-11-24 | Micronix Corporation | Process for manufacturing a mask for use in X-ray photolithography using a monolithic support and resulting structure |
| EP0260718B1 (en) * | 1986-09-19 | 1992-08-05 | Fujitsu Limited | An x-ray-transparent membrane and its production method |
| JPS63114124A (ja) * | 1986-10-31 | 1988-05-19 | Res Dev Corp Of Japan | Ｘ線マスク用メンブレンおよび製造法 |
| US4868093A (en) * | 1987-05-01 | 1989-09-19 | American Telephone And Telegraph Company, At&T Bell Laboratories | Device fabrication by X-ray lithography utilizing stable boron nitride mask |
| JP4220229B2 (ja) * | 2002-12-16 | 2009-02-04 | 大日本印刷株式会社 | 荷電粒子線露光用マスクブランクスおよび荷電粒子線露光用マスクの製造方法 |
| US9231063B2 (en) | 2014-02-24 | 2016-01-05 | International Business Machines Corporation | Boron rich nitride cap for total ionizing dose mitigation in SOI devices |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS50120270A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1974-02-15 | 1975-09-20 | ||
| JPS52105777A (en) * | 1976-03-02 | 1977-09-05 | Toshiba Corp | Microscopic diagram transcribing device |
| JPS52149979A (en) * | 1976-06-08 | 1977-12-13 | Western Electric Co | Mask structure for xxray lithography and method of manufacture thereof |
| JPS52153673A (en) * | 1976-06-15 | 1977-12-20 | Siemens Ag | Method of manufacturing mask for xxray lithography |
| JPS5329574A (en) * | 1976-08-31 | 1978-03-18 | Oki Electric Ind Co Ltd | Transmitting type photoelectric switch |
| JPS5385170A (en) * | 1977-01-05 | 1978-07-27 | Hitachi Ltd | Soft x-ray transfer mask |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3742229A (en) * | 1972-06-29 | 1973-06-26 | Massachusetts Inst Technology | Soft x-ray mask alignment system |
| US3742230A (en) * | 1972-06-29 | 1973-06-26 | Massachusetts Inst Technology | Soft x-ray mask support substrate |
| US3873824A (en) * | 1973-10-01 | 1975-03-25 | Texas Instruments Inc | X-ray lithography mask |
-
1978
- 1978-09-13 US US05/941,776 patent/US4171489A/en not_active Expired - Lifetime
-
1979
- 1979-09-06 WO PCT/US1979/000692 patent/WO1980000634A1/en unknown
- 1979-09-06 JP JP54501591A patent/JPH0225247B2/ja not_active Expired - Lifetime
- 1979-09-06 DE DE7979901255T patent/DE2965853D1/de not_active Expired
- 1979-09-11 CA CA335,415A patent/CA1129635A/en not_active Expired
-
1980
- 1980-04-09 EP EP79901255A patent/EP0020455B1/en not_active Expired
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS50120270A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1974-02-15 | 1975-09-20 | ||
| JPS52105777A (en) * | 1976-03-02 | 1977-09-05 | Toshiba Corp | Microscopic diagram transcribing device |
| JPS52149979A (en) * | 1976-06-08 | 1977-12-13 | Western Electric Co | Mask structure for xxray lithography and method of manufacture thereof |
| JPS52153673A (en) * | 1976-06-15 | 1977-12-20 | Siemens Ag | Method of manufacturing mask for xxray lithography |
| JPS5329574A (en) * | 1976-08-31 | 1978-03-18 | Oki Electric Ind Co Ltd | Transmitting type photoelectric switch |
| JPS5385170A (en) * | 1977-01-05 | 1978-07-27 | Hitachi Ltd | Soft x-ray transfer mask |
Also Published As
| Publication number | Publication date |
|---|---|
| DE2965853D1 (en) | 1983-08-18 |
| EP0020455B1 (en) | 1983-07-13 |
| EP0020455A4 (en) | 1981-09-01 |
| WO1980000634A1 (en) | 1980-04-03 |
| EP0020455A1 (en) | 1981-01-07 |
| US4171489A (en) | 1979-10-16 |
| JPH0225247B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1990-06-01 |
| CA1129635A (en) | 1982-08-17 |