JPS55500108A - - Google Patents
Info
- Publication number
- JPS55500108A JPS55500108A JP50048779A JP50048779A JPS55500108A JP S55500108 A JPS55500108 A JP S55500108A JP 50048779 A JP50048779 A JP 50048779A JP 50048779 A JP50048779 A JP 50048779A JP S55500108 A JPS55500108 A JP S55500108A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/302—Controlling tubes by external information, e.g. programme control
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/3002—Details
- H01J37/3007—Electron or ion-optical systems
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Beam Exposure (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US05/879,097 US4167676A (en) | 1978-02-21 | 1978-02-21 | Variable-spot scanning in an electron beam exposure system |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS55500108A true JPS55500108A (ja) | 1980-02-21 |
Family
ID=25373436
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP50048779A Pending JPS55500108A (ja) | 1978-02-21 | 1979-02-14 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US4167676A (ja) |
| EP (1) | EP0009049B1 (ja) |
| JP (1) | JPS55500108A (ja) |
| WO (1) | WO1979000645A1 (ja) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4263514A (en) * | 1979-09-13 | 1981-04-21 | Hughes Aircraft Company | Electron beam system |
| US4282437A (en) * | 1979-12-17 | 1981-08-04 | Bell Telephone Laboratories, Incorporated | Charged particle beam lithography |
| JPS57204125A (en) * | 1981-06-10 | 1982-12-14 | Hitachi Ltd | Electron-ray drawing device |
| US4469950A (en) * | 1982-03-04 | 1984-09-04 | Varian Associates, Inc. | Charged particle beam exposure system utilizing variable line scan |
| JP3203963B2 (ja) * | 1994-07-15 | 2001-09-04 | 株式会社日立製作所 | 電子線描画装置及び電子線描画方法 |
| JP3206448B2 (ja) * | 1996-08-30 | 2001-09-10 | 日本電気株式会社 | 電子ビーム描画装置 |
| JP2000173900A (ja) * | 1998-12-08 | 2000-06-23 | Canon Inc | 電子ビーム照明装置、および該照明装置を用いた電子ビーム露光装置 |
| US6455863B1 (en) * | 1999-06-09 | 2002-09-24 | Applied Materials, Inc. | Apparatus and method for forming a charged particle beam of arbitrary shape |
| US20050043630A1 (en) * | 2003-08-21 | 2005-02-24 | Buchert Janusz Michal | Thermal Emission Non-Invasive Analyte Monitor |
| US7394080B2 (en) * | 2004-12-23 | 2008-07-01 | Taiwan Semiconductor Manufacturing Company, Ltd. | Mask superposition for multiple exposures |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1049988B (ja) * | 1953-09-04 | |||
| US3413517A (en) * | 1967-01-13 | 1968-11-26 | Ibm | Filament current control by a superposed dithering voltage |
| US3491236A (en) * | 1967-09-28 | 1970-01-20 | Gen Electric | Electron beam fabrication of microelectronic circuit patterns |
| US3875416A (en) * | 1970-06-30 | 1975-04-01 | Texas Instruments Inc | Methods and apparatus for the production of semiconductor devices by electron-beam patterning and devices produced thereby |
| FR39852E (fr) * | 1972-06-30 | 1932-03-24 | Ig Farbenindustrie Ag | Procédé de production de colorants solides pour cuve |
| NL177578C (nl) * | 1976-05-14 | 1985-10-16 | Thomson Csf | Inrichting voor het beschrijven van een voorwerp met een deeltjesbundel. |
| JPS52151568A (en) * | 1976-06-11 | 1977-12-16 | Jeol Ltd | Electron beam exposure apparatus |
-
1978
- 1978-02-21 US US05/879,097 patent/US4167676A/en not_active Expired - Lifetime
-
1979
- 1979-02-14 WO PCT/US1979/000086 patent/WO1979000645A1/en unknown
- 1979-02-14 JP JP50048779A patent/JPS55500108A/ja active Pending
- 1979-09-11 EP EP79900259A patent/EP0009049B1/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| EP0009049B1 (en) | 1982-03-17 |
| EP0009049A1 (en) | 1980-04-02 |
| WO1979000645A1 (en) | 1979-09-06 |
| US4167676A (en) | 1979-09-11 |