JPS5543526A - Continuous washing-out device for photosensitive resin plate - Google Patents

Continuous washing-out device for photosensitive resin plate

Info

Publication number
JPS5543526A
JPS5543526A JP11599478A JP11599478A JPS5543526A JP S5543526 A JPS5543526 A JP S5543526A JP 11599478 A JP11599478 A JP 11599478A JP 11599478 A JP11599478 A JP 11599478A JP S5543526 A JPS5543526 A JP S5543526A
Authority
JP
Japan
Prior art keywords
washing
cleaning
plate
photosensitive resin
storage tank
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11599478A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6127741B2 (enrdf_load_stackoverflow
Inventor
Etsuro Uehara
Naoyuki Mitani
Tadahiko Furukawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toray Industries Inc
Original Assignee
Toray Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toray Industries Inc filed Critical Toray Industries Inc
Priority to JP11599478A priority Critical patent/JPS5543526A/ja
Publication of JPS5543526A publication Critical patent/JPS5543526A/ja
Publication of JPS6127741B2 publication Critical patent/JPS6127741B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3042—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP11599478A 1978-09-22 1978-09-22 Continuous washing-out device for photosensitive resin plate Granted JPS5543526A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11599478A JPS5543526A (en) 1978-09-22 1978-09-22 Continuous washing-out device for photosensitive resin plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11599478A JPS5543526A (en) 1978-09-22 1978-09-22 Continuous washing-out device for photosensitive resin plate

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP9318887A Division JPS6323161A (ja) 1987-04-17 1987-04-17 感光性樹脂版用連続洗い出し装置

Publications (2)

Publication Number Publication Date
JPS5543526A true JPS5543526A (en) 1980-03-27
JPS6127741B2 JPS6127741B2 (enrdf_load_stackoverflow) 1986-06-26

Family

ID=14676214

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11599478A Granted JPS5543526A (en) 1978-09-22 1978-09-22 Continuous washing-out device for photosensitive resin plate

Country Status (1)

Country Link
JP (1) JPS5543526A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1997033197A1 (fr) * 1996-03-08 1997-09-12 Nippon Zeon Co., Ltd. Procede de preparation d'une planche d'impression photosensible, solution de developpement aqueuse associee, solution de rinçage aqueuse et revelateur destine a la planche d'impression photosensible
US9108345B2 (en) 2008-08-13 2015-08-18 Kraussmaffei Berstorff Gmbh Extruding device
JP2020079840A (ja) * 2018-11-12 2020-05-28 有限会社 みさとみらい２１ 樹脂凸版印刷版の製造方法およびその製造システム

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6170156U (enrdf_load_stackoverflow) * 1984-10-16 1986-05-13

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS506405A (enrdf_load_stackoverflow) * 1973-04-16 1975-01-23
JPS5136302A (en) * 1974-07-22 1976-03-27 Hoechst Co American Insatsubano dojini genzooyobi hozonshorisuru hohonarabini sochi

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS506405A (enrdf_load_stackoverflow) * 1973-04-16 1975-01-23
JPS5136302A (en) * 1974-07-22 1976-03-27 Hoechst Co American Insatsubano dojini genzooyobi hozonshorisuru hohonarabini sochi

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1997033197A1 (fr) * 1996-03-08 1997-09-12 Nippon Zeon Co., Ltd. Procede de preparation d'une planche d'impression photosensible, solution de developpement aqueuse associee, solution de rinçage aqueuse et revelateur destine a la planche d'impression photosensible
US9108345B2 (en) 2008-08-13 2015-08-18 Kraussmaffei Berstorff Gmbh Extruding device
JP2020079840A (ja) * 2018-11-12 2020-05-28 有限会社 みさとみらい２１ 樹脂凸版印刷版の製造方法およびその製造システム

Also Published As

Publication number Publication date
JPS6127741B2 (enrdf_load_stackoverflow) 1986-06-26

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