JPS5541971A - Ion impact working method - Google Patents

Ion impact working method

Info

Publication number
JPS5541971A
JPS5541971A JP11548778A JP11548778A JPS5541971A JP S5541971 A JPS5541971 A JP S5541971A JP 11548778 A JP11548778 A JP 11548778A JP 11548778 A JP11548778 A JP 11548778A JP S5541971 A JPS5541971 A JP S5541971A
Authority
JP
Japan
Prior art keywords
temperature
supplied
upper limit
heating
cool
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11548778A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5610380B2 (enrdf_load_stackoverflow
Inventor
Hiyoshi Watanabe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fuji Electronics Industry Co Ltd
Original Assignee
Fuji Electronics Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Electronics Industry Co Ltd filed Critical Fuji Electronics Industry Co Ltd
Priority to JP11548778A priority Critical patent/JPS5541971A/ja
Publication of JPS5541971A publication Critical patent/JPS5541971A/ja
Publication of JPS5610380B2 publication Critical patent/JPS5610380B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
    • C23C8/36—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases using ionised gases, e.g. ionitriding

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)
JP11548778A 1978-09-19 1978-09-19 Ion impact working method Granted JPS5541971A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11548778A JPS5541971A (en) 1978-09-19 1978-09-19 Ion impact working method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11548778A JPS5541971A (en) 1978-09-19 1978-09-19 Ion impact working method

Publications (2)

Publication Number Publication Date
JPS5541971A true JPS5541971A (en) 1980-03-25
JPS5610380B2 JPS5610380B2 (enrdf_load_stackoverflow) 1981-03-07

Family

ID=14663728

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11548778A Granted JPS5541971A (en) 1978-09-19 1978-09-19 Ion impact working method

Country Status (1)

Country Link
JP (1) JPS5541971A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6099832A (ja) * 1983-10-27 1985-06-03 シーケーデイ株式会社 間欠搬送位置検出装置

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0187667U (enrdf_load_stackoverflow) * 1987-12-04 1989-06-09

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6099832A (ja) * 1983-10-27 1985-06-03 シーケーデイ株式会社 間欠搬送位置検出装置

Also Published As

Publication number Publication date
JPS5610380B2 (enrdf_load_stackoverflow) 1981-03-07

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