JPS5540111B2 - - Google Patents
Info
- Publication number
- JPS5540111B2 JPS5540111B2 JP12571175A JP12571175A JPS5540111B2 JP S5540111 B2 JPS5540111 B2 JP S5540111B2 JP 12571175 A JP12571175 A JP 12571175A JP 12571175 A JP12571175 A JP 12571175A JP S5540111 B2 JPS5540111 B2 JP S5540111B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Physical Vapour Deposition (AREA)
- ing And Chemical Polishing (AREA)
- Electrodes Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP50125711A JPS5249991A (en) | 1975-10-17 | 1975-10-17 | Sputtering method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP50125711A JPS5249991A (en) | 1975-10-17 | 1975-10-17 | Sputtering method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5249991A JPS5249991A (en) | 1977-04-21 |
| JPS5540111B2 true JPS5540111B2 (enExample) | 1980-10-15 |
Family
ID=14916839
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP50125711A Granted JPS5249991A (en) | 1975-10-17 | 1975-10-17 | Sputtering method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5249991A (enExample) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60199137A (ja) * | 1984-03-22 | 1985-10-08 | 塚田 一郎 | コンクリ−ト穴の形成方法 |
| JPS60199138A (ja) * | 1984-03-22 | 1985-10-08 | 塚田 一郎 | コンクリ−ト穴形成法 |
| JPH03286068A (ja) * | 1990-04-02 | 1991-12-17 | Fujimori Kogyo Kk | コンクリート打設用筒状型枠 |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5641640A (en) * | 1979-09-14 | 1981-04-18 | Hitachi Ltd | Manufacture of image pick-up tube |
| US4507851A (en) * | 1982-04-30 | 1985-04-02 | Texas Instruments Incorporated | Process for forming an electrical interconnection system on a semiconductor |
| JPH0631839B2 (ja) * | 1987-11-30 | 1994-04-27 | 株式会社東芝 | 放射性ガスの貯蔵法 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5033273B2 (enExample) * | 1972-06-30 | 1975-10-29 |
-
1975
- 1975-10-17 JP JP50125711A patent/JPS5249991A/ja active Granted
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60199137A (ja) * | 1984-03-22 | 1985-10-08 | 塚田 一郎 | コンクリ−ト穴の形成方法 |
| JPS60199138A (ja) * | 1984-03-22 | 1985-10-08 | 塚田 一郎 | コンクリ−ト穴形成法 |
| JPH03286068A (ja) * | 1990-04-02 | 1991-12-17 | Fujimori Kogyo Kk | コンクリート打設用筒状型枠 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5249991A (en) | 1977-04-21 |