JPS5530289B2 - - Google Patents
Info
- Publication number
- JPS5530289B2 JPS5530289B2 JP1678975A JP1678975A JPS5530289B2 JP S5530289 B2 JPS5530289 B2 JP S5530289B2 JP 1678975 A JP1678975 A JP 1678975A JP 1678975 A JP1678975 A JP 1678975A JP S5530289 B2 JPS5530289 B2 JP S5530289B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P50/00—Etching of wafers, substrates or parts of devices
- H10P50/20—Dry etching; Plasma etching; Reactive-ion etching
- H10P50/26—Dry etching; Plasma etching; Reactive-ion etching of conductive or resistive materials
- H10P50/262—Dry etching; Plasma etching; Reactive-ion etching of conductive or resistive materials by physical means only
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
Landscapes
- Drying Of Semiconductors (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NL7401859A NL7401859A (nl) | 1974-02-12 | 1974-02-12 | Werkwijze voor het vervaardigen van een patroon en of meer lagen op een ondergrond door selijk verwijderen van deze laag of lagen sputteretsen en voorwerpen, in het bijzon- alfgeleiderinrichtingen, vervaardigd met ssing van deze werkwijze. |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS50110073A JPS50110073A (cg-RX-API-DMAC7.html) | 1975-08-29 |
| JPS5530289B2 true JPS5530289B2 (cg-RX-API-DMAC7.html) | 1980-08-09 |
Family
ID=19820730
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1678975A Expired JPS5530289B2 (cg-RX-API-DMAC7.html) | 1974-02-12 | 1975-02-08 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US3984300A (cg-RX-API-DMAC7.html) |
| JP (1) | JPS5530289B2 (cg-RX-API-DMAC7.html) |
| DE (1) | DE2504500A1 (cg-RX-API-DMAC7.html) |
| FR (1) | FR2260451B1 (cg-RX-API-DMAC7.html) |
| GB (1) | GB1491746A (cg-RX-API-DMAC7.html) |
| NL (1) | NL7401859A (cg-RX-API-DMAC7.html) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4057831A (en) * | 1972-09-05 | 1977-11-08 | U.S. Philips Corporation | Video record disc manufactured by a process involving chemical or sputter etching |
| DE2536718C3 (de) * | 1975-08-18 | 1978-04-27 | Siemens Ag, 1000 Berlin Und 8000 Muenchen | Verfahren zur Herstellung geätzter Strukturen in Festkörperoberflächen durch Ionenätzung und Bestrahlungsmaske zur Verwendung in diesem Verfahren |
| US4057460A (en) * | 1976-11-22 | 1977-11-08 | Data General Corporation | Plasma etching process |
| DE2754526C2 (de) * | 1977-12-07 | 1985-09-26 | Siemens AG, 1000 Berlin und 8000 München | Verfahren zur Herstellung des Kathodensystems eines Röntgen- oder Gammastrahlenkonverters |
| JPS5496775A (en) * | 1978-01-17 | 1979-07-31 | Hitachi Ltd | Method of forming circuit |
| US4340276A (en) | 1978-11-01 | 1982-07-20 | Minnesota Mining And Manufacturing Company | Method of producing a microstructured surface and the article produced thereby |
| JPS57157523A (en) * | 1981-03-25 | 1982-09-29 | Hitachi Ltd | Forming method for pattern |
| US4375390A (en) * | 1982-03-15 | 1983-03-01 | Anderson Nathaniel C | Thin film techniques for fabricating narrow track ferrite heads |
| GB2148769A (en) * | 1983-10-22 | 1985-06-05 | Standard Telephones Cables Ltd | Topographic feature formation by ion beam milling of a substrate |
| DE3534418A1 (de) * | 1985-09-27 | 1987-04-02 | Telefunken Electronic Gmbh | Verfahren zum herstellen von vertiefungen in einem halbleiterbauelemente enthaltenden halbleiterkoerper |
| US4767418A (en) * | 1986-02-13 | 1988-08-30 | California Institute Of Technology | Luminal surface fabrication for cardiovascular prostheses |
| US5139974A (en) * | 1991-01-25 | 1992-08-18 | Micron Technology, Inc. | Semiconductor manufacturing process for decreasing the optical refelctivity of a metal layer |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3400066A (en) * | 1965-11-15 | 1968-09-03 | Ibm | Sputtering processes for depositing thin films of controlled thickness |
| US3436327A (en) * | 1966-07-18 | 1969-04-01 | Collins Radio Co | Selective sputtering rate circuit forming process |
| US3649503A (en) * | 1969-12-03 | 1972-03-14 | Motorola Inc | Sputter etch mask |
| US3676317A (en) * | 1970-10-23 | 1972-07-11 | Stromberg Datagraphix Inc | Sputter etching process |
| US3791952A (en) * | 1972-07-24 | 1974-02-12 | Bell Telephone Labor Inc | Method for neutralizing charge in semiconductor bodies and dielectric coatings induced by cathodic etching |
-
1974
- 1974-02-12 NL NL7401859A patent/NL7401859A/xx unknown
-
1975
- 1975-02-04 DE DE19752504500 patent/DE2504500A1/de not_active Ceased
- 1975-02-07 US US05/548,006 patent/US3984300A/en not_active Expired - Lifetime
- 1975-02-07 GB GB5303/75A patent/GB1491746A/en not_active Expired
- 1975-02-08 JP JP1678975A patent/JPS5530289B2/ja not_active Expired
- 1975-02-12 FR FR7504327A patent/FR2260451B1/fr not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| FR2260451A1 (cg-RX-API-DMAC7.html) | 1975-09-05 |
| JPS50110073A (cg-RX-API-DMAC7.html) | 1975-08-29 |
| DE2504500A1 (de) | 1975-08-14 |
| FR2260451B1 (cg-RX-API-DMAC7.html) | 1980-03-21 |
| GB1491746A (en) | 1977-11-16 |
| NL7401859A (nl) | 1975-08-14 |
| US3984300A (en) | 1976-10-05 |