JPS5527627B2 - - Google Patents
Info
- Publication number
- JPS5527627B2 JPS5527627B2 JP1301576A JP1301576A JPS5527627B2 JP S5527627 B2 JPS5527627 B2 JP S5527627B2 JP 1301576 A JP1301576 A JP 1301576A JP 1301576 A JP1301576 A JP 1301576A JP S5527627 B2 JPS5527627 B2 JP S5527627B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
- H01J37/3405—Magnetron sputtering
- H01J37/3408—Planar magnetron sputtering
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1301576A JPS5295581A (en) | 1976-02-09 | 1976-02-09 | Sputiering apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1301576A JPS5295581A (en) | 1976-02-09 | 1976-02-09 | Sputiering apparatus |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5295581A JPS5295581A (en) | 1977-08-11 |
| JPS5527627B2 true JPS5527627B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1980-07-22 |
Family
ID=11821319
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1301576A Granted JPS5295581A (en) | 1976-02-09 | 1976-02-09 | Sputiering apparatus |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5295581A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2707144A1 (de) * | 1976-02-19 | 1977-08-25 | Sloan Technology Corp | Kathodenzerstaeubungsvorrichtung |
| JPS5528753Y2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1976-02-24 | 1980-07-09 | ||
| JPS52156185A (en) * | 1976-06-21 | 1977-12-26 | Makoto Katsurai | Horizontalltype discharge apparatus with cross magnetic field |
| JPS549176A (en) * | 1977-06-23 | 1979-01-23 | Ulvac Corp | Sputtering method for forming unform film and evaporation film |
| JPS584923Y2 (ja) * | 1979-04-20 | 1983-01-27 | 株式会社 徳田製作所 | 横型スパッタリング装置 |
| JPS5967369A (ja) * | 1982-09-03 | 1984-04-17 | バリアン．アソシエイツ・インコ−ポレイテッド | マグネトロン飛着装置 |
| JPS621865A (ja) * | 1985-06-25 | 1987-01-07 | Matsushita Electric Ind Co Ltd | マグネトロンスパツタ装置 |
| JP4014982B2 (ja) * | 2002-09-19 | 2007-11-28 | 株式会社神戸製鋼所 | アーク蒸発源用のロッドターゲット、その製造方法及びアーク蒸着装置 |
| US20060207871A1 (en) | 2005-03-16 | 2006-09-21 | Gennady Yumshtyk | Sputtering devices and methods |
| US9368330B2 (en) | 2014-05-02 | 2016-06-14 | Bh5773 Ltd | Sputtering targets and methods |
| RU2018136758A (ru) | 2016-03-24 | 2020-04-24 | Дайсон Текнолоджи Лимитед | Насадка для ручного прибора |
| EP3432759B1 (en) | 2016-03-24 | 2020-06-24 | Dyson Technology Limited | Attachment for a handheld appliance |
| CN109415802B (zh) * | 2016-06-29 | 2021-05-04 | 株式会社爱发科 | 溅射装置用成膜单元 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3956093A (en) * | 1974-12-16 | 1976-05-11 | Airco, Inc. | Planar magnetron sputtering method and apparatus |
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1976
- 1976-02-09 JP JP1301576A patent/JPS5295581A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5295581A (en) | 1977-08-11 |