JPS5527627A - Electronic device having protective layer - Google Patents
Electronic device having protective layerInfo
- Publication number
- JPS5527627A JPS5527627A JP10060378A JP10060378A JPS5527627A JP S5527627 A JPS5527627 A JP S5527627A JP 10060378 A JP10060378 A JP 10060378A JP 10060378 A JP10060378 A JP 10060378A JP S5527627 A JPS5527627 A JP S5527627A
- Authority
- JP
- Japan
- Prior art keywords
- phosphorus
- molecular weight
- protective layer
- boron
- boron compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10060378A JPS5527627A (en) | 1978-08-18 | 1978-08-18 | Electronic device having protective layer |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10060378A JPS5527627A (en) | 1978-08-18 | 1978-08-18 | Electronic device having protective layer |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5527627A true JPS5527627A (en) | 1980-02-27 |
Family
ID=14278430
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10060378A Pending JPS5527627A (en) | 1978-08-18 | 1978-08-18 | Electronic device having protective layer |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5527627A (ja) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6348632A (ja) * | 1986-08-18 | 1988-03-01 | Matsushita Electric Ind Co Ltd | 光学情報記録再生デイスクの製造方法 |
US5382344A (en) * | 1991-08-02 | 1995-01-17 | Anelva Corporation | Sputtering apparatus |
US5458759A (en) * | 1991-08-02 | 1995-10-17 | Anelva Corporation | Magnetron sputtering cathode apparatus |
US6436252B1 (en) | 2000-04-07 | 2002-08-20 | Surface Engineered Products Corp. | Method and apparatus for magnetron sputtering |
US8741115B2 (en) | 2005-03-16 | 2014-06-03 | Bh5773 Ltd | Sputtering devices and methods |
US9368330B2 (en) | 2014-05-02 | 2016-06-14 | Bh5773 Ltd | Sputtering targets and methods |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS492488A (ja) * | 1972-04-19 | 1974-01-10 |
-
1978
- 1978-08-18 JP JP10060378A patent/JPS5527627A/ja active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS492488A (ja) * | 1972-04-19 | 1974-01-10 |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6348632A (ja) * | 1986-08-18 | 1988-03-01 | Matsushita Electric Ind Co Ltd | 光学情報記録再生デイスクの製造方法 |
JPH0752527B2 (ja) * | 1986-08-18 | 1995-06-05 | 松下電器産業株式会社 | 光学情報記録再生デイスクの製造方法 |
US5382344A (en) * | 1991-08-02 | 1995-01-17 | Anelva Corporation | Sputtering apparatus |
US5458759A (en) * | 1991-08-02 | 1995-10-17 | Anelva Corporation | Magnetron sputtering cathode apparatus |
US6436252B1 (en) | 2000-04-07 | 2002-08-20 | Surface Engineered Products Corp. | Method and apparatus for magnetron sputtering |
US8741115B2 (en) | 2005-03-16 | 2014-06-03 | Bh5773 Ltd | Sputtering devices and methods |
US9583319B2 (en) | 2005-03-16 | 2017-02-28 | Bh5773 Ltd | Sputtering devices and methods |
US9368330B2 (en) | 2014-05-02 | 2016-06-14 | Bh5773 Ltd | Sputtering targets and methods |
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