JPS5527623B2 - - Google Patents

Info

Publication number
JPS5527623B2
JPS5527623B2 JP2505676A JP2505676A JPS5527623B2 JP S5527623 B2 JPS5527623 B2 JP S5527623B2 JP 2505676 A JP2505676 A JP 2505676A JP 2505676 A JP2505676 A JP 2505676A JP S5527623 B2 JPS5527623 B2 JP S5527623B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP2505676A
Other languages
Japanese (ja)
Other versions
JPS52108380A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP2505676A priority Critical patent/JPS52108380A/ja
Publication of JPS52108380A publication Critical patent/JPS52108380A/ja
Publication of JPS5527623B2 publication Critical patent/JPS5527623B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
JP2505676A 1976-03-10 1976-03-10 Gassintroducing system for ionic plating apparatus of high frequency energization type Granted JPS52108380A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2505676A JPS52108380A (en) 1976-03-10 1976-03-10 Gassintroducing system for ionic plating apparatus of high frequency energization type

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2505676A JPS52108380A (en) 1976-03-10 1976-03-10 Gassintroducing system for ionic plating apparatus of high frequency energization type

Publications (2)

Publication Number Publication Date
JPS52108380A JPS52108380A (en) 1977-09-10
JPS5527623B2 true JPS5527623B2 (enrdf_load_stackoverflow) 1980-07-22

Family

ID=12155255

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2505676A Granted JPS52108380A (en) 1976-03-10 1976-03-10 Gassintroducing system for ionic plating apparatus of high frequency energization type

Country Status (1)

Country Link
JP (1) JPS52108380A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11269643A (ja) * 1998-03-20 1999-10-05 Toshiba Corp 成膜装置およびそれを用いた成膜方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5346289Y2 (enrdf_load_stackoverflow) * 1974-04-05 1978-11-06

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11269643A (ja) * 1998-03-20 1999-10-05 Toshiba Corp 成膜装置およびそれを用いた成膜方法

Also Published As

Publication number Publication date
JPS52108380A (en) 1977-09-10

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