JPS52108380A - Gassintroducing system for ionic plating apparatus of high frequency energization type - Google Patents

Gassintroducing system for ionic plating apparatus of high frequency energization type

Info

Publication number
JPS52108380A
JPS52108380A JP2505676A JP2505676A JPS52108380A JP S52108380 A JPS52108380 A JP S52108380A JP 2505676 A JP2505676 A JP 2505676A JP 2505676 A JP2505676 A JP 2505676A JP S52108380 A JPS52108380 A JP S52108380A
Authority
JP
Japan
Prior art keywords
gassintroducing
high frequency
plating apparatus
frequency energization
energization type
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2505676A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5527623B2 (enrdf_load_stackoverflow
Inventor
Kihiro Hanazawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koito Manufacturing Co Ltd
Shingijutsu Kaihatsu Jigyodan
Original Assignee
Koito Manufacturing Co Ltd
Shingijutsu Kaihatsu Jigyodan
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Koito Manufacturing Co Ltd, Shingijutsu Kaihatsu Jigyodan filed Critical Koito Manufacturing Co Ltd
Priority to JP2505676A priority Critical patent/JPS52108380A/ja
Publication of JPS52108380A publication Critical patent/JPS52108380A/ja
Publication of JPS5527623B2 publication Critical patent/JPS5527623B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
JP2505676A 1976-03-10 1976-03-10 Gassintroducing system for ionic plating apparatus of high frequency energization type Granted JPS52108380A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2505676A JPS52108380A (en) 1976-03-10 1976-03-10 Gassintroducing system for ionic plating apparatus of high frequency energization type

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2505676A JPS52108380A (en) 1976-03-10 1976-03-10 Gassintroducing system for ionic plating apparatus of high frequency energization type

Publications (2)

Publication Number Publication Date
JPS52108380A true JPS52108380A (en) 1977-09-10
JPS5527623B2 JPS5527623B2 (enrdf_load_stackoverflow) 1980-07-22

Family

ID=12155255

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2505676A Granted JPS52108380A (en) 1976-03-10 1976-03-10 Gassintroducing system for ionic plating apparatus of high frequency energization type

Country Status (1)

Country Link
JP (1) JPS52108380A (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11269643A (ja) * 1998-03-20 1999-10-05 Toshiba Corp 成膜装置およびそれを用いた成膜方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50128333U (enrdf_load_stackoverflow) * 1974-04-05 1975-10-21

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50128333U (enrdf_load_stackoverflow) * 1974-04-05 1975-10-21

Also Published As

Publication number Publication date
JPS5527623B2 (enrdf_load_stackoverflow) 1980-07-22

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