JPS5521332B2 - - Google Patents
Info
- Publication number
- JPS5521332B2 JPS5521332B2 JP4919376A JP4919376A JPS5521332B2 JP S5521332 B2 JPS5521332 B2 JP S5521332B2 JP 4919376 A JP4919376 A JP 4919376A JP 4919376 A JP4919376 A JP 4919376A JP S5521332 B2 JPS5521332 B2 JP S5521332B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4919376A JPS52132678A (en) | 1976-04-28 | 1976-04-28 | High-sensitive positive type electron beam formation |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4919376A JPS52132678A (en) | 1976-04-28 | 1976-04-28 | High-sensitive positive type electron beam formation |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS52132678A JPS52132678A (en) | 1977-11-07 |
| JPS5521332B2 true JPS5521332B2 (en:Method) | 1980-06-09 |
Family
ID=12824168
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4919376A Granted JPS52132678A (en) | 1976-04-28 | 1976-04-28 | High-sensitive positive type electron beam formation |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS52132678A (en:Method) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS55105244A (en) * | 1979-02-06 | 1980-08-12 | Victor Co Of Japan Ltd | Electron beam resist |
| JPS58113933A (ja) * | 1981-12-26 | 1983-07-07 | Daikin Ind Ltd | レジスト材料およびそれを用いる微細レジストパタ−ンの形成方法 |
| JPS63271250A (ja) * | 1986-12-29 | 1988-11-09 | Toppan Printing Co Ltd | 耐ドライエッチング性ポジ型レジスト材料 |
| JPH087443B2 (ja) * | 1986-12-29 | 1996-01-29 | 凸版印刷株式会社 | 高解像度ポジ型放射線感応性レジスト |
-
1976
- 1976-04-28 JP JP4919376A patent/JPS52132678A/ja active Granted
Non-Patent Citations (1)
| Title |
|---|
| IBM TECHNICAL DISC1OSURE BULLETIN#V16#N11=1974 * |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS52132678A (en) | 1977-11-07 |