JPS55166003A - Wafer scribe line detector - Google Patents

Wafer scribe line detector

Info

Publication number
JPS55166003A
JPS55166003A JP7299879A JP7299879A JPS55166003A JP S55166003 A JPS55166003 A JP S55166003A JP 7299879 A JP7299879 A JP 7299879A JP 7299879 A JP7299879 A JP 7299879A JP S55166003 A JPS55166003 A JP S55166003A
Authority
JP
Japan
Prior art keywords
scattered light
scribe line
light
wafer
fluxes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7299879A
Other languages
Japanese (ja)
Other versions
JPS6049241B2 (en
Inventor
Kyoichi Suwa
Kiwao Nakazawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Nippon Chemical Industrial Co Ltd
Original Assignee
Nippon Chemical Industrial Co Ltd
Nippon Kogaku KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Chemical Industrial Co Ltd, Nippon Kogaku KK filed Critical Nippon Chemical Industrial Co Ltd
Priority to JP54072998A priority Critical patent/JPS6049241B2/en
Publication of JPS55166003A publication Critical patent/JPS55166003A/en
Publication of JPS6049241B2 publication Critical patent/JPS6049241B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Dicing (AREA)
  • Length Measuring Devices By Optical Means (AREA)

Abstract

PURPOSE:To detect only IC pattern-scattered light by inserting a space filter to obstruct scattered light from a scribe line, in the direction at right angle to the scribe line, in the vicinity of an entrance pupil of a scattered light receiving optical system. CONSTITUTION:Light from a laser 1 is expanded in its diameter by a beam expansion system 2, and enters a cylindrical lens 3. There, the beam receives power to converge in one direction of x or y on a wafer, reflects on an oscillator 4, and is devided into two optical fluxes by a half mirror 5. The light flux going toward an image rotator 7 changes its direction from other light flux by 90 deg.. By switching an interlock 6, either of two fluxes can be selected so as to determine, in which direction, x or y, the measurement on the wafer is to be done. During beam oscillation, total reflected light occurs from the scribe line and scattered light from pattern surface. The scattered light only is received by a doughnut type lens 10, and the scattered light from multi-stage scribe line is obstructed by barrier zone 14, 15.
JP54072998A 1979-06-12 1979-06-12 Wafer scribe line detection device Expired JPS6049241B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP54072998A JPS6049241B2 (en) 1979-06-12 1979-06-12 Wafer scribe line detection device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP54072998A JPS6049241B2 (en) 1979-06-12 1979-06-12 Wafer scribe line detection device

Publications (2)

Publication Number Publication Date
JPS55166003A true JPS55166003A (en) 1980-12-24
JPS6049241B2 JPS6049241B2 (en) 1985-10-31

Family

ID=13505586

Family Applications (1)

Application Number Title Priority Date Filing Date
JP54072998A Expired JPS6049241B2 (en) 1979-06-12 1979-06-12 Wafer scribe line detection device

Country Status (1)

Country Link
JP (1) JPS6049241B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5788414A (en) * 1980-11-21 1982-06-02 Seiko Epson Corp Alignment device
JPS6054454A (en) * 1983-09-05 1985-03-28 Disco Abrasive Sys Ltd Automatic precise positioning system

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5788414A (en) * 1980-11-21 1982-06-02 Seiko Epson Corp Alignment device
JPS6054454A (en) * 1983-09-05 1985-03-28 Disco Abrasive Sys Ltd Automatic precise positioning system

Also Published As

Publication number Publication date
JPS6049241B2 (en) 1985-10-31

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