JPS55164827A - Photoresist film peeling method - Google Patents

Photoresist film peeling method

Info

Publication number
JPS55164827A
JPS55164827A JP7302979A JP7302979A JPS55164827A JP S55164827 A JPS55164827 A JP S55164827A JP 7302979 A JP7302979 A JP 7302979A JP 7302979 A JP7302979 A JP 7302979A JP S55164827 A JPS55164827 A JP S55164827A
Authority
JP
Japan
Prior art keywords
film
peeling
photoresist film
type
contacting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7302979A
Other languages
English (en)
Inventor
Kazuhiro Arai
Eiji Murata
Mitsugi Higashiura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP7302979A priority Critical patent/JPS55164827A/ja
Publication of JPS55164827A publication Critical patent/JPS55164827A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP7302979A 1979-06-12 1979-06-12 Photoresist film peeling method Pending JPS55164827A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7302979A JPS55164827A (en) 1979-06-12 1979-06-12 Photoresist film peeling method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7302979A JPS55164827A (en) 1979-06-12 1979-06-12 Photoresist film peeling method

Publications (1)

Publication Number Publication Date
JPS55164827A true JPS55164827A (en) 1980-12-22

Family

ID=13506505

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7302979A Pending JPS55164827A (en) 1979-06-12 1979-06-12 Photoresist film peeling method

Country Status (1)

Country Link
JP (1) JPS55164827A (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02251855A (ja) * 1988-11-18 1990-10-09 Internatl Business Mach Corp <Ibm> ホトレシスト剥離用組成物および剥離方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02251855A (ja) * 1988-11-18 1990-10-09 Internatl Business Mach Corp <Ibm> ホトレシスト剥離用組成物および剥離方法
JPH0544021B2 (ja) * 1988-11-18 1993-07-05 Ibm

Similar Documents

Publication Publication Date Title
AU7388991A (en) Method for treating the surface of an absorbent resin
DE3787296D1 (de) Negativ arbeitende Photolack-Zusammensetzung und Verfahren zur Herstellung von thermisch stabilen negativen Bildern damit.
JPS566236A (en) Photosensitive material and pattern forming method using it
AU6752987A (en) Microplastic structures, process for forming such structures, and photomask suitable for use in such process
EP0096572A3 (en) Photosensitive materials for use in making dry transfers
JPS56114927A (en) Liquid-crystal display element
JPS5582437A (en) Method of making pattern
ATE103084T1 (de) Positiv-fotoresist-zusammensetzungen.
GB8610951D0 (en) Organic compounds
JPS55164827A (en) Photoresist film peeling method
DK149330C (da) Borsyreanhydridoploesninger og deres anvendelse som resolharpikshaerdere
JPS51118716A (en) Process for purification of (meth)acryloyloxyethylammonium salts
DE3682337D1 (de) Verfahren zur herstellung von perylen-3,4,9,10-tetra-carbonsaeure-n,n&#39;-dimethylimid in hochdeckender pigmentform.
JPS5428452A (en) Method of purifying colored waster water
JPS5349857A (en) Method of treating waste liquid by ozone
JPS5422445A (en) Method of treating article
DK157485C (da) Fremgangsmaade til rensning af chloreret vand samt et apparat til udoevelse af fremgangsmaaden
JPS56160035A (en) Applying device of liquid
JPS6447025A (en) Etching
JPS55148112A (en) Manufacture of matrix by photosensitive resin
JPS56114926A (en) Liquid-crystal display element
JPS57191639A (en) Dry developing method and device
JPS54153632A (en) Developing device
JPS5233355A (en) Waste water (or solution) treatment method
JPS5233928A (en) Apparatus for the ultraviolet light irradiation