JPS55154443A - Laser induced damage evaluating apparatus - Google Patents

Laser induced damage evaluating apparatus

Info

Publication number
JPS55154443A
JPS55154443A JP6147779A JP6147779A JPS55154443A JP S55154443 A JPS55154443 A JP S55154443A JP 6147779 A JP6147779 A JP 6147779A JP 6147779 A JP6147779 A JP 6147779A JP S55154443 A JPS55154443 A JP S55154443A
Authority
JP
Japan
Prior art keywords
damage
light
change
progression
breakdown
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6147779A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6228852B2 (OSRAM
Inventor
Toshiaki Murahashi
Shoichi Noda
Takao Sawada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Priority to JP6147779A priority Critical patent/JPS55154443A/ja
Publication of JPS55154443A publication Critical patent/JPS55154443A/ja
Publication of JPS6228852B2 publication Critical patent/JPS6228852B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Of Optical Devices Or Fibers (AREA)
  • Lasers (AREA)
JP6147779A 1979-05-21 1979-05-21 Laser induced damage evaluating apparatus Granted JPS55154443A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6147779A JPS55154443A (en) 1979-05-21 1979-05-21 Laser induced damage evaluating apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6147779A JPS55154443A (en) 1979-05-21 1979-05-21 Laser induced damage evaluating apparatus

Publications (2)

Publication Number Publication Date
JPS55154443A true JPS55154443A (en) 1980-12-02
JPS6228852B2 JPS6228852B2 (OSRAM) 1987-06-23

Family

ID=13172176

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6147779A Granted JPS55154443A (en) 1979-05-21 1979-05-21 Laser induced damage evaluating apparatus

Country Status (1)

Country Link
JP (1) JPS55154443A (OSRAM)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4624573A (en) * 1984-05-14 1986-11-25 Rahn John P Total optical loss measurement device
JPS63107079A (ja) * 1986-10-23 1988-05-12 Mitsubishi Electric Corp レ−ザ装置
JPS63107078A (ja) * 1986-10-23 1988-05-12 Mitsubishi Electric Corp レ−ザ装置
JPH0621875B2 (ja) * 1986-05-05 1994-03-23 ヒユーズ・エアクラフト・カンパニー 自蔵式表面汚染センサ
JP2007093825A (ja) * 2005-09-28 2007-04-12 Advanced Mask Inspection Technology Kk レーザ光源運用方法
CN102866163A (zh) * 2012-09-06 2013-01-09 中国科学院上海光学精密机械研究所 检测激光损伤的装置和方法
CN110174245A (zh) * 2019-06-20 2019-08-27 中国工程物理研究院激光聚变研究中心 光学元件激光诱导损伤阈值自动化测试装置和测试方法

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63259383A (ja) * 1987-04-16 1988-10-26 住友金属工業株式会社 金属精錬容器と蓋とのシ−ル材

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4624573A (en) * 1984-05-14 1986-11-25 Rahn John P Total optical loss measurement device
JPH0621875B2 (ja) * 1986-05-05 1994-03-23 ヒユーズ・エアクラフト・カンパニー 自蔵式表面汚染センサ
JPS63107079A (ja) * 1986-10-23 1988-05-12 Mitsubishi Electric Corp レ−ザ装置
JPS63107078A (ja) * 1986-10-23 1988-05-12 Mitsubishi Electric Corp レ−ザ装置
JP2007093825A (ja) * 2005-09-28 2007-04-12 Advanced Mask Inspection Technology Kk レーザ光源運用方法
CN102866163A (zh) * 2012-09-06 2013-01-09 中国科学院上海光学精密机械研究所 检测激光损伤的装置和方法
CN110174245A (zh) * 2019-06-20 2019-08-27 中国工程物理研究院激光聚变研究中心 光学元件激光诱导损伤阈值自动化测试装置和测试方法
CN110174245B (zh) * 2019-06-20 2024-02-09 中国工程物理研究院激光聚变研究中心 光学元件激光诱导损伤阈值自动化测试装置和测试方法

Also Published As

Publication number Publication date
JPS6228852B2 (OSRAM) 1987-06-23

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