JPS55153327A - Laser annealing device - Google Patents

Laser annealing device

Info

Publication number
JPS55153327A
JPS55153327A JP6199379A JP6199379A JPS55153327A JP S55153327 A JPS55153327 A JP S55153327A JP 6199379 A JP6199379 A JP 6199379A JP 6199379 A JP6199379 A JP 6199379A JP S55153327 A JPS55153327 A JP S55153327A
Authority
JP
Japan
Prior art keywords
heated
distribution
fiber
resembled
irradiated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6199379A
Other languages
Japanese (ja)
Inventor
Hidekazu Okabayashi
Takeshi Yamane
Koichi Ishida
Masaaki Yoshida
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP6199379A priority Critical patent/JPS55153327A/en
Publication of JPS55153327A publication Critical patent/JPS55153327A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/26—Bombardment with radiation

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Toxicology (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Health & Medical Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Laser Beam Processing (AREA)
  • Recrystallisation Techniques (AREA)
  • Lasers (AREA)

Abstract

PURPOSE:To enable to heat uniformly a material to be heated by a method wherein a laser beam whose strength distribution in the sectional area of beam has a smooth trapezoidal form or resembled to it is applied to a part to be irradiated of the material to be heated. CONSTITUTION:An output of a laser oscillator 1 operating in the multitransverse mode is fed to an optical fiber 3 through a condenser 2, and the beam receives a higher mode change during the passing in the fiber 3. The strength distribution in the sectional area of beam at the irradiating out end is a smooth distribution having a trapezoidal form or resembled to it being fixed by the distribution of a refractive index in the fiber. Therefore by applying the beam to the part to be irradiated of a material 4 to be heated, the material 4 can be heated uniformly.
JP6199379A 1979-05-18 1979-05-18 Laser annealing device Pending JPS55153327A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6199379A JPS55153327A (en) 1979-05-18 1979-05-18 Laser annealing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6199379A JPS55153327A (en) 1979-05-18 1979-05-18 Laser annealing device

Publications (1)

Publication Number Publication Date
JPS55153327A true JPS55153327A (en) 1980-11-29

Family

ID=13187226

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6199379A Pending JPS55153327A (en) 1979-05-18 1979-05-18 Laser annealing device

Country Status (1)

Country Link
JP (1) JPS55153327A (en)

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5792133A (en) * 1980-11-27 1982-06-08 Kanai Hiroyuki Heat treating device for metallic card clothing
US4676586A (en) * 1982-12-20 1987-06-30 General Electric Company Apparatus and method for performing laser material processing through a fiber optic
US4681396A (en) * 1984-10-09 1987-07-21 General Electric Company High power laser energy delivery system
JPS62214131A (en) * 1986-03-13 1987-09-19 Toyota Motor Corp Manufacture of surface remelted and chilled camshaft
JPH01147248U (en) * 1989-02-27 1989-10-11
JPH0228395A (en) * 1988-03-22 1990-01-30 Hitachi Constr Mach Co Ltd Method and device for removing conductor foil
JPH0475794A (en) * 1990-07-16 1992-03-10 Hitachi Constr Mach Co Ltd Optical fiber for stabilizing output beam mode in laser beam machine
US5591668A (en) * 1994-03-14 1997-01-07 Matsushita Electric Industrial Co., Ltd. Laser annealing method for a semiconductor thin film
US6060684A (en) * 1995-10-23 2000-05-09 Alps Electric Co., Ltd. Laser beam machine with mode conversion
JP2013055111A (en) * 2011-09-01 2013-03-21 Phoeton Corp Laser beam synthesizer, laser annealing device, and laser annealing method
JP2014133262A (en) * 2008-03-14 2014-07-24 Samsung Display Co Ltd Frit sealing system and method

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5577147A (en) * 1978-11-24 1980-06-10 Nat Res Dev Laser light beam diffusing unit for tempering

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5577147A (en) * 1978-11-24 1980-06-10 Nat Res Dev Laser light beam diffusing unit for tempering

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5792133A (en) * 1980-11-27 1982-06-08 Kanai Hiroyuki Heat treating device for metallic card clothing
US4676586A (en) * 1982-12-20 1987-06-30 General Electric Company Apparatus and method for performing laser material processing through a fiber optic
US4681396A (en) * 1984-10-09 1987-07-21 General Electric Company High power laser energy delivery system
JPS62214131A (en) * 1986-03-13 1987-09-19 Toyota Motor Corp Manufacture of surface remelted and chilled camshaft
JPH0228395A (en) * 1988-03-22 1990-01-30 Hitachi Constr Mach Co Ltd Method and device for removing conductor foil
JPH01147248U (en) * 1989-02-27 1989-10-11
JPH0410212Y2 (en) * 1989-02-27 1992-03-13
JPH0475794A (en) * 1990-07-16 1992-03-10 Hitachi Constr Mach Co Ltd Optical fiber for stabilizing output beam mode in laser beam machine
US5591668A (en) * 1994-03-14 1997-01-07 Matsushita Electric Industrial Co., Ltd. Laser annealing method for a semiconductor thin film
US6060684A (en) * 1995-10-23 2000-05-09 Alps Electric Co., Ltd. Laser beam machine with mode conversion
JP2014133262A (en) * 2008-03-14 2014-07-24 Samsung Display Co Ltd Frit sealing system and method
JP2013055111A (en) * 2011-09-01 2013-03-21 Phoeton Corp Laser beam synthesizer, laser annealing device, and laser annealing method

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