JPS55146927A - Film forming device - Google Patents
Film forming deviceInfo
- Publication number
- JPS55146927A JPS55146927A JP5476479A JP5476479A JPS55146927A JP S55146927 A JPS55146927 A JP S55146927A JP 5476479 A JP5476479 A JP 5476479A JP 5476479 A JP5476479 A JP 5476479A JP S55146927 A JPS55146927 A JP S55146927A
- Authority
- JP
- Japan
- Prior art keywords
- work
- evaporating
- varies
- roller
- rotates
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
- H01L21/02617—Deposition types
- H01L21/02631—Physical deposition at reduced pressure, e.g. MBE, sputtering, evaporation
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Physical Vapour Deposition (AREA)
- Chemical Vapour Deposition (AREA)
- Electrodes Of Semiconductors (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Abstract
PURPOSE:To form uniform film on work, by rotating a member supported onto a conveying member by motion of endless conveying member. CONSTITUTION:In a vacuum tank 11 in which Ar is introduced, sprocket 22 is rotated to shift hollow pin chain 23. At this time, roller 24 rotates while shifting in contact with rail 26. As supporting member 25 which is connected to the roller 24 also rotates, incoming angle of steam from an evaporating material 15 of a work 18 held on a member 25 varies within a 0-360 deg. range, and relative position also varies. In this condition, DC voltage 27 is impressed with an evaporating source as positive pole and a jig table 16 as negative pole, respectively. By cleaning the surface by electric discharge at first, displacing it with Ar and keeping it at a prescribed vacuum, and allowing the evaporating material 15 to evaporate from the evaporating source 14, a uniform film can be formed on an entire surface of the work by thus evaporated material.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5476479A JPS55146927A (en) | 1979-05-07 | 1979-05-07 | Film forming device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5476479A JPS55146927A (en) | 1979-05-07 | 1979-05-07 | Film forming device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS55146927A true JPS55146927A (en) | 1980-11-15 |
Family
ID=12979832
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5476479A Pending JPS55146927A (en) | 1979-05-07 | 1979-05-07 | Film forming device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS55146927A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57111298A (en) * | 1980-12-29 | 1982-07-10 | Fujitsu Ltd | Growth of compound semiconductor layer and its device |
JPS5818982A (en) * | 1981-07-27 | 1983-02-03 | Nec Corp | Formation of thin film by evaporation and evaporated thin film forming device |
JPS6033350A (en) * | 1983-08-03 | 1985-02-20 | Citizen Watch Co Ltd | Vacuum film forming apparatus |
JPS6298740A (en) * | 1985-10-25 | 1987-05-08 | Tokyo Electron Ltd | Dust preventing system of rotary mechanism |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4979783A (en) * | 1972-12-08 | 1974-08-01 | ||
JPS52115185A (en) * | 1976-03-24 | 1977-09-27 | Hitachi Ltd | Vapor phase growing apparatus |
-
1979
- 1979-05-07 JP JP5476479A patent/JPS55146927A/en active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4979783A (en) * | 1972-12-08 | 1974-08-01 | ||
JPS52115185A (en) * | 1976-03-24 | 1977-09-27 | Hitachi Ltd | Vapor phase growing apparatus |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57111298A (en) * | 1980-12-29 | 1982-07-10 | Fujitsu Ltd | Growth of compound semiconductor layer and its device |
JPS5818982A (en) * | 1981-07-27 | 1983-02-03 | Nec Corp | Formation of thin film by evaporation and evaporated thin film forming device |
JPH0363231B2 (en) * | 1981-07-27 | 1991-09-30 | Nippon Electric Co | |
JPS6033350A (en) * | 1983-08-03 | 1985-02-20 | Citizen Watch Co Ltd | Vacuum film forming apparatus |
JPS6298740A (en) * | 1985-10-25 | 1987-05-08 | Tokyo Electron Ltd | Dust preventing system of rotary mechanism |
JPH0574938B2 (en) * | 1985-10-25 | 1993-10-19 | Tokyo Electron Ltd |
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