JPS55142347A - Lithographic plate making method - Google Patents
Lithographic plate making methodInfo
- Publication number
- JPS55142347A JPS55142347A JP4996479A JP4996479A JPS55142347A JP S55142347 A JPS55142347 A JP S55142347A JP 4996479 A JP4996479 A JP 4996479A JP 4996479 A JP4996479 A JP 4996479A JP S55142347 A JPS55142347 A JP S55142347A
- Authority
- JP
- Japan
- Prior art keywords
- photosensitive
- lithographic plate
- contg
- developer
- water
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- DHKHKXVYLBGOIT-UHFFFAOYSA-N 1,1-Diethoxyethane Chemical compound CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 abstract 3
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 abstract 2
- 239000011354 acetal resin Substances 0.000 abstract 2
- 229920006324 polyoxymethylene Polymers 0.000 abstract 2
- 239000002904 solvent Substances 0.000 abstract 2
- 229920002554 vinyl polymer Polymers 0.000 abstract 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 2
- SBASXUCJHJRPEV-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethanol Chemical compound COCCOCCO SBASXUCJHJRPEV-UHFFFAOYSA-N 0.000 abstract 1
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 abstract 1
- 239000004372 Polyvinyl alcohol Substances 0.000 abstract 1
- 239000004115 Sodium Silicate Substances 0.000 abstract 1
- 150000001241 acetals Chemical class 0.000 abstract 1
- 239000002253 acid Substances 0.000 abstract 1
- 239000003513 alkali Substances 0.000 abstract 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 abstract 1
- VEZXCJBBBCKRPI-UHFFFAOYSA-N beta-propiolactone Chemical compound O=C1CCO1 VEZXCJBBBCKRPI-UHFFFAOYSA-N 0.000 abstract 1
- 239000003975 dentin desensitizing agent Substances 0.000 abstract 1
- 125000002485 formyl group Chemical class [H]C(*)=O 0.000 abstract 1
- 239000003112 inhibitor Substances 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 229920002451 polyvinyl alcohol Polymers 0.000 abstract 1
- 229960000380 propiolactone Drugs 0.000 abstract 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 abstract 1
- 229910052911 sodium silicate Inorganic materials 0.000 abstract 1
- 238000005406 washing Methods 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4996479A JPS55142347A (en) | 1979-04-23 | 1979-04-23 | Lithographic plate making method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4996479A JPS55142347A (en) | 1979-04-23 | 1979-04-23 | Lithographic plate making method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS55142347A true JPS55142347A (en) | 1980-11-06 |
| JPS6363901B2 JPS6363901B2 (enrdf_load_stackoverflow) | 1988-12-08 |
Family
ID=12845699
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4996479A Granted JPS55142347A (en) | 1979-04-23 | 1979-04-23 | Lithographic plate making method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS55142347A (enrdf_load_stackoverflow) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0366101U (enrdf_load_stackoverflow) * | 1989-10-30 | 1991-06-27 |
-
1979
- 1979-04-23 JP JP4996479A patent/JPS55142347A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6363901B2 (enrdf_load_stackoverflow) | 1988-12-08 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR880001192B1 (ko) | 광(光)경화성 혼합물 및 감광성 복사재료 | |
| BR8101905A (pt) | Solucao reveladora e processo para revelacao de camadas de reproducao que trabalham negativamente | |
| JPS5625739A (en) | Preparation of printing plate | |
| DE3485477D1 (de) | Positive photolackzusammensetzung. | |
| GB1481935A (en) | Method of dissolving positive photoresist | |
| US3669660A (en) | Lithographic plate developing composition and process of use thereof | |
| FI810229L (fi) | Behandling av foer straolning kaensliga plattor | |
| ATE46582T1 (de) | Positiv arbeitendes verfahren zur herstellung von relief- und druckformen. | |
| KR860003536A (ko) | 감광성 내식막 처리액 | |
| KR900700922A (ko) | 수성 현상용액 및 포지티브-작용성 감광성 내식막 조성물 현상에 있어서의 이의 용도 | |
| MY112943A (en) | Method for treating photolithographic developer and stripper waste streams containing resist or solder mask and gamma butyrolactone or benzyl alcohol | |
| JPS5660442A (en) | Photosensitive lithographic plate and method for making lithographic plate | |
| ATE435441T1 (de) | Lösemittelsystem für positiv-arbeitende photoresiste | |
| JPS55142347A (en) | Lithographic plate making method | |
| GB1455130A (en) | Developing process | |
| WO1997023808A3 (en) | A mixed solvent system for positive photoresists | |
| JPS55120032A (en) | Treating solution for photosensitive laminate having alcohol-soluble polyamide layer | |
| SE8104133L (sv) | Bildning av ytmonster | |
| JPS5559459A (en) | Resist developing solution and developing method | |
| JPS561934A (en) | Manufacture of resist image | |
| GB1230607A (enrdf_load_stackoverflow) | ||
| JPS55134847A (en) | Manufacture of resist image | |
| JPS575045A (en) | Developing method for photosensitive lithographic plate | |
| JPS5552054A (en) | Developing solution composition | |
| JPS55137527A (en) | Image forming material processing method |