JPS5514087B2 - - Google Patents

Info

Publication number
JPS5514087B2
JPS5514087B2 JP9928973A JP9928973A JPS5514087B2 JP S5514087 B2 JPS5514087 B2 JP S5514087B2 JP 9928973 A JP9928973 A JP 9928973A JP 9928973 A JP9928973 A JP 9928973A JP S5514087 B2 JPS5514087 B2 JP S5514087B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP9928973A
Other languages
Japanese (ja)
Other versions
JPS5050106A (de
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP9928973A priority Critical patent/JPS5514087B2/ja
Priority to GB3873374A priority patent/GB1489425A/en
Priority to FR7430950A priority patent/FR2242702A1/fr
Priority to DE19742442527 priority patent/DE2442527C3/de
Publication of JPS5050106A publication Critical patent/JPS5050106A/ja
Publication of JPS5514087B2 publication Critical patent/JPS5514087B2/ja
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable
JP9928973A 1973-09-05 1973-09-05 Expired JPS5514087B2 (de)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP9928973A JPS5514087B2 (de) 1973-09-05 1973-09-05
GB3873374A GB1489425A (en) 1973-09-05 1974-09-04 Photo-curable resin compositions
FR7430950A FR2242702A1 (de) 1973-09-05 1974-09-04
DE19742442527 DE2442527C3 (de) 1973-09-05 1974-09-05 Photohärtbare Harzmasse auf Basis eines modifizierten Epoxidharzes

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9928973A JPS5514087B2 (de) 1973-09-05 1973-09-05

Publications (2)

Publication Number Publication Date
JPS5050106A JPS5050106A (de) 1975-05-06
JPS5514087B2 true JPS5514087B2 (de) 1980-04-14

Family

ID=14243473

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9928973A Expired JPS5514087B2 (de) 1973-09-05 1973-09-05

Country Status (4)

Country Link
JP (1) JPS5514087B2 (de)
DE (1) DE2442527C3 (de)
FR (1) FR2242702A1 (de)
GB (1) GB1489425A (de)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4390615A (en) 1979-11-05 1983-06-28 Courtney Robert W Coating compositions
US4451636A (en) * 1981-01-16 1984-05-29 W. R. Grace & Co. Polymer composition having terminal alkene and terminal carboxyl groups
US4436806A (en) 1981-01-16 1984-03-13 W. R. Grace & Co. Method and apparatus for making printed circuit boards
US4481281A (en) * 1981-01-16 1984-11-06 W. R. Grace & Co. Polymer composition having terminal alkene and terminal carboxyl groups
US4422914A (en) 1981-01-16 1983-12-27 W. R. Grace & Co. Polymer composition having terminal alkene and terminal carboxyl groups
US4442198A (en) * 1981-01-16 1984-04-10 W. R. Grace & Co. Polymer composition having terminal alkene and terminal carboxyl groups
EP0091401B1 (de) * 1982-04-03 1986-11-20 Ciba-Geigy Ag Herstellung von Prepregs aus cellulosehaltigen Fasern unter Verwendung wässriger Harzzusammensetzungen
US4393181A (en) 1982-06-30 1983-07-12 Shell Oil Company Polyfunctional phenolic-melamine epoxy resin curing agents
DE3447357A1 (de) * 1984-12-24 1986-07-03 Basf Ag, 6700 Ludwigshafen Trockenfilmresist und verfahren zur herstellung von resistmustern
DE3447355A1 (de) * 1984-12-24 1986-07-03 Basf Ag, 6700 Ludwigshafen Vernetzbares harz, lichtempfindliches aufzeichnungsmaterial auf basis dieses vernetzbaren harzes sowie verfahren zur herstellung einer flachdruckplatte mittels dieses lichtempfindlichen aufzeichnungsmaterials
JPS61243869A (ja) * 1985-04-19 1986-10-30 Taiyo Ink Seizo Kk レジストインキ組成物
DE3619129A1 (de) * 1986-06-06 1987-12-10 Basf Ag Lichtempfindliches aufzeichnungselement
JPS63186232A (ja) * 1987-01-28 1988-08-01 Toyobo Co Ltd 感光性樹脂組成物
EP0292219A3 (de) * 1987-05-21 1989-10-11 AT&T Corp. Verfahren zur Herstellung von Grundplatten für gedruckte Schaltungen
DE3717038A1 (de) * 1987-05-21 1988-12-08 Basf Ag Photopolymerisierbare aufzeichnungsmaterialien sowie photoresistschichten und flachdruckplatten auf basis dieser aufzeichnungsmaterialien
DE3717034A1 (de) * 1987-05-21 1988-12-08 Basf Ag Photopolymerisierbare aufzeichnungsmaterialien sowie photoresistschichten und flachdruckplatten auf basis dieser aufzeichnungsmaterialien, sowie neue chinazolon-4-verbindungen
DE3717037A1 (de) * 1987-05-21 1988-12-08 Basf Ag Photopolymerisierbare aufzeichnungsmaterialien sowie photoresistschichten und flachdruckplatten auf basis dieser aufzeichnungsmaterialien
DE3717036A1 (de) * 1987-05-21 1988-12-08 Basf Ag Photopolymerisierbare aufzeichnungsmaterialien sowie photoresistschichten und flachdruckplatten auf basis dieser aufzeichnungsmaterialien
GB8804044D0 (en) * 1988-02-22 1988-03-23 Coates Brothers Plc Coating compositions
US5102775A (en) * 1988-09-30 1992-04-07 Kansai Paint Co., Ltd. Visible light sensitive electrodeposition coating composition and image-forming method using the same
WO1996034316A1 (en) * 1995-04-27 1996-10-31 Minnesota Mining And Manufacturing Company Negative-acting no-process printing plates
US5925497A (en) * 1995-04-27 1999-07-20 Minnesota Mining And Manufacturing Company Negative-acting no-process printing plates
CN113583222B (zh) * 2021-08-24 2023-03-24 濮阳市盛源能源科技股份有限公司 一种嵌段共聚型可降解聚酯及其制备方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS492601A (de) * 1972-04-24 1974-01-10

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS492601A (de) * 1972-04-24 1974-01-10

Also Published As

Publication number Publication date
GB1489425A (en) 1977-10-19
FR2242702A1 (de) 1975-03-28
JPS5050106A (de) 1975-05-06
DE2442527A1 (de) 1975-04-03
DE2442527B2 (de) 1976-08-12
DE2442527C3 (de) 1980-04-10

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