JPS55133414A - Photosensitive resin composition - Google Patents
Photosensitive resin compositionInfo
- Publication number
- JPS55133414A JPS55133414A JP4165679A JP4165679A JPS55133414A JP S55133414 A JPS55133414 A JP S55133414A JP 4165679 A JP4165679 A JP 4165679A JP 4165679 A JP4165679 A JP 4165679A JP S55133414 A JPS55133414 A JP S55133414A
- Authority
- JP
- Japan
- Prior art keywords
- product
- reacting
- epoxy
- molecule
- photosensitive resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Macromonomer-Based Addition Polymer (AREA)
Abstract
PURPOSE: To prepare a photosensitive resin composition having excellent flexibility, adhesivity, air drying characteristics, curability, and storage stability, and useful as a raw material of paint, letter press, etc., by compounding a specific reaction product, an unsaturated epoxyester, a polymerizable monomer, and a photosensitizer.
CONSTITUTION: A composition composed of (A) a reaction product obtained by (1) reacting (i) an epoxy compound having two or more epoxy groups in a molecule with (ii) 0.1W0.95 equivalent, based on the epoxy group, of (meth)acrylic acid, (2) reacting the above product with (iii) an amino compound having two or more active hydrogen atoms in a molecule to obtain the product wherein the equivalent ratio of the active hydrogen atom to the residual epoxy group is 0.5W1.1, and (3) reacting the product with (iv) a polyisocyanate compound to obtain the product wherein the equivalent ratio of the isocyanate group to the unreacted hydroxyl group is 0.05W0.7, (B) an unsaturated epoxyester, (C) a polymerizable monomer such as hydroxyalkyl acrylate, and (D) a photo-sensitizer. The amounts of the components (A)-(D) are adjusted to satisfy the formulas IWIII (weight ratio).
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4165679A JPS55133414A (en) | 1979-04-05 | 1979-04-05 | Photosensitive resin composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4165679A JPS55133414A (en) | 1979-04-05 | 1979-04-05 | Photosensitive resin composition |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS55133414A true JPS55133414A (en) | 1980-10-17 |
Family
ID=12614402
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4165679A Pending JPS55133414A (en) | 1979-04-05 | 1979-04-05 | Photosensitive resin composition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS55133414A (en) |
-
1979
- 1979-04-05 JP JP4165679A patent/JPS55133414A/en active Pending
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