JPS55133414A - Photosensitive resin composition - Google Patents

Photosensitive resin composition

Info

Publication number
JPS55133414A
JPS55133414A JP4165679A JP4165679A JPS55133414A JP S55133414 A JPS55133414 A JP S55133414A JP 4165679 A JP4165679 A JP 4165679A JP 4165679 A JP4165679 A JP 4165679A JP S55133414 A JPS55133414 A JP S55133414A
Authority
JP
Japan
Prior art keywords
product
reacting
epoxy
molecule
photosensitive resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4165679A
Other languages
Japanese (ja)
Inventor
Kazuo Akagane
Ikuo Yoshiga
Yasuo Akita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Chemical Co Ltd
Original Assignee
Sumitomo Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Chemical Co Ltd filed Critical Sumitomo Chemical Co Ltd
Priority to JP4165679A priority Critical patent/JPS55133414A/en
Publication of JPS55133414A publication Critical patent/JPS55133414A/en
Pending legal-status Critical Current

Links

Landscapes

  • Macromonomer-Based Addition Polymer (AREA)

Abstract

PURPOSE: To prepare a photosensitive resin composition having excellent flexibility, adhesivity, air drying characteristics, curability, and storage stability, and useful as a raw material of paint, letter press, etc., by compounding a specific reaction product, an unsaturated epoxyester, a polymerizable monomer, and a photosensitizer.
CONSTITUTION: A composition composed of (A) a reaction product obtained by (1) reacting (i) an epoxy compound having two or more epoxy groups in a molecule with (ii) 0.1W0.95 equivalent, based on the epoxy group, of (meth)acrylic acid, (2) reacting the above product with (iii) an amino compound having two or more active hydrogen atoms in a molecule to obtain the product wherein the equivalent ratio of the active hydrogen atom to the residual epoxy group is 0.5W1.1, and (3) reacting the product with (iv) a polyisocyanate compound to obtain the product wherein the equivalent ratio of the isocyanate group to the unreacted hydroxyl group is 0.05W0.7, (B) an unsaturated epoxyester, (C) a polymerizable monomer such as hydroxyalkyl acrylate, and (D) a photo-sensitizer. The amounts of the components (A)-(D) are adjusted to satisfy the formulas IWIII (weight ratio).
COPYRIGHT: (C)1980,JPO&Japio
JP4165679A 1979-04-05 1979-04-05 Photosensitive resin composition Pending JPS55133414A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4165679A JPS55133414A (en) 1979-04-05 1979-04-05 Photosensitive resin composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4165679A JPS55133414A (en) 1979-04-05 1979-04-05 Photosensitive resin composition

Publications (1)

Publication Number Publication Date
JPS55133414A true JPS55133414A (en) 1980-10-17

Family

ID=12614402

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4165679A Pending JPS55133414A (en) 1979-04-05 1979-04-05 Photosensitive resin composition

Country Status (1)

Country Link
JP (1) JPS55133414A (en)

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