JPS562313A - Photosensitive grafted unsaturated resin and photosensitive resin composition containing the same - Google Patents
Photosensitive grafted unsaturated resin and photosensitive resin composition containing the sameInfo
- Publication number
- JPS562313A JPS562313A JP7770479A JP7770479A JPS562313A JP S562313 A JPS562313 A JP S562313A JP 7770479 A JP7770479 A JP 7770479A JP 7770479 A JP7770479 A JP 7770479A JP S562313 A JPS562313 A JP S562313A
- Authority
- JP
- Japan
- Prior art keywords
- photosensitive
- resin composition
- compound
- prepared
- grafted unsaturated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Polymerisation Methods In General (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Abstract
PURPOSE: To prepare a photosensitive resin composition useful for coatings, printing inks, etc., having high curing rate, flexibility, hardness and adhesivity and containing a photosensitive grafted unsaturated resin prepared by reacting a specific liquid polymer with a monoepoxy compound and an acid anhydride, as a main component.
CONSTITUTION: A photosensitive resin composition comprising (1) a photosensitive grafted unsaturated resin as the main component, prepared from (A) a liquid polymer having a molecular weight of 2,000W10,000 [a polymer prepared from 5W50wt% of a hydroxyl group-containing monomer (e.g. hydroxyalkyl acrylate) and 95W50wt% of a nonfunctional monomer copolymerizable therewith (e.g. alkyl acrylate)], (B) a monoepoxy compound (pref. glycidyl acrylate) and (C) an acid anhydride (pref. endic anhydride), (2) a photosensitizer and (3) a polymerizable unsaturated compound (e.g. vinyl monomer). At least one of (B) and (C) is a compound having a polymerizable double bond.
COPYRIGHT: (C)1981,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7770479A JPS562313A (en) | 1979-06-20 | 1979-06-20 | Photosensitive grafted unsaturated resin and photosensitive resin composition containing the same |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7770479A JPS562313A (en) | 1979-06-20 | 1979-06-20 | Photosensitive grafted unsaturated resin and photosensitive resin composition containing the same |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS562313A true JPS562313A (en) | 1981-01-12 |
Family
ID=13641279
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7770479A Pending JPS562313A (en) | 1979-06-20 | 1979-06-20 | Photosensitive grafted unsaturated resin and photosensitive resin composition containing the same |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS562313A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59166944A (en) * | 1983-03-11 | 1984-09-20 | Sekisui Chem Co Ltd | Photosensitive composition |
JPS61148444A (en) * | 1984-12-21 | 1986-07-07 | Mitsubishi Chem Ind Ltd | Photopolymerizable composition |
-
1979
- 1979-06-20 JP JP7770479A patent/JPS562313A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59166944A (en) * | 1983-03-11 | 1984-09-20 | Sekisui Chem Co Ltd | Photosensitive composition |
JPH0310296B2 (en) * | 1983-03-11 | 1991-02-13 | Sekisui Chemical Co Ltd | |
JPS61148444A (en) * | 1984-12-21 | 1986-07-07 | Mitsubishi Chem Ind Ltd | Photopolymerizable composition |
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