JPS562313A - Photosensitive grafted unsaturated resin and photosensitive resin composition containing the same - Google Patents

Photosensitive grafted unsaturated resin and photosensitive resin composition containing the same

Info

Publication number
JPS562313A
JPS562313A JP7770479A JP7770479A JPS562313A JP S562313 A JPS562313 A JP S562313A JP 7770479 A JP7770479 A JP 7770479A JP 7770479 A JP7770479 A JP 7770479A JP S562313 A JPS562313 A JP S562313A
Authority
JP
Japan
Prior art keywords
photosensitive
resin composition
compound
prepared
grafted unsaturated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7770479A
Other languages
Japanese (ja)
Inventor
Shigehiko Yoshioka
Iwao Sugiyama
Yoshinobu Nagai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Kagaku Kogyo Co Ltd
Original Assignee
Seiko Kagaku Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Kagaku Kogyo Co Ltd filed Critical Seiko Kagaku Kogyo Co Ltd
Priority to JP7770479A priority Critical patent/JPS562313A/en
Publication of JPS562313A publication Critical patent/JPS562313A/en
Pending legal-status Critical Current

Links

Landscapes

  • Polymerisation Methods In General (AREA)
  • Macromonomer-Based Addition Polymer (AREA)

Abstract

PURPOSE: To prepare a photosensitive resin composition useful for coatings, printing inks, etc., having high curing rate, flexibility, hardness and adhesivity and containing a photosensitive grafted unsaturated resin prepared by reacting a specific liquid polymer with a monoepoxy compound and an acid anhydride, as a main component.
CONSTITUTION: A photosensitive resin composition comprising (1) a photosensitive grafted unsaturated resin as the main component, prepared from (A) a liquid polymer having a molecular weight of 2,000W10,000 [a polymer prepared from 5W50wt% of a hydroxyl group-containing monomer (e.g. hydroxyalkyl acrylate) and 95W50wt% of a nonfunctional monomer copolymerizable therewith (e.g. alkyl acrylate)], (B) a monoepoxy compound (pref. glycidyl acrylate) and (C) an acid anhydride (pref. endic anhydride), (2) a photosensitizer and (3) a polymerizable unsaturated compound (e.g. vinyl monomer). At least one of (B) and (C) is a compound having a polymerizable double bond.
COPYRIGHT: (C)1981,JPO&Japio
JP7770479A 1979-06-20 1979-06-20 Photosensitive grafted unsaturated resin and photosensitive resin composition containing the same Pending JPS562313A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7770479A JPS562313A (en) 1979-06-20 1979-06-20 Photosensitive grafted unsaturated resin and photosensitive resin composition containing the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7770479A JPS562313A (en) 1979-06-20 1979-06-20 Photosensitive grafted unsaturated resin and photosensitive resin composition containing the same

Publications (1)

Publication Number Publication Date
JPS562313A true JPS562313A (en) 1981-01-12

Family

ID=13641279

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7770479A Pending JPS562313A (en) 1979-06-20 1979-06-20 Photosensitive grafted unsaturated resin and photosensitive resin composition containing the same

Country Status (1)

Country Link
JP (1) JPS562313A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59166944A (en) * 1983-03-11 1984-09-20 Sekisui Chem Co Ltd Photosensitive composition
JPS61148444A (en) * 1984-12-21 1986-07-07 Mitsubishi Chem Ind Ltd Photopolymerizable composition

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59166944A (en) * 1983-03-11 1984-09-20 Sekisui Chem Co Ltd Photosensitive composition
JPH0310296B2 (en) * 1983-03-11 1991-02-13 Sekisui Chemical Co Ltd
JPS61148444A (en) * 1984-12-21 1986-07-07 Mitsubishi Chem Ind Ltd Photopolymerizable composition

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