JPS5512732A - Sputtering apparatus for making thin magnetic film - Google Patents
Sputtering apparatus for making thin magnetic filmInfo
- Publication number
- JPS5512732A JPS5512732A JP8522978A JP8522978A JPS5512732A JP S5512732 A JPS5512732 A JP S5512732A JP 8522978 A JP8522978 A JP 8522978A JP 8522978 A JP8522978 A JP 8522978A JP S5512732 A JPS5512732 A JP S5512732A
- Authority
- JP
- Japan
- Prior art keywords
- target
- chrome
- making
- cobalt
- alloy
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Physical Vapour Deposition (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Thin Magnetic Films (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8522978A JPS5512732A (en) | 1978-07-14 | 1978-07-14 | Sputtering apparatus for making thin magnetic film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8522978A JPS5512732A (en) | 1978-07-14 | 1978-07-14 | Sputtering apparatus for making thin magnetic film |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5512732A true JPS5512732A (en) | 1980-01-29 |
| JPS6151410B2 JPS6151410B2 (enrdf_load_stackoverflow) | 1986-11-08 |
Family
ID=13852729
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8522978A Granted JPS5512732A (en) | 1978-07-14 | 1978-07-14 | Sputtering apparatus for making thin magnetic film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5512732A (enrdf_load_stackoverflow) |
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5734324A (en) * | 1980-08-08 | 1982-02-24 | Teijin Ltd | Manufacture of vertically magnetized film |
| JPS57157511A (en) * | 1981-03-24 | 1982-09-29 | Teijin Ltd | Opposite target type sputtering device |
| JPS59190364A (ja) * | 1984-03-23 | 1984-10-29 | Hitachi Ltd | スパツタリング装置 |
| JPS60182712A (ja) * | 1984-02-29 | 1985-09-18 | Anelva Corp | 強磁性体タ−ゲツト |
| US4626336A (en) * | 1985-05-02 | 1986-12-02 | Hewlett Packard Company | Target for sputter depositing thin films |
| US4834855A (en) * | 1985-05-02 | 1989-05-30 | Hewlett-Packard Company | Method for sputter depositing thin films |
| US5458759A (en) * | 1991-08-02 | 1995-10-17 | Anelva Corporation | Magnetron sputtering cathode apparatus |
| US5464518A (en) * | 1993-01-15 | 1995-11-07 | The Boc Group, Inc. | Cylindrical magnetron shield structure |
| US5470452A (en) * | 1990-08-10 | 1995-11-28 | Viratec Thin Films, Inc. | Shielding for arc suppression in rotating magnetron sputtering systems |
| US5527439A (en) * | 1995-01-23 | 1996-06-18 | The Boc Group, Inc. | Cylindrical magnetron shield structure |
-
1978
- 1978-07-14 JP JP8522978A patent/JPS5512732A/ja active Granted
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5734324A (en) * | 1980-08-08 | 1982-02-24 | Teijin Ltd | Manufacture of vertically magnetized film |
| JPS57157511A (en) * | 1981-03-24 | 1982-09-29 | Teijin Ltd | Opposite target type sputtering device |
| JPS60182712A (ja) * | 1984-02-29 | 1985-09-18 | Anelva Corp | 強磁性体タ−ゲツト |
| JPS59190364A (ja) * | 1984-03-23 | 1984-10-29 | Hitachi Ltd | スパツタリング装置 |
| US4626336A (en) * | 1985-05-02 | 1986-12-02 | Hewlett Packard Company | Target for sputter depositing thin films |
| US4834855A (en) * | 1985-05-02 | 1989-05-30 | Hewlett-Packard Company | Method for sputter depositing thin films |
| US5470452A (en) * | 1990-08-10 | 1995-11-28 | Viratec Thin Films, Inc. | Shielding for arc suppression in rotating magnetron sputtering systems |
| US5725746A (en) * | 1990-08-10 | 1998-03-10 | Viratec Thin Films, Inc. | Shielding for arc suppression in rotating magnetron sputtering systems |
| US5458759A (en) * | 1991-08-02 | 1995-10-17 | Anelva Corporation | Magnetron sputtering cathode apparatus |
| US5464518A (en) * | 1993-01-15 | 1995-11-07 | The Boc Group, Inc. | Cylindrical magnetron shield structure |
| US5527439A (en) * | 1995-01-23 | 1996-06-18 | The Boc Group, Inc. | Cylindrical magnetron shield structure |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6151410B2 (enrdf_load_stackoverflow) | 1986-11-08 |
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