JPS55122870A - Vacuum vapor deposition method - Google Patents
Vacuum vapor deposition methodInfo
- Publication number
- JPS55122870A JPS55122870A JP2855579A JP2855579A JPS55122870A JP S55122870 A JPS55122870 A JP S55122870A JP 2855579 A JP2855579 A JP 2855579A JP 2855579 A JP2855579 A JP 2855579A JP S55122870 A JPS55122870 A JP S55122870A
- Authority
- JP
- Japan
- Prior art keywords
- crucible
- temperature
- vapor deposition
- liquid
- shutter
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
- C23C14/543—Controlling the film thickness or evaporation rate using measurement on the vapor source
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Electrodes Of Semiconductors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2855579A JPS55122870A (en) | 1979-03-12 | 1979-03-12 | Vacuum vapor deposition method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2855579A JPS55122870A (en) | 1979-03-12 | 1979-03-12 | Vacuum vapor deposition method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS55122870A true JPS55122870A (en) | 1980-09-20 |
JPS6130028B2 JPS6130028B2 (enrdf_load_stackoverflow) | 1986-07-10 |
Family
ID=12251890
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2855579A Granted JPS55122870A (en) | 1979-03-12 | 1979-03-12 | Vacuum vapor deposition method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS55122870A (enrdf_load_stackoverflow) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63259833A (ja) * | 1987-04-17 | 1988-10-26 | Fuji Photo Film Co Ltd | 磁気記録媒体の製造装置 |
JPS63259835A (ja) * | 1987-04-17 | 1988-10-26 | Fuji Photo Film Co Ltd | 磁気記録媒体の製造装置 |
JP2007023319A (ja) * | 2005-07-13 | 2007-02-01 | Sumitomo Electric Ind Ltd | 真空蒸着装置および真空蒸着装置の運転方法 |
JP2011052301A (ja) * | 2009-09-04 | 2011-03-17 | Hitachi Zosen Corp | 真空蒸着用蒸着材料の蒸発、昇華方法および真空蒸着用るつぼ装置 |
US8020314B2 (en) * | 2008-10-31 | 2011-09-20 | Corning Incorporated | Methods and apparatus for drying ceramic green bodies with microwaves |
US8075693B2 (en) | 2007-08-23 | 2011-12-13 | Samsung Mobile Display Co., Ltd. | Crucible heating apparatus and deposition apparatus including the same |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0418902U (enrdf_load_stackoverflow) * | 1990-06-06 | 1992-02-18 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5347382A (en) * | 1976-10-13 | 1978-04-27 | Citizen Watch Co Ltd | Shutter mechanism for evaporation source of vacuum evaporation apparatus |
-
1979
- 1979-03-12 JP JP2855579A patent/JPS55122870A/ja active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5347382A (en) * | 1976-10-13 | 1978-04-27 | Citizen Watch Co Ltd | Shutter mechanism for evaporation source of vacuum evaporation apparatus |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63259833A (ja) * | 1987-04-17 | 1988-10-26 | Fuji Photo Film Co Ltd | 磁気記録媒体の製造装置 |
JPS63259835A (ja) * | 1987-04-17 | 1988-10-26 | Fuji Photo Film Co Ltd | 磁気記録媒体の製造装置 |
JP2007023319A (ja) * | 2005-07-13 | 2007-02-01 | Sumitomo Electric Ind Ltd | 真空蒸着装置および真空蒸着装置の運転方法 |
US8075693B2 (en) | 2007-08-23 | 2011-12-13 | Samsung Mobile Display Co., Ltd. | Crucible heating apparatus and deposition apparatus including the same |
US8020314B2 (en) * | 2008-10-31 | 2011-09-20 | Corning Incorporated | Methods and apparatus for drying ceramic green bodies with microwaves |
JP2011052301A (ja) * | 2009-09-04 | 2011-03-17 | Hitachi Zosen Corp | 真空蒸着用蒸着材料の蒸発、昇華方法および真空蒸着用るつぼ装置 |
Also Published As
Publication number | Publication date |
---|---|
JPS6130028B2 (enrdf_load_stackoverflow) | 1986-07-10 |
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