JPS55108731A - Cleaning method - Google Patents
Cleaning methodInfo
- Publication number
- JPS55108731A JPS55108731A JP1560379A JP1560379A JPS55108731A JP S55108731 A JPS55108731 A JP S55108731A JP 1560379 A JP1560379 A JP 1560379A JP 1560379 A JP1560379 A JP 1560379A JP S55108731 A JPS55108731 A JP S55108731A
- Authority
- JP
- Japan
- Prior art keywords
- chemical
- cleaning
- injected
- water
- solution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Weting (AREA)
Abstract
PURPOSE: To enable the storage of cleaning chemical in gaseous form and reduse the volume to be stored while the cheaning is operated in a chemical treatment box only sanitarily, by a method wherein a water solution is prepared by injecting a gaseous chemical into water and thereby cleaning work is performed conveniently.
CONSTITUTION: Ammonia gas is injected into a water solution of H2O2 and thereby a mixed solution such that NH4OH:H2O2:H2O=4:1:4 is produced. In cleaning a silicon wafer initially, this solution is used to remove heavy metal or organic substances. In this case, cleaning is operated at temperatures 60W80°C in the conventional method. But when NH3 is injected, the temperature rises due to the reaction heat. This is convenient. A chemical gas bomb is connected to gaseous chemical inlet 1, and the gas is injected into high purity water 2 in a quartz container, and it is discharged from discharge port 3. When a required amount is formed, it is taken out for use by operating cock 4.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1560379A JPS55108731A (en) | 1979-02-13 | 1979-02-13 | Cleaning method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1560379A JPS55108731A (en) | 1979-02-13 | 1979-02-13 | Cleaning method |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS55108731A true JPS55108731A (en) | 1980-08-21 |
Family
ID=11893289
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1560379A Pending JPS55108731A (en) | 1979-02-13 | 1979-02-13 | Cleaning method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS55108731A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6025532A (en) * | 1983-07-21 | 1985-02-08 | Showa Denko Kk | Preparation of high quality aqueous solution |
JPH0496329A (en) * | 1990-08-14 | 1992-03-27 | Kawasaki Steel Corp | Manufacture of semiconductor device |
US5196134A (en) * | 1989-12-20 | 1993-03-23 | Hughes Aircraft Company | Peroxide composition for removing organic contaminants and method of using same |
-
1979
- 1979-02-13 JP JP1560379A patent/JPS55108731A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6025532A (en) * | 1983-07-21 | 1985-02-08 | Showa Denko Kk | Preparation of high quality aqueous solution |
JPS6210683B2 (en) * | 1983-07-21 | 1987-03-07 | Showa Denko Kk | |
US5196134A (en) * | 1989-12-20 | 1993-03-23 | Hughes Aircraft Company | Peroxide composition for removing organic contaminants and method of using same |
JPH0496329A (en) * | 1990-08-14 | 1992-03-27 | Kawasaki Steel Corp | Manufacture of semiconductor device |
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