JPS55105330A - Method for mask alignment - Google Patents

Method for mask alignment

Info

Publication number
JPS55105330A
JPS55105330A JP1310479A JP1310479A JPS55105330A JP S55105330 A JPS55105330 A JP S55105330A JP 1310479 A JP1310479 A JP 1310479A JP 1310479 A JP1310479 A JP 1310479A JP S55105330 A JPS55105330 A JP S55105330A
Authority
JP
Japan
Prior art keywords
deviation
wafer
mask
alignment
lod
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1310479A
Other languages
Japanese (ja)
Other versions
JPS6156864B2 (en
Inventor
Takuma Nakamura
Kazumi Sugizaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHIYOU LSI GIJUTSU KENKYU KUMIAI
CHO LSI GIJUTSU KENKYU KUMIAI
Original Assignee
CHIYOU LSI GIJUTSU KENKYU KUMIAI
CHO LSI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHIYOU LSI GIJUTSU KENKYU KUMIAI, CHO LSI GIJUTSU KENKYU KUMIAI filed Critical CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority to JP1310479A priority Critical patent/JPS55105330A/en
Publication of JPS55105330A publication Critical patent/JPS55105330A/en
Publication of JPS6156864B2 publication Critical patent/JPS6156864B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045—Object or beam position registration

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE:To gain a precise mask alignment by a process wherein repetition of alignment is performed until a expected value is obtained by reducing deviation throughout the fiscing process of the mask or wafer from begining to end by measuring of the deviation. CONSTITUTION:The signal related to relative position between the mask and the wafer is transmitted from aligner 60 and aligner controller 61, and the computor 64 is made to read the deviation of the wafer relative to the mask through the A-D converter 72 and the output-input interface 74. Alignment is completed when the deviation ranges within the allowable limit but repeated during the deviation ranges outside the allowable limit. Consequently the descending command is applied to the controller 61 through input-output interface 63, and the piston lod on which the wafer is put on is descended first, and next x-y-z motor actuators 67 are drived and correction into the allowable range is made. After this process, the piston lod is brought back by the rising command from the computer 64.
JP1310479A 1979-02-06 1979-02-06 Method for mask alignment Granted JPS55105330A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1310479A JPS55105330A (en) 1979-02-06 1979-02-06 Method for mask alignment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1310479A JPS55105330A (en) 1979-02-06 1979-02-06 Method for mask alignment

Publications (2)

Publication Number Publication Date
JPS55105330A true JPS55105330A (en) 1980-08-12
JPS6156864B2 JPS6156864B2 (en) 1986-12-04

Family

ID=11823835

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1310479A Granted JPS55105330A (en) 1979-02-06 1979-02-06 Method for mask alignment

Country Status (1)

Country Link
JP (1) JPS55105330A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010147253A (en) * 2008-12-18 2010-07-01 Nippon Telegr & Teleph Corp <Ntt> Positioning method, photomask and wafer

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010147253A (en) * 2008-12-18 2010-07-01 Nippon Telegr & Teleph Corp <Ntt> Positioning method, photomask and wafer

Also Published As

Publication number Publication date
JPS6156864B2 (en) 1986-12-04

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