JPS55104483A - Ion etching method - Google Patents
Ion etching methodInfo
- Publication number
- JPS55104483A JPS55104483A JP911679A JP911679A JPS55104483A JP S55104483 A JPS55104483 A JP S55104483A JP 911679 A JP911679 A JP 911679A JP 911679 A JP911679 A JP 911679A JP S55104483 A JPS55104483 A JP S55104483A
- Authority
- JP
- Japan
- Prior art keywords
- voltage
- current
- etching
- discharge
- plasma
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Drying Of Semiconductors (AREA)
- ing And Chemical Polishing (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP911679A JPS55104483A (en) | 1979-01-31 | 1979-01-31 | Ion etching method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP911679A JPS55104483A (en) | 1979-01-31 | 1979-01-31 | Ion etching method |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS55104483A true JPS55104483A (en) | 1980-08-09 |
Family
ID=11711657
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP911679A Pending JPS55104483A (en) | 1979-01-31 | 1979-01-31 | Ion etching method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS55104483A (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN100437901C (zh) * | 2003-10-08 | 2008-11-26 | 东京毅力科创株式会社 | 防止微粒附着装置和等离子体处理装置 |
US8608422B2 (en) | 2003-10-08 | 2013-12-17 | Tokyo Electron Limited | Particle sticking prevention apparatus and plasma processing apparatus |
-
1979
- 1979-01-31 JP JP911679A patent/JPS55104483A/ja active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN100437901C (zh) * | 2003-10-08 | 2008-11-26 | 东京毅力科创株式会社 | 防止微粒附着装置和等离子体处理装置 |
US8608422B2 (en) | 2003-10-08 | 2013-12-17 | Tokyo Electron Limited | Particle sticking prevention apparatus and plasma processing apparatus |
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