JPS55104483A - Ion etching method - Google Patents

Ion etching method

Info

Publication number
JPS55104483A
JPS55104483A JP911679A JP911679A JPS55104483A JP S55104483 A JPS55104483 A JP S55104483A JP 911679 A JP911679 A JP 911679A JP 911679 A JP911679 A JP 911679A JP S55104483 A JPS55104483 A JP S55104483A
Authority
JP
Japan
Prior art keywords
voltage
current
etching
discharge
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP911679A
Other languages
English (en)
Inventor
Haruo Okano
Yasuhiro Horiike
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP911679A priority Critical patent/JPS55104483A/ja
Publication of JPS55104483A publication Critical patent/JPS55104483A/ja
Pending legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)
  • ing And Chemical Polishing (AREA)
JP911679A 1979-01-31 1979-01-31 Ion etching method Pending JPS55104483A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP911679A JPS55104483A (en) 1979-01-31 1979-01-31 Ion etching method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP911679A JPS55104483A (en) 1979-01-31 1979-01-31 Ion etching method

Publications (1)

Publication Number Publication Date
JPS55104483A true JPS55104483A (en) 1980-08-09

Family

ID=11711657

Family Applications (1)

Application Number Title Priority Date Filing Date
JP911679A Pending JPS55104483A (en) 1979-01-31 1979-01-31 Ion etching method

Country Status (1)

Country Link
JP (1) JPS55104483A (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100437901C (zh) * 2003-10-08 2008-11-26 东京毅力科创株式会社 防止微粒附着装置和等离子体处理装置
US8608422B2 (en) 2003-10-08 2013-12-17 Tokyo Electron Limited Particle sticking prevention apparatus and plasma processing apparatus

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100437901C (zh) * 2003-10-08 2008-11-26 东京毅力科创株式会社 防止微粒附着装置和等离子体处理装置
US8608422B2 (en) 2003-10-08 2013-12-17 Tokyo Electron Limited Particle sticking prevention apparatus and plasma processing apparatus

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