JPS546866B2 - - Google Patents

Info

Publication number
JPS546866B2
JPS546866B2 JP6441571A JP6441571A JPS546866B2 JP S546866 B2 JPS546866 B2 JP S546866B2 JP 6441571 A JP6441571 A JP 6441571A JP 6441571 A JP6441571 A JP 6441571A JP S546866 B2 JPS546866 B2 JP S546866B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP6441571A
Other languages
Japanese (ja)
Other versions
JPS4830874A (enrdf_load_stackoverflow
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP6441571A priority Critical patent/JPS546866B2/ja
Publication of JPS4830874A publication Critical patent/JPS4830874A/ja
Publication of JPS546866B2 publication Critical patent/JPS546866B2/ja
Expired legal-status Critical Current

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
  • Optical Filters (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP6441571A 1971-08-25 1971-08-25 Expired JPS546866B2 (enrdf_load_stackoverflow)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6441571A JPS546866B2 (enrdf_load_stackoverflow) 1971-08-25 1971-08-25

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6441571A JPS546866B2 (enrdf_load_stackoverflow) 1971-08-25 1971-08-25

Publications (2)

Publication Number Publication Date
JPS4830874A JPS4830874A (enrdf_load_stackoverflow) 1973-04-23
JPS546866B2 true JPS546866B2 (enrdf_load_stackoverflow) 1979-04-02

Family

ID=13257622

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6441571A Expired JPS546866B2 (enrdf_load_stackoverflow) 1971-08-25 1971-08-25

Country Status (1)

Country Link
JP (1) JPS546866B2 (enrdf_load_stackoverflow)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06125B2 (ja) * 1982-10-25 1994-01-05 アロカ株式会社 超音波診断装置
JPS6090542A (ja) * 1983-10-24 1985-05-21 株式会社日立製作所 超音波診断装置
JPS61181472A (ja) * 1985-02-08 1986-08-14 福留　武朗 血管穿刺法及び穿刺具
JPH0310732Y2 (enrdf_load_stackoverflow) * 1985-10-30 1991-03-18
JPS61226924A (ja) * 1985-04-01 1986-10-08 Canon Inc 露光装置
JPH0628223B2 (ja) * 1985-08-21 1994-04-13 キヤノン株式会社 パターン焼き付け方法
JPH0738857B2 (ja) * 1985-08-29 1995-05-01 株式会社東芝 結石破砕装置
JPS62183772A (ja) * 1986-02-10 1987-08-12 福留　武朗 脈管穿刺具
EP0260953B1 (en) * 1986-09-18 1994-03-30 Paul G. Yock Device for use in the cannulation of blood vessels
US4760429A (en) * 1986-11-05 1988-07-26 The Perkin-Elmer Corporation High speed reticle change system
US4758863A (en) * 1987-02-17 1988-07-19 Hewlett-Packard Company Multi-image reticle
JPS6379318A (ja) * 1987-09-11 1988-04-09 Hitachi Ltd 縮小投影露光方法
JPH02107237A (ja) * 1988-10-17 1990-04-19 Aloka Co Ltd 穿刺針式超音波診断装置
JPH02107238A (ja) * 1988-10-17 1990-04-19 Aloka Co Ltd 穿刺針式超音波診断装置
US5235626A (en) * 1991-10-22 1993-08-10 International Business Machines Corporation Segmented mask and exposure system for x-ray lithography
JP2656204B2 (ja) * 1993-06-04 1997-09-24 キヤノン株式会社 マスク交換装置
JP5066948B2 (ja) * 2007-03-06 2012-11-07 株式会社ニコン マスク保持装置、マスク調整方法、露光装置及び露光方法
JP6322210B2 (ja) 2012-12-13 2018-05-09 ボルケーノ コーポレイション 標的化された挿管のためのデバイス、システム、および方法

Also Published As

Publication number Publication date
JPS4830874A (enrdf_load_stackoverflow) 1973-04-23

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