JPS5461877A - Electron beam exposure apparatus - Google Patents
Electron beam exposure apparatusInfo
- Publication number
- JPS5461877A JPS5461877A JP12897977A JP12897977A JPS5461877A JP S5461877 A JPS5461877 A JP S5461877A JP 12897977 A JP12897977 A JP 12897977A JP 12897977 A JP12897977 A JP 12897977A JP S5461877 A JPS5461877 A JP S5461877A
- Authority
- JP
- Japan
- Prior art keywords
- lenses
- electron
- deflector
- slit
- electron beam
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
PURPOSE: To change lighting distribution of electron beams and enhance the use efficiency of the beams by providing a deflector or electron lenses at the inlet of a slit.
CONSTITUTION: When the amplitudes of XY of the defelctor are suitably set and scanning is done by changing the vibration speeds with suitable vibration waveforms, then a uniform itensity may be secured by the vibrating crossover images at efficiency higher than that by cutting off part of a large electron beam region. The deflector is then vibrated at about 1G Hz with respect to an exposure frequency of 10M Hz. Or electron lenses 21X, 21Y by one dimensional lenses of electric field type or magnetic field lenses of air cores are disposed and their focal lengths are changed according to exposure patters, whereby the beam distribution on the slit is changed.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12897977A JPS5461877A (en) | 1977-10-27 | 1977-10-27 | Electron beam exposure apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12897977A JPS5461877A (en) | 1977-10-27 | 1977-10-27 | Electron beam exposure apparatus |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5461877A true JPS5461877A (en) | 1979-05-18 |
JPS579692B2 JPS579692B2 (en) | 1982-02-23 |
Family
ID=14998115
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12897977A Granted JPS5461877A (en) | 1977-10-27 | 1977-10-27 | Electron beam exposure apparatus |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5461877A (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10534988B2 (en) | 2017-08-18 | 2020-01-14 | Avery Dennison Retail Information Services Llc | Durable RFID printed fabric labels |
-
1977
- 1977-10-27 JP JP12897977A patent/JPS5461877A/en active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS579692B2 (en) | 1982-02-23 |
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