JPS5461877A - Electron beam exposure apparatus - Google Patents

Electron beam exposure apparatus

Info

Publication number
JPS5461877A
JPS5461877A JP12897977A JP12897977A JPS5461877A JP S5461877 A JPS5461877 A JP S5461877A JP 12897977 A JP12897977 A JP 12897977A JP 12897977 A JP12897977 A JP 12897977A JP S5461877 A JPS5461877 A JP S5461877A
Authority
JP
Japan
Prior art keywords
lenses
electron
deflector
slit
electron beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12897977A
Other languages
Japanese (ja)
Other versions
JPS579692B2 (en
Inventor
Yasuo Furukawa
Masahiro Okabe
Yushi Inagaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP12897977A priority Critical patent/JPS5461877A/en
Publication of JPS5461877A publication Critical patent/JPS5461877A/en
Publication of JPS579692B2 publication Critical patent/JPS579692B2/ja
Granted legal-status Critical Current

Links

Abstract

PURPOSE: To change lighting distribution of electron beams and enhance the use efficiency of the beams by providing a deflector or electron lenses at the inlet of a slit.
CONSTITUTION: When the amplitudes of XY of the defelctor are suitably set and scanning is done by changing the vibration speeds with suitable vibration waveforms, then a uniform itensity may be secured by the vibrating crossover images at efficiency higher than that by cutting off part of a large electron beam region. The deflector is then vibrated at about 1G Hz with respect to an exposure frequency of 10M Hz. Or electron lenses 21X, 21Y by one dimensional lenses of electric field type or magnetic field lenses of air cores are disposed and their focal lengths are changed according to exposure patters, whereby the beam distribution on the slit is changed.
COPYRIGHT: (C)1979,JPO&Japio
JP12897977A 1977-10-27 1977-10-27 Electron beam exposure apparatus Granted JPS5461877A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12897977A JPS5461877A (en) 1977-10-27 1977-10-27 Electron beam exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12897977A JPS5461877A (en) 1977-10-27 1977-10-27 Electron beam exposure apparatus

Publications (2)

Publication Number Publication Date
JPS5461877A true JPS5461877A (en) 1979-05-18
JPS579692B2 JPS579692B2 (en) 1982-02-23

Family

ID=14998115

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12897977A Granted JPS5461877A (en) 1977-10-27 1977-10-27 Electron beam exposure apparatus

Country Status (1)

Country Link
JP (1) JPS5461877A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10534988B2 (en) 2017-08-18 2020-01-14 Avery Dennison Retail Information Services Llc Durable RFID printed fabric labels

Also Published As

Publication number Publication date
JPS579692B2 (en) 1982-02-23

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