JPS5461476A - Discharger for viscous fluid - Google Patents

Discharger for viscous fluid

Info

Publication number
JPS5461476A
JPS5461476A JP12752077A JP12752077A JPS5461476A JP S5461476 A JPS5461476 A JP S5461476A JP 12752077 A JP12752077 A JP 12752077A JP 12752077 A JP12752077 A JP 12752077A JP S5461476 A JPS5461476 A JP S5461476A
Authority
JP
Japan
Prior art keywords
electromagnetic valve
photo resist
feeding
viscous fluid
fluid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12752077A
Other languages
Japanese (ja)
Inventor
Hiroshi Maejima
Susumu Nanko
Hiroshi Nashihara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP12752077A priority Critical patent/JPS5461476A/en
Publication of JPS5461476A publication Critical patent/JPS5461476A/en
Pending legal-status Critical Current

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Weting (AREA)

Abstract

PURPOSE: To perform fluid stop completely and stably, by individually the feeding and absorbing set for viscous fluid and by alternately perfoming the feeding and absorbing operaton of viscous fluid.
CONSTITUTION: The fluid photo resist 2 in the vessel 1 is introduced to the flow inlet 32 with the electromagnetic valve 22 opened, and the liquid photo resist pushes down the ball 26 with the electromagnetic valve 23 opened and is filled in the chamber F and the nozzle 6 and further is discharged on the semiconductor wafer 9. Next, the feeding operaton of liquid photo resist is stopped with the electromagnetic valve 22 closed, the bellows 17 and 18 are expanded with the electromagnetic valve 23 colsed, and the volume of the chamber F1 is expnded and the photo resist in the nozzle 6 is returned and liquid stop is performed
COPYRIGHT: (C)1979,JPO&Japio
JP12752077A 1977-10-26 1977-10-26 Discharger for viscous fluid Pending JPS5461476A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12752077A JPS5461476A (en) 1977-10-26 1977-10-26 Discharger for viscous fluid

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12752077A JPS5461476A (en) 1977-10-26 1977-10-26 Discharger for viscous fluid

Publications (1)

Publication Number Publication Date
JPS5461476A true JPS5461476A (en) 1979-05-17

Family

ID=14962038

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12752077A Pending JPS5461476A (en) 1977-10-26 1977-10-26 Discharger for viscous fluid

Country Status (1)

Country Link
JP (1) JPS5461476A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59177929A (en) * 1983-03-28 1984-10-08 Canon Inc Suck back pump
JPS6464218A (en) * 1987-09-03 1989-03-10 Tokyo Electron Ltd Applicator for resist
JPH0824621A (en) * 1995-07-17 1996-01-30 Hitachi Ltd Method for dropping treating liquid

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59177929A (en) * 1983-03-28 1984-10-08 Canon Inc Suck back pump
JPH0220135B2 (en) * 1983-03-28 1990-05-08 Kyanon Kk
JPS6464218A (en) * 1987-09-03 1989-03-10 Tokyo Electron Ltd Applicator for resist
JPH0824621A (en) * 1995-07-17 1996-01-30 Hitachi Ltd Method for dropping treating liquid

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