JPS5441341B2 - - Google Patents

Info

Publication number
JPS5441341B2
JPS5441341B2 JP11076373A JP11076373A JPS5441341B2 JP S5441341 B2 JPS5441341 B2 JP S5441341B2 JP 11076373 A JP11076373 A JP 11076373A JP 11076373 A JP11076373 A JP 11076373A JP S5441341 B2 JPS5441341 B2 JP S5441341B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP11076373A
Other languages
Japanese (ja)
Other versions
JPS4970649A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS4970649A publication Critical patent/JPS4970649A/ja
Publication of JPS5441341B2 publication Critical patent/JPS5441341B2/ja
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00Measuring instruments characterised by the use of optical techniques
    • G01B9/02Interferometers
    • G01B9/02001Interferometers characterised by controlling or generating intrinsic radiation properties
    • G01B9/02007Two or more frequencies or sources used for interferometric measurement
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00Measuring instruments characterised by the use of optical techniques
    • G01B9/02Interferometers
    • G01B9/02001Interferometers characterised by controlling or generating intrinsic radiation properties
    • G01B9/02002Interferometers characterised by controlling or generating intrinsic radiation properties using two or more frequencies
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N25/00Investigating or analyzing materials by the use of thermal means
    • G01N25/16Investigating or analyzing materials by the use of thermal means by investigating thermal coefficient of expansion
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2290/00Aspects of interferometers not specifically covered by any group under G01B9/02
    • G01B2290/45Multiple detectors for detecting interferometer signals
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2290/00Aspects of interferometers not specifically covered by any group under G01B9/02
    • G01B2290/70Using polarization in the interferometer

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Or Analyzing Materials Using Thermal Means (AREA)
JP11076373A 1972-10-02 1973-10-02 Expired JPS5441341B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US29411472A 1972-10-02 1972-10-02

Publications (2)

Publication Number Publication Date
JPS4970649A JPS4970649A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1974-07-09
JPS5441341B2 true JPS5441341B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1979-12-07

Family

ID=23131943

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11076373A Expired JPS5441341B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1972-10-02 1973-10-02

Country Status (7)

Country Link
US (1) US3788746A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JP (1) JPS5441341B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
CH (1) CH569254A5 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
DE (1) DE2348272C3 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
FR (1) FR2201764A5 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
GB (1) GB1450692A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
IT (1) IT996218B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2198636A5 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 1972-09-06 1974-03-29 France Etat
US4043671A (en) * 1976-07-13 1977-08-23 The United States Of America As Represented By The United States Energy Research And Development Administration Laser system preset unit
US4147435A (en) * 1977-06-30 1979-04-03 International Business Machines Corporation Interferometric process and apparatus for the measurement of the etch rate of opaque surfaces
US4329059A (en) * 1980-03-03 1982-05-11 The Boeing Company Multiple channel interferometer
US4334778A (en) * 1980-09-12 1982-06-15 The United States Of America As Represented By The United States Department Of Energy Dual surface interferometer
EP0084144B1 (de) * 1982-01-15 1988-09-21 Firma Carl Zeiss Dreidimensionale interferometrische Längenmesseinrichtung
JPS58158508A (ja) * 1982-03-16 1983-09-20 Mitsubishi Heavy Ind Ltd 高温ひずみ計測方法
US5350899A (en) * 1992-04-15 1994-09-27 Hiroichi Ishikawa Semiconductor wafer temperature determination by optical measurement of wafer expansion in processing apparatus chamber
US4711574A (en) * 1984-04-27 1987-12-08 Hewlett-Packard Company Minimum deadpath interferometer and dilatometer
US4930894A (en) * 1984-04-27 1990-06-05 Hewlett-Packard Company Minimum deadpath interferometer and dilatometer
JPS60231146A (ja) * 1984-05-01 1985-11-16 Rigaku Denki Kk 熱膨張率測定装置
JPS60237307A (ja) * 1984-05-11 1985-11-26 Yokogawa Hewlett Packard Ltd レ−ザ測長器
JP2519411B2 (ja) * 1985-11-26 1996-07-31 真空理工 株式会社 熱膨張計
US4746216A (en) * 1986-03-28 1988-05-24 Zygo Corporation Angle measuring interferometer
US4717250A (en) * 1986-03-28 1988-01-05 Zygo Corporation Angle measuring interferometer
US4802764A (en) * 1986-03-28 1989-02-07 Young Peter S Differential plane mirror interferometer having beamsplitter/beam folder assembly
US4815856A (en) * 1986-06-05 1989-03-28 Storage Technology Partners Ii Method and apparatus for measuring the absolute thickness of dust defocus layers
JPS62298702A (ja) * 1986-06-12 1987-12-25 ジゴ− コ−ポレ−シヨン 差動平面鏡干渉計システム
JPS63124901A (ja) * 1986-11-07 1988-05-28 インターナショナル・ビジネス・マシーンズ・コーポレーション 干渉計
JPH0721472B2 (ja) * 1986-12-11 1995-03-08 品川白煉瓦株式会社 セラミックスの熱間における変位測定装置
US4784490A (en) * 1987-03-02 1988-11-15 Hewlett-Packard Company High thermal stability plane mirror interferometer
US5121987A (en) * 1989-03-02 1992-06-16 Honeywell Inc. Method and apparatus for measuring coefficient of thermal expansion
US4989980A (en) * 1989-03-02 1991-02-05 Honeywell Inc. Method and apparatus for measuring coefficient of thermal expansion
US5018862A (en) * 1989-11-02 1991-05-28 Aerotech, Inc. Successive fringe detection position interferometry
DD296549A5 (de) * 1990-07-13 1991-12-05 ����@�����@����@����@����@����K@����K`�����K@�������������@���k�� Stehwelleninterpolator
US5404222A (en) * 1994-01-14 1995-04-04 Sparta, Inc. Interferametric measuring system with air turbulence compensation
US5991033A (en) * 1996-09-20 1999-11-23 Sparta, Inc. Interferometer with air turbulence compensation
ITMO20010248A1 (it) * 2001-12-12 2003-06-12 Expert System Solutions Srl Dilatometro ottico perfezionato
US7025498B2 (en) * 2003-05-30 2006-04-11 Asml Holding N.V. System and method of measuring thermal expansion
DE102004045802B4 (de) * 2004-09-22 2009-02-05 Robert Bosch Gmbh Interferometrisches System mit Referenzfläche mit einer verspiegelten Zone
CN101881891B (zh) * 2009-05-05 2012-10-03 菲尼萨光电通讯(上海)有限公司 偏振光分束仪
GB2516281A (en) * 2013-07-17 2015-01-21 Cambridge Consultants Optical apparatus and methods
CN104006739B (zh) * 2014-05-29 2016-06-15 清华大学 一种光学八细分线性干涉仪
CN108519402B (zh) * 2018-03-28 2020-12-22 北京工业大学 激光法测量超薄玻璃再热线收缩率的装置和方法
CN108759704B (zh) * 2018-07-06 2020-05-26 武汉理工大学 一种光纤f-p复合腔型高温应变传感器
CN118758994B (zh) * 2024-07-31 2025-04-25 中国科学院精密测量科学与技术创新研究院 一种高精度的热膨胀系数测量装置

Also Published As

Publication number Publication date
DE2348272C3 (de) 1975-09-11
JPS4970649A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1974-07-09
GB1450692A (en) 1976-09-22
FR2201764A5 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1974-04-26
CH569254A5 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1975-11-14
IT996218B (it) 1975-12-10
DE2348272B2 (de) 1975-01-23
US3788746A (en) 1974-01-29
DE2348272A1 (de) 1974-04-18

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