JPS543727B2 - - Google Patents
Info
- Publication number
- JPS543727B2 JPS543727B2 JP13892273A JP13892273A JPS543727B2 JP S543727 B2 JPS543727 B2 JP S543727B2 JP 13892273 A JP13892273 A JP 13892273A JP 13892273 A JP13892273 A JP 13892273A JP S543727 B2 JPS543727 B2 JP S543727B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
- G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
- G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/035—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyurethanes
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Polymerisation Methods In General (AREA)
- Polymerization Catalysts (AREA)
- Polyurethanes Or Polyureas (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US31520772A | 1972-12-14 | 1972-12-14 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5018585A JPS5018585A (pl) | 1975-02-27 |
| JPS543727B2 true JPS543727B2 (pl) | 1979-02-26 |
Family
ID=23223361
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13892273A Expired JPS543727B2 (pl) | 1972-12-14 | 1973-12-14 |
Country Status (9)
| Country | Link |
|---|---|
| JP (1) | JPS543727B2 (pl) |
| BR (1) | BR7309820D0 (pl) |
| CH (1) | CH587500A5 (pl) |
| DE (1) | DE2361931A1 (pl) |
| FR (1) | FR2327569A1 (pl) |
| GB (1) | GB1463818A (pl) |
| IT (1) | IT1000315B (pl) |
| NL (1) | NL7317180A (pl) |
| SE (1) | SE404094B (pl) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6320605Y2 (pl) * | 1981-07-02 | 1988-06-08 |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| LU75749A1 (pl) * | 1976-09-08 | 1978-04-27 | ||
| NL8001085A (nl) * | 1979-02-27 | 1980-08-29 | Minnesota Mining & Mfg | Fotogevoelige materialen en voorwerpen. |
| DE2948554A1 (de) * | 1979-12-03 | 1981-06-04 | Hoechst Ag, 6000 Frankfurt | Lichtempfindliches gemisch |
| US4316949A (en) * | 1979-12-14 | 1982-02-23 | Minnesota Mining And Manufacturing Company | Photoreactive oligomer composition and printing plate |
| JPS5938747A (ja) * | 1982-08-27 | 1984-03-02 | Okamoto Kagaku Kogyo Kk | 感光性平版印刷版 |
| JPS6471114A (en) * | 1987-05-02 | 1989-03-16 | Hope Seiki | Assembly and manufacturing device for tip type electrolytic capacitor |
| DE3824146A1 (de) * | 1988-07-16 | 1990-02-22 | Hoechst Ag | Lichthaertbares elastomeres gemisch und daraus erhaltenes aufzeichnungsmaterial fuer die herstellung von flexodruckplatten |
| WO1993006528A1 (en) * | 1991-09-13 | 1993-04-01 | Sun Chemical Corporation | Positive-working coating compositions |
| US5466789A (en) * | 1992-01-21 | 1995-11-14 | Du Pont (Uk) Limited | Polyunsaturated diazonium compounds |
| GB2263906B (en) * | 1992-01-21 | 1995-11-08 | Du Pont | Improvements in or relating to polyunsaturated diazonium compounds |
| US5534623A (en) * | 1993-01-21 | 1996-07-09 | Du Pont (Uk) Limited | Process for preparing a polyunsaturated diazonium compounds |
| ES2320561T3 (es) * | 2005-11-18 | 2009-05-25 | Agfa Graphics N.V. | Metodo para fabricar una plancha de impresion litografica. |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2102382B2 (de) * | 1970-01-19 | 1973-02-01 | Dainippon Ink and Chemicals, Ine , Tokio | Photopolymerisierbare, polyurethanformmassen einschliesslich ueberzugsmassen und klebemittel |
-
1973
- 1973-12-12 IT IT5427573A patent/IT1000315B/it active
- 1973-12-13 SE SE7316884A patent/SE404094B/xx unknown
- 1973-12-13 FR FR7344539A patent/FR2327569A1/fr active Granted
- 1973-12-13 GB GB5770673A patent/GB1463818A/en not_active Expired
- 1973-12-13 DE DE19732361931 patent/DE2361931A1/de not_active Ceased
- 1973-12-14 JP JP13892273A patent/JPS543727B2/ja not_active Expired
- 1973-12-14 CH CH1756473A patent/CH587500A5/xx not_active IP Right Cessation
- 1973-12-14 NL NL7317180A patent/NL7317180A/xx not_active Application Discontinuation
- 1973-12-14 BR BR982073A patent/BR7309820D0/pt unknown
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6320605Y2 (pl) * | 1981-07-02 | 1988-06-08 |
Also Published As
| Publication number | Publication date |
|---|---|
| DE2361931A1 (de) | 1974-06-20 |
| BR7309820D0 (pt) | 1974-09-24 |
| NL7317180A (pl) | 1974-06-18 |
| SE404094B (sv) | 1978-09-18 |
| CH587500A5 (pl) | 1977-05-13 |
| JPS5018585A (pl) | 1975-02-27 |
| IT1000315B (it) | 1976-03-30 |
| GB1463818A (en) | 1977-02-09 |
| AU6328473A (en) | 1975-06-12 |
| FR2327569B1 (pl) | 1978-03-24 |
| FR2327569A1 (fr) | 1977-05-06 |