JPS5435101B1 - - Google Patents
Info
- Publication number
- JPS5435101B1 JPS5435101B1 JP4468172A JP4468172A JPS5435101B1 JP S5435101 B1 JPS5435101 B1 JP S5435101B1 JP 4468172 A JP4468172 A JP 4468172A JP 4468172 A JP4468172 A JP 4468172A JP S5435101 B1 JPS5435101 B1 JP S5435101B1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
- C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B7/00—Measuring arrangements characterised by the use of electric or magnetic techniques
- G01B7/02—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness
- G01B7/06—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness for measuring thickness
- G01B7/08—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness for measuring thickness using capacitive means
- G01B7/085—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness for measuring thickness using capacitive means for measuring thickness of coating
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR717116954A FR2136999B1 (ja) | 1971-05-11 | 1971-05-11 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS4744200A JPS4744200A (ja) | 1972-12-21 |
JPS5435101B1 true JPS5435101B1 (ja) | 1979-10-31 |
Family
ID=9076818
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4468172A Pending JPS5435101B1 (ja) | 1971-05-11 | 1972-05-08 |
Country Status (5)
Country | Link |
---|---|
US (1) | US3775277A (ja) |
JP (1) | JPS5435101B1 (ja) |
DE (1) | DE2219622C3 (ja) |
FR (1) | FR2136999B1 (ja) |
GB (1) | GB1386306A (ja) |
Families Citing this family (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5380248A (en) * | 1976-12-24 | 1978-07-15 | Rohm Co Ltd | Thickness measuring method of films |
US4243960A (en) * | 1978-08-14 | 1981-01-06 | The United States Of America As Represented By The Secretary Of The Navy | Method and materials for tuning the center frequency of narrow-band surface-acoustic-wave (SAW) devices by means of dielectric overlays |
DE3067724D1 (en) * | 1980-02-07 | 1984-06-14 | Matsushita Electric Ind Co Ltd | Method of forming a glass spacer in the magnetic gap of a magnetic head |
ZA832199B (en) * | 1982-03-29 | 1983-12-28 | Magnaflux Corp | Apparatus and methods for control in plating |
US4556845A (en) * | 1982-05-17 | 1985-12-03 | International Business Machines Corporation | Method for monitoring deposition rate using an eddy current detector |
DE3401140C1 (de) * | 1984-01-14 | 1985-08-29 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V., 8000 München | Vorrichtung zur kontinuierlichen Messung der Dicke |
EP0157003B1 (de) * | 1984-02-10 | 1988-11-23 | Präzisions-Werkzeuge AG | Verfahren zur Messung der Partikelablagerungsmenge auf einem pulverzubeschichtenden Metallkörper, Vorrichtung zur Ausführung des Verfahrens und Verwendung des Verfahrens |
FR2573218B1 (fr) * | 1984-11-09 | 1987-01-02 | Centre Nat Rech Scient | Appareil electrique de detection et caracterisation de couches faiblement conductrices posees ou deposees sur un substrat conducteur de l'electricite |
DE3505387A1 (de) * | 1985-02-16 | 1986-08-28 | W.C. Heraeus Gmbh, 6450 Hanau | Sensor zur messung elektrischer eigenschaften im elektrischen feld |
US4626446A (en) * | 1985-06-03 | 1986-12-02 | International Business Machines Corporation | Electroless plating bath monitor |
GB2225855B (en) * | 1988-11-05 | 1993-01-20 | Rolls Royce Plc | Capacitance probe |
JP2503276B2 (ja) * | 1989-07-31 | 1996-06-05 | 出光興産株式会社 | 昇温ガス反応測定装置 |
DE4031210A1 (de) * | 1990-10-04 | 1992-04-09 | Bosch Gmbh Robert | Kapazitiver sensor zur messung eines kraftstoffwandfilms |
US5749049A (en) * | 1991-11-01 | 1998-05-05 | Worp; Nicholas Jacob | Method and apparatus for measuring the inherent capacitance of a circuit supporting substrate |
US5459406A (en) * | 1994-07-01 | 1995-10-17 | Cornell Research Foundation, Inc. | Guarded capacitance probes for measuring particle concentration and flow |
US6543459B1 (en) | 2000-04-07 | 2003-04-08 | Koninklijke Philips Electronics N.V. | Method of determining an end point for a remote microwave plasma cleaning system |
CN103981505B (zh) * | 2014-05-06 | 2016-04-13 | 京东方科技集团股份有限公司 | 一种监控装置 |
CN114473844B (zh) * | 2021-12-31 | 2023-09-29 | 华海清科股份有限公司 | 一种膜厚测量装置 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2824281A (en) * | 1954-02-26 | 1958-02-18 | Gen Electric | Method and apparatus for measuring thickness |
US2978364A (en) * | 1956-03-05 | 1961-04-04 | Fairchild Camera Instr Co | Automatic control system for precision resistor manufacture |
US3278843A (en) * | 1962-10-01 | 1966-10-11 | Hughes Aircraft Co | Thickness rate monitoring system for depositing dielectric films |
US3350941A (en) * | 1965-05-20 | 1967-11-07 | Johnson Service Co | Humidity sensing element |
US3493484A (en) * | 1965-09-01 | 1970-02-03 | Rodney Berg | Gas detecting apparatus |
US3614606A (en) * | 1969-04-04 | 1971-10-19 | John A Schmidt | Capacitive-coupled probe for measuring potentials in a plasma |
US3591479A (en) * | 1969-05-08 | 1971-07-06 | Ibm | Sputtering process for preparing stable thin film resistors |
-
1971
- 1971-05-11 FR FR717116954A patent/FR2136999B1/fr not_active Expired
-
1972
- 1972-02-07 US US00224023A patent/US3775277A/en not_active Expired - Lifetime
- 1972-04-21 DE DE2219622A patent/DE2219622C3/de not_active Expired
- 1972-05-08 GB GB2135872A patent/GB1386306A/en not_active Expired
- 1972-05-08 JP JP4468172A patent/JPS5435101B1/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
JPS4744200A (ja) | 1972-12-21 |
DE2219622C3 (de) | 1979-07-05 |
DE2219622B2 (de) | 1978-11-02 |
GB1386306A (en) | 1975-03-05 |
FR2136999A1 (ja) | 1972-12-29 |
DE2219622A1 (de) | 1972-11-16 |
US3775277A (en) | 1973-11-27 |
FR2136999B1 (ja) | 1973-05-11 |