CN103981505B - 一种监控装置 - Google Patents

一种监控装置 Download PDF

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CN103981505B
CN103981505B CN201410188927.2A CN201410188927A CN103981505B CN 103981505 B CN103981505 B CN 103981505B CN 201410188927 A CN201410188927 A CN 201410188927A CN 103981505 B CN103981505 B CN 103981505B
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shifting board
monitoring device
baffle
fixed dam
adjacent screen
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CN103981505A (zh
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刘晓伟
刘耀
丁向前
白金超
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BOE Technology Group Co Ltd
Beijing BOE Display Technology Co Ltd
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Beijing BOE Display Technology Co Ltd
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    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
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    • C23C16/45587—Mechanical means for changing the gas flow
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Abstract

本发明涉及真空镀膜技术领域，具体涉及一种用于监控挡板机构寿命的监控装置。该监控装置包括用于真空镀膜的腔室，还包括电容测试装置和位于腔室内的挡板机构，所述挡板机构为由多个挡板面所围成的密闭结构，其中至少一个所述挡板面包括固定挡板和活动挡板，所述活动挡板绕所述固定挡板转动，且活动挡板转动后与相邻挡板面平行，所述相邻挡板面和活动挡板分别与电容测试装置连接，所述电容测试装置用于测试所述相邻挡板面与活动挡板之间的电容。该监控装置可以准确监控挡板寿命，实现设备的精确化管理；该监控装置在不增加制造成本的基础上，结构简单，可无需开腔就可以实现对挡板机构的寿命进行精确管理，有效降低产线设备的运营成本。

Description

一种监控装置
技术领域
本发明涉及真空镀膜技术领域，尤其涉及一种用于监控挡板机构寿命的监控装置。
背景技术
目前，真空镀膜技术被广泛应用于工业生产的各领域，尤其在应用于TFT-LCD(英文名称为ThinFilmTransistor-LiquidCrystalDisplay，中文名称为薄膜晶体管液晶显示器)、OLED(英文名称为OrganicLightEmittingDiode，中文名称为有机电致发光显示器)等领域时，真空设备会产生额外的薄膜沉积。为了防止额外产生的薄膜污染真空腔体，在真空腔体中加上挡板机构，额外产生的薄膜会沉积在挡板上。再对挡板进行定期清洗，可以有效保护真空腔体。这种镀膜方式被广泛应用于各种真空设备上，如：PVD(英文名称为PhysicalVaporDeposition，中文名称为物理气相沉积)、CVD(英文名称为ChemicalVaporDeposition，中文名称为化学气相沉积)、DryEtch(英文名称为DryEtching，中文名称为干法刻蚀)、Sputter(英文名称为SputterCoating，中文名称为溅射镀膜)等设备。
挡板机构作为真空设备的重要组成部分，其使用寿命是根据附着的薄膜厚度决定的。只有准确地掌握了附着薄膜的厚度才能有效地监控挡板的寿命。但目前，仅仅凭借经验难以确切判断出挡板何时到使用寿命末期，不能实现对挡板寿命进行精确的管理。若将提早更换挡板并送去专业厂商进行清洗，则会增加不必要的运营成本；若超过挡板使用寿命再更换，则会影响产品的良率。
因此，针对以上不足，需要一种能够准确监控挡板机构寿命，实现设备精确化管理，且降低运营成本的监控装置。
发明内容
(一)要解决的技术问题
本发明要解决的技术问题是提供了一种监控装置，使得能够准确监控挡板机构的寿命，实现设备精确化管理，且降低了运营成本。
(二)技术方案
为了解决上述技术问题，本发明提供了一种监控装置，包括用于真空镀膜的腔室，还包括电容测试装置和位于腔室内的挡板机构，所述挡板机构为由多个挡板面所围成的密闭结构，其中至少一个所述挡板面包括固定挡板和活动挡板，所述活动挡板绕所述固定挡板转动，且活动挡板转动后与相邻挡板面平行，所述相邻挡板面和活动挡板分别与电容测试装置连接，所述电容测试装置用于测试所述相邻挡板面与活动挡板之间的电容。
其中，所述挡板机构为立方体形状，所述固定挡板和活动挡板均设置于立方体的顶部或者底部，所述活动挡板绕所述固定挡板转动90°角后与所述相邻挡板面平行。
其中，所述活动挡板的边缘设有第一连接部和第二连接部，所述第一连接部与固定挡板转动连接，所述第二连接部与固定挡板对应设置。
其中，所述第一连接部的上方设有密封条，所述密封条位于所述固定挡板与活动挡板之间的缝隙处。
其中，所述第一连接部与第二连接部的材质均为绝缘材料。
其中，所述活动挡板的形状为矩形，所述活动挡板的数量为一个或者多个。
其中，所述相邻挡板面与活动挡板分别通过导线与电容测试装置连接。
其中，所述电容测试装置为用于测试电容的万用表、电容表或者电桥测试仪。
其中，所述挡板面的内侧沉积有薄膜。
(三)有益效果
本发明的上述技术方案具有以下有益效果：本发明监控装置的挡板机构为由多个挡板面所围成的密闭结构，其中至少一个挡板面包括固定挡板和活动挡板，活动挡板绕固定挡板转动，且活动挡板转动后与相邻挡板面平行，相邻挡板面与活动挡板分别与电容测试装置连接，电容测试装置用于测试相邻挡板面与活动挡板之间的电容。该监控装置可以准确监控挡板寿命，实现设备的精确化管理；该监控装置在不增加制造成本的基础上，其结构的复杂性也未提升，即可无需开腔就可以实现对挡板机构的寿命进行精确管理，有效降低产线设备的运营成本。
附图说明
图1为本发明实施例一监控装置的结构示意图；
图2为本发明实施例一监控装置的工作状态示意图；
图3为本发明实施例二监控装置的立体图。
其中，1：电容测试装置；2；挡板机构；3：第一连接部；4：第二连接部；5：密封条；21：固定挡板；22：活动挡板。
具体实施方式
下面结合附图和实施例对本发明的实施方式作进一步详细描述。以下实施例用于说明本发明，但不能用来限制本发明的范围。
在本发明的描述中，除非另有说明，“多个”的含义是两个或两个以上；除非另有说明，“缺口状”的含义为除截面平齐外的形状。术语“上”、“下”、“左”、“右”、“内”、“外”、“前端”、“后端”、“头部”、“尾部”等指示的方位或位置关系为基于附图所示的方位或位置关系，仅是为了便于描述本发明和简化描述，而不是指示或暗示所指的装置或元件必须具有特定的方位、以特定的方位构造和操作，因此不能理解为对本发明的限制。此外，术语“第一”、“第二”、“第三”等仅用于描述目的，而不能理解为指示或暗示相对重要性。
在本发明的描述中，需要说明的是，除非另有明确的规定和限定，术语“安装”、“相连”、“连接”应做广义理解，例如，可以是固定连接，也可以是可拆卸连接，或一体地连接；可以是机械连接，也可以是电连接；可以是直接相连，也可以通过中间媒介间接相连。对于本领域的普通技术人员而言，可以具体情况理解上述术语在本发明中的具体含义。
如图1所示，本实施例提供的监控装置包括用于真空镀膜的腔室，还包括电容测试装置1和位于腔室内的挡板机构2，挡板机构2为由多个挡板面所围成的密闭结构，其中至少一个挡板面包括固定挡板21和活动挡板22，活动挡板22绕固定挡板21转动，且活动挡板22转动后与相邻挡板面平行，相邻挡板面和活动挡板22分别与电容测试装置1连接，电容测试装置1用于测试相邻挡板面与活动挡板22之间的电容。
该监控装置在不增加制造成本的基础上，其结构的复杂性也未提升，即可无需开腔就可以实现对挡板机构2的寿命进行精确管理，有效降低产线设备的运营成本。
通过在原有挡板机构2上开设一个测试窗口，即在两个挡板面的结合处开设一个独立且可以转动地活动挡板22。待设备闲置时，将活动挡板22转动至与相邻挡板面平行的位置；在活动挡板22和相邻挡板面的背面施加电压；通过电容测试装置1测出活动挡板22和相邻挡板面之间的电容；根据电容计算公式C＝εS/d，其中：ε为极板间介质的介电常数，S为极板面积，d为极板间的距离；测出镀膜后活动挡板22和相邻挡板面之间的间距。由于挡板面的内侧沉积有薄膜，因此，对比镀膜前此活动挡板22和相邻挡板面的距离即可计算出挡板机构2上已经附着的薄膜的厚度。
挡板机构2的寿命是根据附着薄膜的厚度确定的，通过测试活动挡板22与相邻挡板面之间的电容计算所得薄膜厚度，达到无需开腔即可计算出挡板机构2的精确寿命的目的。而且待镀膜时，可以将独立的活动挡板22转动闭合，实现挡板机构2的完整性，结构简单，操作方便。
如图3所示，优选地，挡板机构2为立方体形状，固定挡板21和活动挡板22均位于立方体的顶部或者底部，活动挡板22绕固定挡板21转动90°角后与相邻挡板面平行。
此外，根据镀膜设备的实际需要，挡板机构2的形状不仅局限于此，其他的用于防止薄膜沉积污染腔室的密闭结构都属于本发明保护范围之内。例如，挡板机构2可以为圆柱体或者异型体。
如图2所示，为了防止真空镀膜时固定挡板21和活动挡板22之间出现薄膜渗漏的情况，活动挡板22的边缘设有第一连接部3和第二连接部4，第一连接部3与固定挡板21转动连接，第二连接部4与固定挡板21对应设置，实现防漏。
具体而言：第一连接部3的上方设有密封条5，密封条5位于固定挡板21与活动挡板22之间的缝隙处以实现防漏。同时，固定挡板21的边缘搭接在第二连接部4上，通过凹凸配合实现防漏。
而且，第一连接部3与第二连接部4的材质均为绝缘材料，有效防止电子在活动挡板22和相邻挡板面之间进行自由移动，以影响电容测试的准确性。
优选地，活动挡板22的形状为矩形，利用局部测电容的方法保证挡板机构2的完整性。挡板机构2上活动挡板22的数量可以为一个，也可以根据需要为多个。
为了防止资源的浪费，节约成本。在现有大块的挡板机构2上，开一个单独的可作为测试的窗口的活动挡板22，相邻挡板面与活动挡板22分别通过导线与电容测试装置1连接。从而可以准确监控挡板机构2的寿命，实现设备的精确化管理，降低运营成本。该监控装置使用的电容测试装置1可以为用于测试电容的万用表，也可以为电容表或者电桥测试仪。
万用表：包括表头、测量电路及转换开关等三个主要部分。使用时，将相邻挡板面与活动挡板22分别通过导线与测量电路连通，转换开关调至电容测试状态，即可在表头上读出电容值。该万用表具有灵敏度高，精确度高，显示清晰，过载能力强，便于携带的优点。
电容表：电容表包括一个能直接驱动LCD微处理器和双积分A/D转换的集成电路和一个提供高分辨力、高精度的数字显示驱动。该电容表是一种智能型、性能稳定、高可靠性的电容测试工具。将相邻挡板面与活动挡板22分别通过导线接入电容输入插座或端子；然后调节量程进行测试。
电桥测试仪：将相邻挡板面与活动挡板22分别通过导线与电桥测试仪的电容端子接通，实现精确测量电容。
本发明监控装置的工作过程为：第一步，待真空镀膜设备闲置时，将活动挡板转动至与相邻挡板面平行的位置；第二步，在相互平行的活动挡板和相邻挡板面的背部分别通过导线与万用表或电容表或电桥测试仪连接；第三步，测试该活动挡板和相邻挡板面之间的电容，并记录；第四步，根据电容计算公式C＝εS/d，(其中：ε为极板间介质的介电常数，S为极板面积，d为极板间的距离)测出镀膜后活动挡板和相邻挡板面之间的间距。对比镀膜前此活动挡板和相邻挡板面的距离即可计算出挡板机构上已经附着的薄膜的厚度；第五步，待真空镀膜设备镀膜工作时，将独立的活动挡板转动与固定挡板闭合，实现挡板机构的完整性。
综上所述，本发明监控装置的挡板机构为由多个挡板面所围成的密闭结构，其中至少一个挡板面包括固定挡板和活动挡板，活动挡板绕固定挡板转动，且活动挡板转动后与相邻挡板面平行，相邻挡板面与活动挡板分别与电容测试装置连接，电容测试装置用于测试相邻挡板面与活动挡板之间的电容。该监控装置可以准确监控挡板寿命，实现设备的精确化管理；该监控装置在不增加制造成本的基础上，其结构的复杂性也未提升，即可无需开腔就可以实现对挡板机构的寿命进行精确管理，有效降低产线设备的运营成本。
本发明的实施例是为了示例和描述起见而给出的，而并不是无遗漏的或者将本发明限于所公开的形式。很多修改和变化对于本领域的普通技术人员而言是显而易见的。选择和描述实施例是为了更好说明本发明的原理和实际应用，并且使本领域的普通技术人员能够理解本发明从而设计适于特定用途的带有各种修改的各种实施例。

Claims (9)

1.一种监控装置，包括用于真空镀膜的腔室，其特征在于，还包括电容测试装置(1)和位于腔室内的挡板机构(2)，所述挡板机构(2)为由多个挡板面所围成的密闭结构，其中至少一个所述挡板面包括固定挡板(21)和活动挡板(22)，所述活动挡板(22)绕所述固定挡板(21)转动，且活动挡板(22)转动后与相邻挡板面平行，所述相邻挡板面和活动挡板(22)分别与电容测试装置(1)连接，所述电容测试装置(1)用于测试所述相邻挡板面与活动挡板(22)之间的电容。
2.根据权利要求1所述的监控装置，其特征在于，所述挡板机构(2)为立方体形状，所述固定挡板(21)和活动挡板(22)均设置于立方体的顶部或者底部，所述活动挡板(22)绕所述固定挡板(21)转动90°角后与所述相邻挡板面平行。
3.根据权利要求1所述的监控装置，其特征在于，所述活动挡板(22)的边缘设有第一连接部(3)和第二连接部(4)，所述第一连接部(3)与固定挡板(21)转动连接，所述第二连接部(4)与固定挡板(21)对应设置，以在所述活动挡板转动后能搭接于所述固定挡板(21)的开口边缘。
4.根据权利要求3所述的监控装置，其特征在于，所述第一连接部(3)的上方设有密封条(5)，所述密封条(5)位于所述固定挡板(21)与活动挡板(22)之间的缝隙处。
5.根据权利要求3所述的监控装置，其特征在于，所述第一连接部(3)与第二连接部(4)的材质均为绝缘材料。
6.根据权利要求3所述的监控装置，其特征在于，所述活动挡板(22)的形状为矩形，所述活动挡板(22)的数量为一个或者多个。
7.根据权利要求1所述的监控装置，其特征在于，所述相邻挡板面与活动挡板(22)分别通过导线与电容测试装置(1)连接。
8.根据权利要求7所述的监控装置，其特征在于，所述电容测试装置(1)为用于测试电容的万用表、电容表或者电桥测试仪。
9.根据权利要求1所述的监控装置，其特征在于，所述挡板面的内侧沉积有薄膜。
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