JPS5429901B2 - - Google Patents

Info

Publication number
JPS5429901B2
JPS5429901B2 JP1802472A JP1802472A JPS5429901B2 JP S5429901 B2 JPS5429901 B2 JP S5429901B2 JP 1802472 A JP1802472 A JP 1802472A JP 1802472 A JP1802472 A JP 1802472A JP S5429901 B2 JPS5429901 B2 JP S5429901B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1802472A
Other languages
Japanese (ja)
Other versions
JPS4888949A (enrdf_load_stackoverflow
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1802472A priority Critical patent/JPS5429901B2/ja
Priority to GB861573A priority patent/GB1430193A/en
Priority to DE19732309072 priority patent/DE2309072C3/de
Publication of JPS4888949A publication Critical patent/JPS4888949A/ja
Publication of JPS5429901B2 publication Critical patent/JPS5429901B2/ja
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Microscoopes, Condenser (AREA)
  • Light Sources And Details Of Projection-Printing Devices (AREA)
  • Projection-Type Copiers In General (AREA)
JP1802472A 1972-02-23 1972-02-23 Expired JPS5429901B2 (enrdf_load_stackoverflow)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP1802472A JPS5429901B2 (enrdf_load_stackoverflow) 1972-02-23 1972-02-23
GB861573A GB1430193A (en) 1972-02-23 1973-02-22 Illumination optical system of projection printing apparatus
DE19732309072 DE2309072C3 (de) 1972-02-23 1973-02-23 Maskenprojektionskopiervorrichtung

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1802472A JPS5429901B2 (enrdf_load_stackoverflow) 1972-02-23 1972-02-23

Publications (2)

Publication Number Publication Date
JPS4888949A JPS4888949A (enrdf_load_stackoverflow) 1973-11-21
JPS5429901B2 true JPS5429901B2 (enrdf_load_stackoverflow) 1979-09-27

Family

ID=11960084

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1802472A Expired JPS5429901B2 (enrdf_load_stackoverflow) 1972-02-23 1972-02-23

Country Status (3)

Country Link
JP (1) JPS5429901B2 (enrdf_load_stackoverflow)
DE (1) DE2309072C3 (enrdf_load_stackoverflow)
GB (1) GB1430193A (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56110234A (en) * 1980-02-06 1981-09-01 Canon Inc Projection printing device
CN106292735B (zh) * 2016-08-19 2019-06-28 泉州市汉威机械制造有限公司 一种材料影像定位控制方法

Also Published As

Publication number Publication date
GB1430193A (en) 1976-03-31
DE2309072C3 (de) 1980-09-25
DE2309072A1 (de) 1973-09-13
DE2309072B2 (de) 1980-01-24
JPS4888949A (enrdf_load_stackoverflow) 1973-11-21

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