JPS5426875B2 - - Google Patents

Info

Publication number
JPS5426875B2
JPS5426875B2 JP1085877A JP1085877A JPS5426875B2 JP S5426875 B2 JPS5426875 B2 JP S5426875B2 JP 1085877 A JP1085877 A JP 1085877A JP 1085877 A JP1085877 A JP 1085877A JP S5426875 B2 JPS5426875 B2 JP S5426875B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1085877A
Other languages
Japanese (ja)
Other versions
JPS52103967A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS52103967A publication Critical patent/JPS52103967A/ja
Publication of JPS5426875B2 publication Critical patent/JPS5426875B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • H01J37/3007—Electron or ion-optical systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/302—Controlling tubes by external information, e.g. programme control
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/304—Controlling tubes
    • H01J2237/30472—Controlling the beam
    • H01J2237/30483—Scanning
    • H01J2237/30488—Raster scan
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3175—Lithography
    • H01J2237/31776—Shaped beam
JP1085877A 1976-02-05 1977-02-04 Method of iluminating surface of material to be machined and apparatus therefor Granted JPS52103967A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US65542776A 1976-02-05 1976-02-05

Publications (2)

Publication Number Publication Date
JPS52103967A JPS52103967A (en) 1977-08-31
JPS5426875B2 true JPS5426875B2 (ru) 1979-09-06

Family

ID=24628844

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1085877A Granted JPS52103967A (en) 1976-02-05 1977-02-04 Method of iluminating surface of material to be machined and apparatus therefor

Country Status (5)

Country Link
JP (1) JPS52103967A (ru)
CA (1) CA1149086A (ru)
DE (1) DE2704441A1 (ru)
FR (1) FR2340616A1 (ru)
GB (1) GB1557924A (ru)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5251871A (en) * 1975-10-23 1977-04-26 Rikagaku Kenkyusho Projecting method for charge particle beams
NL177578C (nl) * 1976-05-14 1985-10-16 Thomson Csf Inrichting voor het beschrijven van een voorwerp met een deeltjesbundel.
JPS5316578A (en) * 1976-07-30 1978-02-15 Toshiba Corp Electron beam exposure apparatus
CA1166766A (en) * 1977-02-23 1984-05-01 Hans C. Pfeiffer Method and apparatus for forming a variable size electron beam
CA1100237A (en) * 1977-03-23 1981-04-28 Roger F.W. Pease Multiple electron beam exposure system
GB1598219A (en) * 1977-08-10 1981-09-16 Ibm Electron beam system
JPS5442980A (en) * 1977-09-10 1979-04-05 Cho Lsi Gijutsu Kenkyu Kumiai Electron beam unit
JPS5463681A (en) * 1977-10-29 1979-05-22 Nippon Aviotronics Kk Electron beam exposure device
JPS5610926A (en) * 1979-07-06 1981-02-03 Hitachi Ltd Electron beam drawing device
JPS5744684Y2 (ru) * 1981-01-22 1982-10-02
US4445041A (en) * 1981-06-02 1984-04-24 Hewlett-Packard Company Electron beam blanker

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5283177A (en) * 1975-12-31 1977-07-11 Fujitsu Ltd Electron beam exposure device
JPS5320391A (en) * 1976-08-09 1978-02-24 Becton Dickinson Co Blood inspection apparatus
JPS5829490A (ja) * 1981-08-18 1983-02-21 松下電器産業株式会社 脱水機
JPS5845742A (ja) * 1981-08-31 1983-03-17 ヘキスト・アクチエンゲゼルシヤフト 酢酸メチル及び／又はジメチルエ−テルをカルボニル化する際に生じる汚染された触媒溶液を浄化及び回収する方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5283177A (en) * 1975-12-31 1977-07-11 Fujitsu Ltd Electron beam exposure device
JPS5320391A (en) * 1976-08-09 1978-02-24 Becton Dickinson Co Blood inspection apparatus
JPS5829490A (ja) * 1981-08-18 1983-02-21 松下電器産業株式会社 脱水機
JPS5845742A (ja) * 1981-08-31 1983-03-17 ヘキスト・アクチエンゲゼルシヤフト 酢酸メチル及び／又はジメチルエ−テルをカルボニル化する際に生じる汚染された触媒溶液を浄化及び回収する方法

Also Published As

Publication number Publication date
GB1557924A (en) 1979-12-19
DE2704441A1 (de) 1977-08-11
JPS52103967A (en) 1977-08-31
CA1149086A (en) 1983-06-28
FR2340616A1 (fr) 1977-09-02

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