JPS5419636B2 - - Google Patents
Info
- Publication number
- JPS5419636B2 JPS5419636B2 JP524276A JP524276A JPS5419636B2 JP S5419636 B2 JPS5419636 B2 JP S5419636B2 JP 524276 A JP524276 A JP 524276A JP 524276 A JP524276 A JP 524276A JP S5419636 B2 JPS5419636 B2 JP S5419636B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/301—Arrangements enabling beams to pass between regions of different pressure
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
- H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Welding Or Cutting Using Electron Beams (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP524276A JPS5288900A (en) | 1976-01-19 | 1976-01-19 | Ion beam machine tool |
US05/759,870 US4101772A (en) | 1976-01-19 | 1977-01-17 | Ion-beam etching method and an apparatus therefor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP524276A JPS5288900A (en) | 1976-01-19 | 1976-01-19 | Ion beam machine tool |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5288900A JPS5288900A (en) | 1977-07-25 |
JPS5419636B2 true JPS5419636B2 (ja) | 1979-07-17 |
Family
ID=11605720
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP524276A Granted JPS5288900A (en) | 1976-01-19 | 1976-01-19 | Ion beam machine tool |
Country Status (2)
Country | Link |
---|---|
US (1) | US4101772A (ja) |
JP (1) | JPS5288900A (ja) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS608462Y2 (ja) * | 1980-09-19 | 1985-03-25 | 北川工業株式会社 | 配線基板用スペ−サ |
JPH0134409Y2 (ja) * | 1982-05-31 | 1989-10-19 | ||
JPH02233009A (ja) * | 1989-03-07 | 1990-09-14 | Miyota Seimitsu Kk | 音叉型圧電振動子の周波数調整方法 |
JPH0368561B2 (ja) * | 1981-12-02 | 1991-10-29 | Matsushita Electric Ind Co Ltd | |
JPH0868805A (ja) * | 1994-08-30 | 1996-03-12 | Murata Mfg Co Ltd | イオンビーム加工装置 |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4245768A (en) * | 1978-07-28 | 1981-01-20 | The Unites States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Method of cold welding using ion beam technology |
US4419203A (en) * | 1982-03-05 | 1983-12-06 | International Business Machines Corporation | Apparatus and method for neutralizing ion beams |
JPS60243958A (ja) * | 1984-05-18 | 1985-12-03 | Hitachi Ltd | イオンビ−ム装置 |
US4845041A (en) * | 1985-11-20 | 1989-07-04 | Analyte Corporation | Atomic-absorption sputtering chamber and system |
US4874460A (en) * | 1987-11-16 | 1989-10-17 | Seiko Instruments Inc. | Method and apparatus for modifying patterned film |
JP2650930B2 (ja) * | 1987-11-24 | 1997-09-10 | 株式会社日立製作所 | 超格子構作の素子製作方法 |
US5091048A (en) * | 1990-09-17 | 1992-02-25 | National Semiconductor Corp. | Ion milling to obtain planarization |
US9105438B2 (en) | 2012-05-31 | 2015-08-11 | Fei Company | Imaging and processing for plasma ion source |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3294954A (en) * | 1963-10-15 | 1966-12-27 | Harnischfeger Corp | Welding method and apparatus |
US3377506A (en) * | 1966-03-30 | 1968-04-09 | United Aircraft Corp | Electromagnetic current control for a hollow cathode |
-
1976
- 1976-01-19 JP JP524276A patent/JPS5288900A/ja active Granted
-
1977
- 1977-01-17 US US05/759,870 patent/US4101772A/en not_active Expired - Lifetime
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS608462Y2 (ja) * | 1980-09-19 | 1985-03-25 | 北川工業株式会社 | 配線基板用スペ−サ |
JPH0368561B2 (ja) * | 1981-12-02 | 1991-10-29 | Matsushita Electric Ind Co Ltd | |
JPH0134409Y2 (ja) * | 1982-05-31 | 1989-10-19 | ||
JPH02233009A (ja) * | 1989-03-07 | 1990-09-14 | Miyota Seimitsu Kk | 音叉型圧電振動子の周波数調整方法 |
JPH0868805A (ja) * | 1994-08-30 | 1996-03-12 | Murata Mfg Co Ltd | イオンビーム加工装置 |
Also Published As
Publication number | Publication date |
---|---|
US4101772A (en) | 1978-07-18 |
JPS5288900A (en) | 1977-07-25 |