JPS5417987A - Photoopolymerizable bineder - Google Patents

Photoopolymerizable bineder

Info

Publication number
JPS5417987A
JPS5417987A JP8252478A JP8252478A JPS5417987A JP S5417987 A JPS5417987 A JP S5417987A JP 8252478 A JP8252478 A JP 8252478A JP 8252478 A JP8252478 A JP 8252478A JP S5417987 A JPS5417987 A JP S5417987A
Authority
JP
Japan
Prior art keywords
photoopolymerizable
bineder
photoopolymerizable bineder
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8252478A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6331483B2 (enExample
Inventor
Kiyusuterusu Uerunaa
Hairu Giyuntaa
Fuitsushiyaa Maruchin
Fuiizeruto Manfureeto
Kasuto Herumuuto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF SE
Original Assignee
BASF SE
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by BASF SE filed Critical BASF SE
Publication of JPS5417987A publication Critical patent/JPS5417987A/ja
Publication of JPS6331483B2 publication Critical patent/JPS6331483B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/02—Printing inks
    • C09D11/10—Printing inks based on artificial resins
    • C09D11/101—Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/109—Polyester
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/124—Carbonyl compound containing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Materials Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Wood Science & Technology (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Paints Or Removers (AREA)
  • Polymerisation Methods In General (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
JP8252478A 1977-07-08 1978-07-08 Photoopolymerizable bineder Granted JPS5417987A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19772730897 DE2730897A1 (de) 1977-07-08 1977-07-08 Photopolymerisierbare bindemittel

Publications (2)

Publication Number Publication Date
JPS5417987A true JPS5417987A (en) 1979-02-09
JPS6331483B2 JPS6331483B2 (enExample) 1988-06-24

Family

ID=6013462

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8252478A Granted JPS5417987A (en) 1977-07-08 1978-07-08 Photoopolymerizable bineder

Country Status (6)

Country Link
US (1) US4147604A (enExample)
EP (1) EP0000342B1 (enExample)
JP (1) JPS5417987A (enExample)
AT (1) AT370756B (enExample)
DE (2) DE2730897A1 (enExample)
IT (1) IT1105066B (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007534792A (ja) * 2004-01-29 2007-11-29 サン・ケミカル・コーポレーション ピペラジノ感光剤

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5978339A (ja) * 1982-10-28 1984-05-07 Fuji Photo Film Co Ltd 光重合性組成物
US4576975A (en) * 1983-03-03 1986-03-18 Minnesota Mining And Manufacturing Company Water soluble Michler's ketone analogs in combined photoinitiator composition and polymerizable composition
US4507497A (en) * 1983-03-03 1985-03-26 Minnesota Mining And Manufacturing Company Water soluble michlers ketone analogs
US4563438A (en) * 1983-05-06 1986-01-07 Ciba Geigy Corporation Liquid mixture of photoinitiators
US4532021A (en) * 1983-07-18 1985-07-30 Desoto, Inc. Adherent ultraviolet cured coatings
DE3331474A1 (de) * 1983-09-01 1985-03-21 Basf Ag, 6700 Ludwigshafen Photopolymerisierbare mischungen mit speziellen diaminobenzophenon-verbindungen
US4565769A (en) * 1984-11-21 1986-01-21 E. I. Du Pont De Nemours And Company Polymeric sensitizers for photopolymer composition
DE19526856A1 (de) * 1995-07-22 1997-01-23 Basf Ag Strahlungshärtbare Massen mit kovalent gebundenen Photoinitiatoren
EP3798238A1 (en) 2015-01-05 2021-03-31 IGM Group B.V. Led-curable low migration photoinitiators
CN119708499A (zh) * 2023-09-28 2025-03-28 上海交通大学 低表面能大分子光引发剂、uv led光固化涂料及光固化肤感涂层
CN117343262A (zh) * 2023-10-31 2024-01-05 清华大学 一种紫外光照调控力学性能的聚氨酯脲薄膜及其制备方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3933682A (en) * 1973-01-31 1976-01-20 Sun Chemical Corporation Photopolymerization co-initiator systems
JPS5337902B2 (enExample) * 1973-09-04 1978-10-12
US4056453A (en) * 1973-11-27 1977-11-01 Basf Aktiengesellschaft Uv-curing printing inks
GB1486411A (en) 1974-09-11 1977-09-21 Peel E Flat plate coolers
GB1486911A (en) * 1974-09-17 1977-09-28 Scm Corp Ultraviolet and laser curing of polymerizable binders
US3966573A (en) * 1974-10-31 1976-06-29 Sun Chemical Corporation Photopolymerization co-initiator systems
JPS591401B2 (ja) * 1976-04-26 1984-01-12 東洋インキ製造株式会社 紫外線硬化性組成物
US4048034A (en) * 1976-08-27 1977-09-13 Uop Inc. Photopolymerization using an alpha-aminoacetophenone

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007534792A (ja) * 2004-01-29 2007-11-29 サン・ケミカル・コーポレーション ピペラジノ感光剤
JP4833083B2 (ja) * 2004-01-29 2011-12-07 サン・ケミカル・コーポレーション ピペラジノ感光剤

Also Published As

Publication number Publication date
AT370756B (de) 1983-05-10
DE2861345D1 (de) 1982-01-28
US4147604A (en) 1979-04-03
EP0000342B1 (de) 1981-11-25
DE2730897A1 (de) 1979-02-01
IT7850047A0 (it) 1978-06-27
JPS6331483B2 (enExample) 1988-06-24
ATA495078A (de) 1982-09-15
EP0000342A1 (de) 1979-01-24
IT1105066B (it) 1985-10-28

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