JPS54154345A - Movable aperture plate of objective lens - Google Patents
Movable aperture plate of objective lensInfo
- Publication number
- JPS54154345A JPS54154345A JP6221378A JP6221378A JPS54154345A JP S54154345 A JPS54154345 A JP S54154345A JP 6221378 A JP6221378 A JP 6221378A JP 6221378 A JP6221378 A JP 6221378A JP S54154345 A JPS54154345 A JP S54154345A
- Authority
- JP
- Japan
- Prior art keywords
- aperture
- holes
- plate
- thin
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Analysing Materials By The Use Of Radiation (AREA)
- Mechanical Light Control Or Optical Switches (AREA)
Abstract
PURPOSE: To enable accurate sample information to be obtained by providing aperture holes to a thin-film aperture plate, providing aperture holes to an aperture pressure plate as well and forming space parts to the portions of the thin-film aperture plate in contact with the portions thereof provided with said aperture holes.
CONSTITUTION: A thin-film aperture plate 8 made of heavy metals having aperture holes 17, 18 of different diameters and a large hole 19 is placed on an aperture table 13 and is pressed by an aperture pressure plate 12 which is provided with apertur holes 21, 22 and is composed of relatively light metal material. Since these aperture holes 17, 18, 21, 22 are disposed on one straight line, a primary electron beam 1 may be stopped down to various sizes by transversely movining a movable plate 3. A scanning electron microscope is obtained by using the aperture holes 17, 18 of the thin-film aperture plate 8 and non-diffusion X-ray analysis is accomplished by using the apertur plates 21, 22 of the aperture pressure plate 12, whereby always accurate information of specimen may be obtained.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6221378A JPS54154345A (en) | 1978-05-26 | 1978-05-26 | Movable aperture plate of objective lens |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6221378A JPS54154345A (en) | 1978-05-26 | 1978-05-26 | Movable aperture plate of objective lens |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS54154345A true JPS54154345A (en) | 1979-12-05 |
Family
ID=13193633
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6221378A Pending JPS54154345A (en) | 1978-05-26 | 1978-05-26 | Movable aperture plate of objective lens |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS54154345A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2009125603A1 (en) * | 2008-04-11 | 2009-10-15 | 株式会社荏原製作所 | Specimen observation method and device, and inspection method and device using the method and device |
JP2009288032A (en) * | 2008-05-28 | 2009-12-10 | Hitachi High-Technologies Corp | Surface inspection device and surface inspection method |
-
1978
- 1978-05-26 JP JP6221378A patent/JPS54154345A/en active Pending
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2009125603A1 (en) * | 2008-04-11 | 2009-10-15 | 株式会社荏原製作所 | Specimen observation method and device, and inspection method and device using the method and device |
KR20110009138A (en) * | 2008-04-11 | 2011-01-27 | 가부시키가이샤 에바라 세이사꾸쇼 | Specimen observation method and device, and inspection method and device using the method and device |
US8937283B2 (en) | 2008-04-11 | 2015-01-20 | Ebara Corporation | Specimen observation method and device using secondary emission electron and mirror electron detection |
TWI473140B (en) * | 2008-04-11 | 2015-02-11 | Ebara Corp | Sample observation method and apparatus, and inspection method and apparatus using the same |
US9966227B2 (en) | 2008-04-11 | 2018-05-08 | Ebara Corporation | Specimen observation method and device using secondary emission electron and mirror electron detection |
JP2009288032A (en) * | 2008-05-28 | 2009-12-10 | Hitachi High-Technologies Corp | Surface inspection device and surface inspection method |
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