JPS54152634A - Vacuum deposition method - Google Patents

Vacuum deposition method

Info

Publication number
JPS54152634A
JPS54152634A JP6133178A JP6133178A JPS54152634A JP S54152634 A JPS54152634 A JP S54152634A JP 6133178 A JP6133178 A JP 6133178A JP 6133178 A JP6133178 A JP 6133178A JP S54152634 A JPS54152634 A JP S54152634A
Authority
JP
Japan
Prior art keywords
deposition
substrate
vacuum
irradiating
substance
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6133178A
Other languages
Japanese (ja)
Inventor
Tadaharu Tomita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Suwa Seikosha KK
Original Assignee
Seiko Epson Corp
Suwa Seikosha KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp, Suwa Seikosha KK filed Critical Seiko Epson Corp
Priority to JP6133178A priority Critical patent/JPS54152634A/en
Publication of JPS54152634A publication Critical patent/JPS54152634A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:To form a high density diposited film with good adherence on a substrate made of substance of low heat resistance by carrying out deposition in a vacuum while irradiating the substrate with electromagnetic waves having specified energy. CONSTITUTION:In deposition of silicon oxide or the like on a substrate made of substance of low heat resistance, e.g. plastics, deposition is carried out in a vacuum while irradiating the substrate with electromagnetic waves having energy of 1-1X16<10> eV. By this method the adherence and density of a deposited film of silicon oxide or the like are raised. This method is applicable to a wide material range including a lens, glass and a plastic sheet.
JP6133178A 1978-05-23 1978-05-23 Vacuum deposition method Pending JPS54152634A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6133178A JPS54152634A (en) 1978-05-23 1978-05-23 Vacuum deposition method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6133178A JPS54152634A (en) 1978-05-23 1978-05-23 Vacuum deposition method

Publications (1)

Publication Number Publication Date
JPS54152634A true JPS54152634A (en) 1979-12-01

Family

ID=13168040

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6133178A Pending JPS54152634A (en) 1978-05-23 1978-05-23 Vacuum deposition method

Country Status (1)

Country Link
JP (1) JPS54152634A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0190051A2 (en) * 1985-01-30 1986-08-06 Kabushiki Kaisha Toshiba Method and apparatus for forming films

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0190051A2 (en) * 1985-01-30 1986-08-06 Kabushiki Kaisha Toshiba Method and apparatus for forming films

Similar Documents

Publication Publication Date Title
IE790071L (en) Coating aluminium articles.
JPS54152634A (en) Vacuum deposition method
ES2090084T3 (en) METHOD AND APPARATUS FOR PRODUCING LAMINAR MATERIAL SUSCEPTOR FOR MICROWAVES.
JPS5565239A (en) Method of forming film of titanium oxide on plastic base plate
FR2451104A1 (en) METHOD OF ENCAPSULATING SEMICONDUCTOR COMPONENTS IN A PLASTIC MATERIAL
JPS5579447A (en) Photomask substrate and photomask
JPS53133245A (en) Formation of thermoplastic resin layer on substrate sheet, e. g. plastic sheet, paper
JPS54127877A (en) Preparation of thin film
JPS54141391A (en) Manufacture of metallized film
JPS5745980A (en) Amorphous solar battery and manufacture thereof
JPS5614498A (en) Manufacture of transparent electrically conductive thin film
JPS56125435A (en) Food packaging antifogging film and production thereof
JPS5419200A (en) Magnetic recording medium process
JPS6443915A (en) Manufacture of superconductive material
JPS57162474A (en) Photoelectromotive element and manufacture thereof
JPS5435179A (en) Forming method for boron film
JPS56144536A (en) Pattern formation and p-n junction formation
JPS5591971A (en) Thin film forming method
JPS57180110A (en) Manufacture of magnetic recording medium
JPS5629845A (en) Manufacture for magnetic recording medium
JPS57207016A (en) Preparation of surface coating material
JPS55161613A (en) Manufacture of recurrent reflection sheet
JPS57185378A (en) Preparation of thin film of fluorescent material
JPS51151742A (en) Pearl-luster polystyrene composition and laminated sheet therefrom
JPS55135410A (en) Sealing method for surface wave device