JPS54141609A - Production of metal thin film type magnetic recording medium - Google Patents

Production of metal thin film type magnetic recording medium

Info

Publication number
JPS54141609A
JPS54141609A JP5054578A JP5054578A JPS54141609A JP S54141609 A JPS54141609 A JP S54141609A JP 5054578 A JP5054578 A JP 5054578A JP 5054578 A JP5054578 A JP 5054578A JP S54141609 A JPS54141609 A JP S54141609A
Authority
JP
Japan
Prior art keywords
base material
magnetic
vapor flow
magnetic layer
film thickness
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5054578A
Other languages
Japanese (ja)
Other versions
JPS5751174B2 (en
Inventor
Koichi Shinohara
Toshiaki Kunieda
Hisao Matsuura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP5054578A priority Critical patent/JPS54141609A/en
Publication of JPS54141609A publication Critical patent/JPS54141609A/en
Publication of JPS5751174B2 publication Critical patent/JPS5751174B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Magnetic Record Carriers (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Thin Magnetic Films (AREA)

Abstract

PURPOSE:To impart superior characteristics as a magnetic tape of long length used in magnetic sound and video recording by directing non-magnetic layer vapor flow to a base material and at the same instant striking electrons against the same at the forming of the non-magnetic layer separating a ferromagnetic layer. CONSTITUTION:In a vacuum vessel 9 which is maintained of a vacuum atmosphere by an exhaust system 19, a high molecular molding base material 16 moves along the peripheral side face of a cooling can 10 from a let-off shaft 21 and is taken up on a take-up shaft 20 via roller 22. The non-magnetic material 11 in a water cooled copper hearth 12 is heated by an electron gun 13 and the vapor flow 23 thereof is directed to the base material 16 on the can 10 between deposition preventing plates 17. At this time, a potential is applied to an acceleration electrode 14 such as of metal screen of stainless steel disposed between the base material 16 and material 11 from a power source 15 via insulation lead-in terminal 18, whereby electrons are striken to the vapor flow 23 and a part thereof becomes of plasma state. This improves the rate of coverage of the film thickness formed on the substrate 16, in a small region and enables the non-magnetic layer film thickness to be reduced.
JP5054578A 1978-04-26 1978-04-26 Production of metal thin film type magnetic recording medium Granted JPS54141609A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5054578A JPS54141609A (en) 1978-04-26 1978-04-26 Production of metal thin film type magnetic recording medium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5054578A JPS54141609A (en) 1978-04-26 1978-04-26 Production of metal thin film type magnetic recording medium

Publications (2)

Publication Number Publication Date
JPS54141609A true JPS54141609A (en) 1979-11-05
JPS5751174B2 JPS5751174B2 (en) 1982-10-30

Family

ID=12861973

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5054578A Granted JPS54141609A (en) 1978-04-26 1978-04-26 Production of metal thin film type magnetic recording medium

Country Status (1)

Country Link
JP (1) JPS54141609A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5979426A (en) * 1982-10-29 1984-05-08 Tdk Corp Magnetic recording medium
JPS63146219A (en) * 1986-12-10 1988-06-18 Hitachi Ltd Magnetic recording medium

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5979426A (en) * 1982-10-29 1984-05-08 Tdk Corp Magnetic recording medium
JPH0413764B2 (en) * 1982-10-29 1992-03-10 Tdk Electronics Co Ltd
JPS63146219A (en) * 1986-12-10 1988-06-18 Hitachi Ltd Magnetic recording medium

Also Published As

Publication number Publication date
JPS5751174B2 (en) 1982-10-30

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