JPS54126067A - Film thickness meter of quartz oscillator type - Google Patents
Film thickness meter of quartz oscillator typeInfo
- Publication number
- JPS54126067A JPS54126067A JP3371178A JP3371178A JPS54126067A JP S54126067 A JPS54126067 A JP S54126067A JP 3371178 A JP3371178 A JP 3371178A JP 3371178 A JP3371178 A JP 3371178A JP S54126067 A JPS54126067 A JP S54126067A
- Authority
- JP
- Japan
- Prior art keywords
- oscillator
- evaporation source
- quartz oscillator
- mesh
- metal mesh
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Length Measuring Devices Characterised By Use Of Acoustic Means (AREA)
Abstract
PURPOSE: To enhance the detecting accuracy of an evaporated film thickness and to reduce the replacement frequency of a quartz oscillator by mounting a metal mesh, which has a replaceable different aperture ratio, between the quartz oscillator and an evaporation source and on the front side of the oscillator.
CONSTITUTION: A metal mesh 5, which is attached to a rotary disc having several kinds of replaceable opening ratios, is arranged between a quartz oscillator 4 for metering the thickness of an evaporated film and an evaporation source 2 and on the front side of the oscillator 4. Here, the evaporation source 2 uses three series electron gun heating evaporation sources. The metal mesh 5 has three kinds of opening ratios of 5, 10 and 50 while using 100 to 300 meshes. Moreover, the distance between the evaporation source 2 and the substrate 3 and the oscillator 4 is 30cm, whereas the distance between the mesh 5 and the oscillator 4 is 5 cm. The mesh 5 is so constructed that it can be selected suitably from the outside operation. According to such construction, it is possible to provide a film thicness meter which is highly accurate in detection but has little replacement frequency of the oscillators.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3371178A JPS54126067A (en) | 1978-03-23 | 1978-03-23 | Film thickness meter of quartz oscillator type |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3371178A JPS54126067A (en) | 1978-03-23 | 1978-03-23 | Film thickness meter of quartz oscillator type |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS54126067A true JPS54126067A (en) | 1979-09-29 |
Family
ID=12393986
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3371178A Pending JPS54126067A (en) | 1978-03-23 | 1978-03-23 | Film thickness meter of quartz oscillator type |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS54126067A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2771810A1 (en) * | 1997-11-28 | 1999-06-04 | Sgs Thomson Microelectronics | Monitoring procedure for application of deposit by evaporation |
| CN105603379A (en) * | 2016-01-05 | 2016-05-25 | 京东方科技集团股份有限公司 | Detection device for detecting thickness of vacuum vapor plating membrane and vacuum vapor plating device |
| WO2019186894A1 (en) * | 2018-03-29 | 2019-10-03 | シャープ株式会社 | Vapor deposition device and vapor deposition method |
-
1978
- 1978-03-23 JP JP3371178A patent/JPS54126067A/en active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2771810A1 (en) * | 1997-11-28 | 1999-06-04 | Sgs Thomson Microelectronics | Monitoring procedure for application of deposit by evaporation |
| CN105603379A (en) * | 2016-01-05 | 2016-05-25 | 京东方科技集团股份有限公司 | Detection device for detecting thickness of vacuum vapor plating membrane and vacuum vapor plating device |
| CN105603379B (en) * | 2016-01-05 | 2019-04-02 | 京东方科技集团股份有限公司 | A kind of detection device and vacuum deposition apparatus detecting vacuum evaporation film thickness |
| WO2019186894A1 (en) * | 2018-03-29 | 2019-10-03 | シャープ株式会社 | Vapor deposition device and vapor deposition method |
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