JPS54121802A - Photosensitive printing plate - Google Patents

Photosensitive printing plate

Info

Publication number
JPS54121802A
JPS54121802A JP2761478A JP2761478A JPS54121802A JP S54121802 A JPS54121802 A JP S54121802A JP 2761478 A JP2761478 A JP 2761478A JP 2761478 A JP2761478 A JP 2761478A JP S54121802 A JPS54121802 A JP S54121802A
Authority
JP
Japan
Prior art keywords
printing plate
photosensitive printing
photosensitive
plate
printing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2761478A
Other languages
English (en)
Other versions
JPS5551176B2 (ja
Inventor
Shiyuusuke Iwasaki
Jiyunichi Igarashi
Shiyunichi Kasukawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TOKYO OUKA KOUGIYOU KK
Original Assignee
TOKYO OUKA KOUGIYOU KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by TOKYO OUKA KOUGIYOU KK filed Critical TOKYO OUKA KOUGIYOU KK
Priority to JP2761478A priority Critical patent/JPS54121802A/ja
Priority to US06/170,670 priority patent/US4371602A/en
Priority to DE2940976A priority patent/DE2940976C1/de
Priority to PCT/JP1979/000060 priority patent/WO1979000748A1/ja
Publication of JPS54121802A publication Critical patent/JPS54121802A/ja
Priority to EP79900249A priority patent/EP0011648B1/en
Publication of JPS5551176B2 publication Critical patent/JPS5551176B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/0226—Quinonediazides characterised by the non-macromolecular additives
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/0166—Diazonium salts or compounds characterised by the non-macromolecular additives
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/115—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having supports or layers with means for obtaining a screen effect or for obtaining better contact in vacuum printing
JP2761478A 1978-03-13 1978-03-13 Photosensitive printing plate Granted JPS54121802A (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2761478A JPS54121802A (en) 1978-03-13 1978-03-13 Photosensitive printing plate
US06/170,670 US4371602A (en) 1978-03-13 1979-03-09 Photosensitive printing plate
DE2940976A DE2940976C1 (de) 1978-03-13 1979-03-09 Verfahren zur Herstellung einer lichtempfindlichen Druckplatte
PCT/JP1979/000060 WO1979000748A1 (en) 1978-03-13 1979-03-09 Photosensitive printing plate
EP79900249A EP0011648B1 (en) 1978-03-13 1979-10-09 Process for reducing the contact time between a photosensitive printing plate and an original

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2761478A JPS54121802A (en) 1978-03-13 1978-03-13 Photosensitive printing plate

Publications (2)

Publication Number Publication Date
JPS54121802A true JPS54121802A (en) 1979-09-21
JPS5551176B2 JPS5551176B2 (ja) 1980-12-23

Family

ID=12225803

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2761478A Granted JPS54121802A (en) 1978-03-13 1978-03-13 Photosensitive printing plate

Country Status (5)

Country Link
US (1) US4371602A (ja)
EP (1) EP0011648B1 (ja)
JP (1) JPS54121802A (ja)
DE (1) DE2940976C1 (ja)
WO (1) WO1979000748A1 (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59102231A (ja) * 1982-11-12 1984-06-13 ミネソタ・マイニング・アンド・マニユフアクチユアリング・コンパニ− ビジキユラ−像形成材料

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3246403A1 (de) * 1982-12-15 1984-06-20 Merck Patent Gmbh, 6100 Darmstadt Verfahren zur entwicklung von reliefstrukturen auf der basis von strahlungsvernetzten polymervorstufen hochwaermebestaendiger polymere
JPS61291247A (ja) * 1985-06-19 1986-12-22 Nissan Motor Co Ltd 自動車用バンパ
US4764449A (en) * 1985-11-01 1988-08-16 The Chromaline Corporation Adherent sandblast photoresist laminate
US5185233A (en) * 1986-04-11 1993-02-09 Canon Kabushiki Kaisha Method of optical recording employing free radicals
JP2668540B2 (ja) * 1988-03-03 1997-10-27 富士写真フイルム株式会社 感光性組成物
US5260173A (en) * 1990-04-19 1993-11-09 Birkholm James G Process for laminated electromagnetic radiation imaged polymerized material with a integral membrane
DE4126836A1 (de) * 1991-08-14 1993-02-18 Hoechst Ag Strahlungsempfindliches aufzeichnungsmaterial aus schichttraeger und positiv arbeitender, strahlungsempfindlicher schicht mit rauher oberflaeche
DE69507532T2 (de) * 1994-05-13 1999-06-17 Brother Ind Ltd Verfahren und Gerät zur Herstellung eines Reliefmusters, sowie dieses Muster tragendes Blatt
DE60321148D1 (de) * 2002-03-15 2008-07-03 Kodak Graphic Comm Canada Co Empfindlichkeitsverbesserung für strahlungsempfindliche elemente
US8173346B2 (en) * 2008-05-28 2012-05-08 Presstek, Inc. Printing members having permeability-transition layers and related methods
US8507153B2 (en) * 2009-08-31 2013-08-13 General Electric Company Compositions, optical data storage media and methods for using the optical data storage media
CN102455596B (zh) * 2010-10-28 2013-05-08 京东方科技集团股份有限公司 光刻胶、离地剥离的方法和tft阵列基板的制作方法

Family Cites Families (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB160694A (en) * 1920-06-02 1921-03-31 Frank Tunnicliff An improved spout or lip for teapots, jugs, ewers, basins, and the like
FR873675A (fr) * 1940-07-09 1942-07-16 Zeiss Ikon Ag Procédé destiné à empêcher la formation des anneaux de newton sur les couches photosensibles
BE504034A (ja) * 1950-06-17
US2699392A (en) * 1951-12-12 1955-01-11 Gen Aniline & Film Corp Vesicular prints and process of making same
GB814299A (en) * 1955-11-09 1959-06-03 Thos J Moran Sons Inc Improvements in or relating to photographic reliefs
US2996381A (en) * 1957-07-02 1961-08-15 Kalvar Corp Photographic materials and procedures for using same
US3298833A (en) * 1960-12-30 1967-01-17 Gen Electric Method for storing information
US3108872A (en) * 1961-09-27 1963-10-29 Photo-thermolytical vesicular
DE1237590B (de) * 1965-01-08 1967-03-30 Agfa Gevaert Ag Verfahren zur Herstellung von Kopien durch bildmaessige Erwaermung
US3507678A (en) * 1965-09-28 1970-04-21 Fuji Photo Film Co Ltd Process for the production of a matted photographic material
US3482973A (en) * 1965-10-01 1969-12-09 Xerox Corp Imaging system
US3607273A (en) * 1967-03-08 1971-09-21 American Screen Process Equip Image formation by selective foam generation
DE1522444B2 (de) * 1967-03-10 1977-07-07 Basf Ag, 6700 Ludwigshafen Polymerisationsinhibitor enthaltendes lichtvernetzbares gemisch
US4199359A (en) * 1968-05-16 1980-04-22 Xerox Corporation Photographic screen stencil printing process
US4019909A (en) * 1970-02-16 1977-04-26 E. I. Du Pont De Nemours And Company Photohardenable vesicular image-forming elements
GB1411695A (en) * 1972-05-08 1975-10-29 Funahashi Takaji Materials for use in printing
JPS4983749A (ja) * 1972-12-18 1974-08-12
US3891443A (en) * 1973-02-01 1975-06-24 Polychrome Corp Mat finish photosensitive relief plates
JPS5618345B2 (ja) * 1973-07-20 1981-04-28
JPS50125805A (ja) * 1974-03-19 1975-10-03
US4168979A (en) * 1974-03-19 1979-09-25 Fuji Photo Film Co., Ltd. Light-sensitive printing plate with matt overlayer
CH584917A5 (ja) 1974-04-03 1977-02-15 Rose Albert
JPS5729692B2 (ja) * 1974-09-17 1982-06-24
US3984244A (en) * 1974-11-27 1976-10-05 E. I. Du Pont De Nemours And Company Process for laminating a channeled photosensitive layer on an irregular surface
JPS5229302A (en) * 1975-08-28 1977-03-05 Fuji Photo Film Co Ltd Photoosensitive printing plate

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59102231A (ja) * 1982-11-12 1984-06-13 ミネソタ・マイニング・アンド・マニユフアクチユアリング・コンパニ− ビジキユラ−像形成材料
JPH0433022B2 (ja) * 1982-11-12 1992-06-01 Minnesota Mining & Mfg

Also Published As

Publication number Publication date
EP0011648A1 (en) 1980-06-11
DE2940976C1 (de) 1982-11-25
US4371602A (en) 1983-02-01
WO1979000748A1 (en) 1979-10-04
JPS5551176B2 (ja) 1980-12-23
EP0011648A4 (en) 1981-04-24
DE2940976A1 (en) 1981-01-29
EP0011648B1 (en) 1984-05-16

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