JPS54111773A - Semiconductor wafer - Google Patents
Semiconductor waferInfo
- Publication number
- JPS54111773A JPS54111773A JP1844078A JP1844078A JPS54111773A JP S54111773 A JPS54111773 A JP S54111773A JP 1844078 A JP1844078 A JP 1844078A JP 1844078 A JP1844078 A JP 1844078A JP S54111773 A JPS54111773 A JP S54111773A
- Authority
- JP
- Japan
- Prior art keywords
- grooves
- photo resist
- wafer
- target pattern
- center
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
PURPOSE: To reduce the position shift, by turning all the target pattern constituting grooves to the direction taking 45° to the direction of flowing of photo resist coated in rotation.
CONSTITUTION: The target pattern having a plural number of grooves orthogonal to the unidirectional grooves of plurality to a part away from the center is formed on the wafer, and the direction of groove is taken as 45° to the striaght line tying the wafer center and the target. Thus, in rotary coating of photo resist, the flow 7 of resist makes 45° to the direction of grooves, and the pool 5 and concave 6 are smaller for the photo resist than the case with parallel grooves. Then, the accuracy is increased, by performing the detection of position with the detectors 3a to 3d by means of light amount.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1844078A JPS54111773A (en) | 1978-02-22 | 1978-02-22 | Semiconductor wafer |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1844078A JPS54111773A (en) | 1978-02-22 | 1978-02-22 | Semiconductor wafer |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS54111773A true JPS54111773A (en) | 1979-09-01 |
Family
ID=11971690
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1844078A Pending JPS54111773A (en) | 1978-02-22 | 1978-02-22 | Semiconductor wafer |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS54111773A (en) |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5215510A (en) * | 1975-07-28 | 1977-02-05 | Nippon Chemical Ind | Optical glass |
JPS52143772A (en) * | 1976-05-26 | 1977-11-30 | Hitachi Ltd | Alignment method of masks using special reference marks |
-
1978
- 1978-02-22 JP JP1844078A patent/JPS54111773A/en active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5215510A (en) * | 1975-07-28 | 1977-02-05 | Nippon Chemical Ind | Optical glass |
JPS52143772A (en) * | 1976-05-26 | 1977-11-30 | Hitachi Ltd | Alignment method of masks using special reference marks |
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