JPS5410826B1 - - Google Patents

Info

Publication number
JPS5410826B1
JPS5410826B1 JP8026971A JP8026971A JPS5410826B1 JP S5410826 B1 JPS5410826 B1 JP S5410826B1 JP 8026971 A JP8026971 A JP 8026971A JP 8026971 A JP8026971 A JP 8026971A JP S5410826 B1 JPS5410826 B1 JP S5410826B1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8026971A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS5410826B1 publication Critical patent/JPS5410826B1/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Length Measuring Devices By Optical Means (AREA)
JP8026971A 1970-10-15 1971-10-13 Pending JPS5410826B1 (enrdf_load_stackoverflow)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19702050590 DE2050590C2 (de) 1970-10-15 1970-10-15 Projektionseinrichtung

Publications (1)

Publication Number Publication Date
JPS5410826B1 true JPS5410826B1 (enrdf_load_stackoverflow) 1979-05-10

Family

ID=5785178

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8026971A Pending JPS5410826B1 (enrdf_load_stackoverflow) 1970-10-15 1971-10-13

Country Status (4)

Country Link
JP (1) JPS5410826B1 (enrdf_load_stackoverflow)
DE (1) DE2050590C2 (enrdf_load_stackoverflow)
FR (1) FR2109747A5 (enrdf_load_stackoverflow)
GB (1) GB1315256A (enrdf_load_stackoverflow)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2413551C2 (de) * 1974-03-21 1985-03-21 Western Electric Co., Inc., New York, N.Y. Einrichtung zum Korrigieren der Lage einer lichtempfindlichen Fläche in einer Masken-Projektionsvorrichtung
DE2460914C2 (de) * 1974-12-21 1983-08-18 Ibm Deutschland Gmbh, 7000 Stuttgart Photolithographische Projektionsvorrichtung
DE2633297A1 (de) * 1976-07-23 1978-01-26 Siemens Ag Verfahren zur automatischen justierung
FR2455298A1 (fr) * 1979-04-23 1980-11-21 Thomson Csf Dispositif illuminateur destine a fournir un faisceau d'eclairement divergent a partir d'une zone predeterminee d'un plan et systeme de transfert de motifs comprenant un tel dispositif
US6157497A (en) * 1993-06-30 2000-12-05 Nikon Corporation Exposure apparatus
US5729331A (en) 1993-06-30 1998-03-17 Nikon Corporation Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus
KR0143814B1 (ko) * 1995-03-28 1998-07-01 이대원 반도체 노광 장치
GB2333849B (en) * 1995-04-14 1999-10-06 Nikon Corp Exposure apparatus
JP3506158B2 (ja) * 1995-04-14 2004-03-15 株式会社ニコン 露光装置及び走査型露光装置、並びに走査露光方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1203115B (de) * 1964-11-20 1965-10-14 Agfa Gevaert Ag Belichtungsanordnung fuer Kopiergeraete
US3449049A (en) * 1966-01-14 1969-06-10 Ibm High resolution multiple image camera and method of fabricating integrated circuit masks

Also Published As

Publication number Publication date
DE2050590A1 (de) 1972-04-20
FR2109747A5 (enrdf_load_stackoverflow) 1972-05-26
GB1315256A (en) 1973-05-02
DE2050590C2 (de) 1982-06-16

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