GB1315256A - Projection of images - Google Patents

Projection of images

Info

Publication number
GB1315256A
GB1315256A GB4601271A GB4601271A GB1315256A GB 1315256 A GB1315256 A GB 1315256A GB 4601271 A GB4601271 A GB 4601271A GB 4601271 A GB4601271 A GB 4601271A GB 1315256 A GB1315256 A GB 1315256A
Authority
GB
United Kingdom
Prior art keywords
plate
image
plates
section
projection system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB4601271A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of GB1315256A publication Critical patent/GB1315256A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Length Measuring Devices By Optical Means (AREA)
GB4601271A 1970-10-15 1971-10-04 Projection of images Expired GB1315256A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19702050590 DE2050590C2 (de) 1970-10-15 1970-10-15 Projektionseinrichtung

Publications (1)

Publication Number Publication Date
GB1315256A true GB1315256A (en) 1973-05-02

Family

ID=5785178

Family Applications (1)

Application Number Title Priority Date Filing Date
GB4601271A Expired GB1315256A (en) 1970-10-15 1971-10-04 Projection of images

Country Status (4)

Country Link
JP (1) JPS5410826B1 (enrdf_load_stackoverflow)
DE (1) DE2050590C2 (enrdf_load_stackoverflow)
FR (1) FR2109747A5 (enrdf_load_stackoverflow)
GB (1) GB1315256A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2299408A (en) * 1995-03-28 1996-10-02 Samsung Aerospace Ind Light-exposing for a semiconductor device
GB2299867A (en) * 1995-04-14 1996-10-16 Nikon Corp Exposure apparatus
GB2333606A (en) * 1995-04-14 1999-07-28 Nikon Corp Exposure apparatus for printing a pattern from a mask on a substrate

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2413551C2 (de) * 1974-03-21 1985-03-21 Western Electric Co., Inc., New York, N.Y. Einrichtung zum Korrigieren der Lage einer lichtempfindlichen Fläche in einer Masken-Projektionsvorrichtung
DE2460914C2 (de) * 1974-12-21 1983-08-18 Ibm Deutschland Gmbh, 7000 Stuttgart Photolithographische Projektionsvorrichtung
DE2633297A1 (de) * 1976-07-23 1978-01-26 Siemens Ag Verfahren zur automatischen justierung
FR2455298A1 (fr) * 1979-04-23 1980-11-21 Thomson Csf Dispositif illuminateur destine a fournir un faisceau d'eclairement divergent a partir d'une zone predeterminee d'un plan et systeme de transfert de motifs comprenant un tel dispositif
US6157497A (en) * 1993-06-30 2000-12-05 Nikon Corporation Exposure apparatus
US5729331A (en) 1993-06-30 1998-03-17 Nikon Corporation Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1203115B (de) * 1964-11-20 1965-10-14 Agfa Gevaert Ag Belichtungsanordnung fuer Kopiergeraete
US3449049A (en) * 1966-01-14 1969-06-10 Ibm High resolution multiple image camera and method of fabricating integrated circuit masks

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2299408A (en) * 1995-03-28 1996-10-02 Samsung Aerospace Ind Light-exposing for a semiconductor device
GB2299408B (en) * 1995-03-28 1999-05-26 Samsung Aerospace Ind Light exposing device for manufacturing semiconductor device
GB2299867A (en) * 1995-04-14 1996-10-16 Nikon Corp Exposure apparatus
GB2333606A (en) * 1995-04-14 1999-07-28 Nikon Corp Exposure apparatus for printing a pattern from a mask on a substrate
GB2333606B (en) * 1995-04-14 1999-10-06 Nikon Corp Exposure apparatus
GB2299867B (en) * 1995-04-14 1999-10-13 Nikon Corp Exposure apparatus
US6388733B1 (en) 1995-04-14 2002-05-14 Nikon Corporation Exposure apparatus with an anti-vibration structure

Also Published As

Publication number Publication date
DE2050590A1 (de) 1972-04-20
FR2109747A5 (enrdf_load_stackoverflow) 1972-05-26
JPS5410826B1 (enrdf_load_stackoverflow) 1979-05-10
DE2050590C2 (de) 1982-06-16

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Legal Events

Date Code Title Description
PS Patent sealed
PCNP Patent ceased through non-payment of renewal fee