JPS5394772A - System for compressing data in charged beam exposing device - Google Patents

System for compressing data in charged beam exposing device

Info

Publication number
JPS5394772A
JPS5394772A JP880577A JP880577A JPS5394772A JP S5394772 A JPS5394772 A JP S5394772A JP 880577 A JP880577 A JP 880577A JP 880577 A JP880577 A JP 880577A JP S5394772 A JPS5394772 A JP S5394772A
Authority
JP
Japan
Prior art keywords
exposing device
charged beam
compressing data
beam exposing
compressing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP880577A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6221265B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html
Inventor
Masahiko Washimi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHO LSI GIJUTSU KENKYU KUMIAI
Original Assignee
CHO LSI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHO LSI GIJUTSU KENKYU KUMIAI filed Critical CHO LSI GIJUTSU KENKYU KUMIAI
Priority to JP880577A priority Critical patent/JPS5394772A/ja
Priority to US05/873,890 priority patent/US4151421A/en
Publication of JPS5394772A publication Critical patent/JPS5394772A/ja
Publication of JPS6221265B2 publication Critical patent/JPS6221265B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03M—CODING; DECODING; CODE CONVERSION IN GENERAL
    • H03M7/00—Conversion of a code where information is represented by a given sequence or number of digits to a code where the same, similar or subset of information is represented by a different sequence or number of digits
    • H03M7/30—Compression; Expansion; Suppression of unnecessary data, e.g. redundancy reduction
    • H03M7/46—Conversion to or from run-length codes, i.e. by representing the number of consecutive digits, or groups of digits, of the same kind by a code word and a digit indicative of that kind
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/302—Controlling tubes by external information, e.g. programme control
    • H01J37/3023—Programme control
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03M—CODING; DECODING; CODE CONVERSION IN GENERAL
    • H03M7/00—Conversion of a code where information is represented by a given sequence or number of digits to a code where the same, similar or subset of information is represented by a different sequence or number of digits
    • H03M7/30—Compression; Expansion; Suppression of unnecessary data, e.g. redundancy reduction
    • H03M7/40—Conversion to or from variable length codes, e.g. Shannon-Fano code, Huffman code, Morse code
    • H03M7/42—Conversion to or from variable length codes, e.g. Shannon-Fano code, Huffman code, Morse code using table look-up for the coding or decoding process, e.g. using read-only memory
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3175—Lithography
    • H01J2237/31761—Patterning strategy
    • H01J2237/31762—Computer and memory organisation

Landscapes

  • Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
  • Image Processing (AREA)
JP880577A 1977-01-31 1977-01-31 System for compressing data in charged beam exposing device Granted JPS5394772A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP880577A JPS5394772A (en) 1977-01-31 1977-01-31 System for compressing data in charged beam exposing device
US05/873,890 US4151421A (en) 1977-01-31 1978-01-31 Method for compressing pattern data and data compression processing circuit for radiant beam exposure apparatuses

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP880577A JPS5394772A (en) 1977-01-31 1977-01-31 System for compressing data in charged beam exposing device

Publications (2)

Publication Number Publication Date
JPS5394772A true JPS5394772A (en) 1978-08-19
JPS6221265B2 JPS6221265B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1987-05-12

Family

ID=11703048

Family Applications (1)

Application Number Title Priority Date Filing Date
JP880577A Granted JPS5394772A (en) 1977-01-31 1977-01-31 System for compressing data in charged beam exposing device

Country Status (2)

Country Link
US (1) US4151421A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JP (1) JPS5394772A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5630726A (en) * 1979-08-22 1981-03-27 Toshiba Corp Outputting device of exposure data
JP2009188000A (ja) * 2008-02-04 2009-08-20 Nuflare Technology Inc 描画装置及び描画データの変換方法

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5511303A (en) * 1978-07-10 1980-01-26 Chiyou Lsi Gijutsu Kenkyu Kumiai Electron-beam exposure device
JPS5577142A (en) * 1978-12-07 1980-06-10 Toshiba Corp Electron beam exposure apparatus
JPS5821422B2 (ja) * 1980-12-26 1983-04-30 株式会社東芝 荷電ビ−ム露光装置
DD203429A1 (de) * 1981-08-03 1983-10-19 Eichhorn Hans Guenther Schaltungsanordnung zur steuerung eines korpuskularstrahls
US4433384A (en) * 1981-10-05 1984-02-21 Varian Associates, Inc. Pattern data handling system for an electron beam exposure system
US6123288A (en) * 1985-04-16 2000-09-26 Kenyon; Bruce Allen Apparatus and method for flickerless projection of infrared scenes
JP3043031B2 (ja) * 1990-06-01 2000-05-22 富士通株式会社 露光データ作成方法，パターン露光装置及びパターン露光方法
JPH04162710A (ja) * 1990-10-26 1992-06-08 Fujitsu Ltd 電子ビーム露光装置
US8010704B2 (en) * 2008-05-29 2011-08-30 GM Global Technology Operations LLC Method of efficient compression for measurement data
US8327027B2 (en) * 2008-06-03 2012-12-04 Bryan Smith Data compression system and method
JP6555619B2 (ja) * 2014-06-13 2019-08-07 インテル・コーポレーション 電子ビームスループットのためのデータ削減
JP6522662B2 (ja) * 2014-06-13 2019-05-29 インテル・コーポレーション 電子ビームによる一方向の層上金属
WO2016105422A1 (en) 2014-12-24 2016-06-30 Intel Corporation Structure and method to self align via to top and bottom of tight pitch metal interconnect layers

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3900737A (en) * 1974-04-18 1975-08-19 Bell Telephone Labor Inc Electron beam exposure system

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5630726A (en) * 1979-08-22 1981-03-27 Toshiba Corp Outputting device of exposure data
JP2009188000A (ja) * 2008-02-04 2009-08-20 Nuflare Technology Inc 描画装置及び描画データの変換方法

Also Published As

Publication number Publication date
JPS6221265B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1987-05-12
US4151421A (en) 1979-04-24

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