JPS5383986A - Sputtering apparatus - Google Patents

Sputtering apparatus

Info

Publication number
JPS5383986A
JPS5383986A JP16029376A JP16029376A JPS5383986A JP S5383986 A JPS5383986 A JP S5383986A JP 16029376 A JP16029376 A JP 16029376A JP 16029376 A JP16029376 A JP 16029376A JP S5383986 A JPS5383986 A JP S5383986A
Authority
JP
Japan
Prior art keywords
sputtering apparatus
scatters
wafer
zone
treated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16029376A
Other languages
Japanese (ja)
Inventor
Toshihiko Ono
Kazuo Tanaka
Kenichi Imai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP16029376A priority Critical patent/JPS5383986A/en
Publication of JPS5383986A publication Critical patent/JPS5383986A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:To increase sharply the number of material which are treated at a time by passing at a constant rate the material such as Si wafer to be coated with a layer successively through a zone where coating material such as Pt scatters.
JP16029376A 1976-12-29 1976-12-29 Sputtering apparatus Pending JPS5383986A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16029376A JPS5383986A (en) 1976-12-29 1976-12-29 Sputtering apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16029376A JPS5383986A (en) 1976-12-29 1976-12-29 Sputtering apparatus

Publications (1)

Publication Number Publication Date
JPS5383986A true JPS5383986A (en) 1978-07-24

Family

ID=15711835

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16029376A Pending JPS5383986A (en) 1976-12-29 1976-12-29 Sputtering apparatus

Country Status (1)

Country Link
JP (1) JPS5383986A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5544179A (en) * 1978-08-01 1980-03-28 Kelsey Hayes Co Friction pad assembly of sliding caliper type disc brake

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5544179A (en) * 1978-08-01 1980-03-28 Kelsey Hayes Co Friction pad assembly of sliding caliper type disc brake
JPS6246736B2 (en) * 1978-08-01 1987-10-05 Kelsey Hayes Co

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