JPS5381095A - Thin film formation method of semiconductor integrated circuit - Google Patents

Thin film formation method of semiconductor integrated circuit

Info

Publication number
JPS5381095A
JPS5381095A JP15835776A JP15835776A JPS5381095A JP S5381095 A JPS5381095 A JP S5381095A JP 15835776 A JP15835776 A JP 15835776A JP 15835776 A JP15835776 A JP 15835776A JP S5381095 A JPS5381095 A JP S5381095A
Authority
JP
Japan
Prior art keywords
integrated circuit
semiconductor integrated
thin film
film formation
formation method
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15835776A
Other languages
Japanese (ja)
Inventor
Yukio Yasuda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP15835776A priority Critical patent/JPS5381095A/en
Publication of JPS5381095A publication Critical patent/JPS5381095A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To achieve the improvement in the accuracy of thin-film patterns and the prevention of step-cutting of metal wirings by selectively forming specified films such as of thin-films for metal wirings, insulation films, semiconductor films on a semiconductor integrated circuit surface and removing unevenness by keeping the plane structure of integrated circuits.
COPYRIGHT: (C)1978,JPO&Japio
JP15835776A 1976-12-27 1976-12-27 Thin film formation method of semiconductor integrated circuit Pending JPS5381095A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15835776A JPS5381095A (en) 1976-12-27 1976-12-27 Thin film formation method of semiconductor integrated circuit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15835776A JPS5381095A (en) 1976-12-27 1976-12-27 Thin film formation method of semiconductor integrated circuit

Publications (1)

Publication Number Publication Date
JPS5381095A true JPS5381095A (en) 1978-07-18

Family

ID=15669889

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15835776A Pending JPS5381095A (en) 1976-12-27 1976-12-27 Thin film formation method of semiconductor integrated circuit

Country Status (1)

Country Link
JP (1) JPS5381095A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59177919A (en) * 1983-03-28 1984-10-08 Nippon Telegr & Teleph Corp <Ntt> Selective growth of thin film
CN111868809A (en) * 2018-03-28 2020-10-30 夏普株式会社 Display device and method for manufacturing display device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59177919A (en) * 1983-03-28 1984-10-08 Nippon Telegr & Teleph Corp <Ntt> Selective growth of thin film
CN111868809A (en) * 2018-03-28 2020-10-30 夏普株式会社 Display device and method for manufacturing display device

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