JPS5376756A - Production of photo mask - Google Patents
Production of photo maskInfo
- Publication number
- JPS5376756A JPS5376756A JP15204476A JP15204476A JPS5376756A JP S5376756 A JPS5376756 A JP S5376756A JP 15204476 A JP15204476 A JP 15204476A JP 15204476 A JP15204476 A JP 15204476A JP S5376756 A JPS5376756 A JP S5376756A
- Authority
- JP
- Japan
- Prior art keywords
- photo mask
- production
- defects
- averting
- flaws
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
PURPOSE: To make a photo mask by averting the appearance of defects even if original plates having stains, flaws and other defects are used.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15204476A JPS5376756A (en) | 1976-12-20 | 1976-12-20 | Production of photo mask |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15204476A JPS5376756A (en) | 1976-12-20 | 1976-12-20 | Production of photo mask |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5376756A true JPS5376756A (en) | 1978-07-07 |
Family
ID=15531820
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15204476A Pending JPS5376756A (en) | 1976-12-20 | 1976-12-20 | Production of photo mask |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5376756A (en) |
-
1976
- 1976-12-20 JP JP15204476A patent/JPS5376756A/en active Pending
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