JPS5365659A - Semiconductor heat diffusion device - Google Patents

Semiconductor heat diffusion device

Info

Publication number
JPS5365659A
JPS5365659A JP14168576A JP14168576A JPS5365659A JP S5365659 A JPS5365659 A JP S5365659A JP 14168576 A JP14168576 A JP 14168576A JP 14168576 A JP14168576 A JP 14168576A JP S5365659 A JPS5365659 A JP S5365659A
Authority
JP
Japan
Prior art keywords
heat diffusion
diffusion device
semiconductor heat
dispersion
reduce
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14168576A
Other languages
Japanese (ja)
Inventor
Yasuyoshi Kawase
Yoshiaki Yadoiwa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP14168576A priority Critical patent/JPS5365659A/en
Publication of JPS5365659A publication Critical patent/JPS5365659A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To reduce the dispersion of the concentration of the impurities which are introduced into the furnace core tube, and thus to reduce the dispersion for the diffusion layer resistance or the junction depth, by constituting the bubble generator part of the liquid diffusion source with a porous material.
COPYRIGHT: (C)1978,JPO&Japio
JP14168576A 1976-11-24 1976-11-24 Semiconductor heat diffusion device Pending JPS5365659A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14168576A JPS5365659A (en) 1976-11-24 1976-11-24 Semiconductor heat diffusion device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14168576A JPS5365659A (en) 1976-11-24 1976-11-24 Semiconductor heat diffusion device

Publications (1)

Publication Number Publication Date
JPS5365659A true JPS5365659A (en) 1978-06-12

Family

ID=15297820

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14168576A Pending JPS5365659A (en) 1976-11-24 1976-11-24 Semiconductor heat diffusion device

Country Status (1)

Country Link
JP (1) JPS5365659A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4761300A (en) * 1983-06-29 1988-08-02 Stauffer Chemical Company Method of vacuum depostion of pnictide films on a substrate using a pnictide bubbler and a sputterer
CN102392307A (en) * 2011-11-29 2012-03-28 湖南红太阳光电科技有限公司 Thermostatic device for solar cell diffusion source phosphorous oxychloride
CN103103616A (en) * 2013-01-17 2013-05-15 陈功 Improvement structure of phosphorus oxychloride remover of phosphorus diffusion furnace
CN103103619A (en) * 2013-01-17 2013-05-15 陈功 Buffer tank of phosphorus diffusion furnace exhaust tube

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4761300A (en) * 1983-06-29 1988-08-02 Stauffer Chemical Company Method of vacuum depostion of pnictide films on a substrate using a pnictide bubbler and a sputterer
CN102392307A (en) * 2011-11-29 2012-03-28 湖南红太阳光电科技有限公司 Thermostatic device for solar cell diffusion source phosphorous oxychloride
CN103103616A (en) * 2013-01-17 2013-05-15 陈功 Improvement structure of phosphorus oxychloride remover of phosphorus diffusion furnace
CN103103619A (en) * 2013-01-17 2013-05-15 陈功 Buffer tank of phosphorus diffusion furnace exhaust tube

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