JPS5365659A - Semiconductor heat diffusion device - Google Patents
Semiconductor heat diffusion deviceInfo
- Publication number
- JPS5365659A JPS5365659A JP14168576A JP14168576A JPS5365659A JP S5365659 A JPS5365659 A JP S5365659A JP 14168576 A JP14168576 A JP 14168576A JP 14168576 A JP14168576 A JP 14168576A JP S5365659 A JPS5365659 A JP S5365659A
- Authority
- JP
- Japan
- Prior art keywords
- heat diffusion
- diffusion device
- semiconductor heat
- dispersion
- reduce
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE: To reduce the dispersion of the concentration of the impurities which are introduced into the furnace core tube, and thus to reduce the dispersion for the diffusion layer resistance or the junction depth, by constituting the bubble generator part of the liquid diffusion source with a porous material.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14168576A JPS5365659A (en) | 1976-11-24 | 1976-11-24 | Semiconductor heat diffusion device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14168576A JPS5365659A (en) | 1976-11-24 | 1976-11-24 | Semiconductor heat diffusion device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5365659A true JPS5365659A (en) | 1978-06-12 |
Family
ID=15297820
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14168576A Pending JPS5365659A (en) | 1976-11-24 | 1976-11-24 | Semiconductor heat diffusion device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5365659A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4761300A (en) * | 1983-06-29 | 1988-08-02 | Stauffer Chemical Company | Method of vacuum depostion of pnictide films on a substrate using a pnictide bubbler and a sputterer |
CN102392307A (en) * | 2011-11-29 | 2012-03-28 | 湖南红太阳光电科技有限公司 | Thermostatic device for solar cell diffusion source phosphorous oxychloride |
CN103103616A (en) * | 2013-01-17 | 2013-05-15 | 陈功 | Improvement structure of phosphorus oxychloride remover of phosphorus diffusion furnace |
CN103103619A (en) * | 2013-01-17 | 2013-05-15 | 陈功 | Buffer tank of phosphorus diffusion furnace exhaust tube |
-
1976
- 1976-11-24 JP JP14168576A patent/JPS5365659A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4761300A (en) * | 1983-06-29 | 1988-08-02 | Stauffer Chemical Company | Method of vacuum depostion of pnictide films on a substrate using a pnictide bubbler and a sputterer |
CN102392307A (en) * | 2011-11-29 | 2012-03-28 | 湖南红太阳光电科技有限公司 | Thermostatic device for solar cell diffusion source phosphorous oxychloride |
CN103103616A (en) * | 2013-01-17 | 2013-05-15 | 陈功 | Improvement structure of phosphorus oxychloride remover of phosphorus diffusion furnace |
CN103103619A (en) * | 2013-01-17 | 2013-05-15 | 陈功 | Buffer tank of phosphorus diffusion furnace exhaust tube |
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