JPS5364676A - Treating apparatus in gas phase - Google Patents
Treating apparatus in gas phaseInfo
- Publication number
- JPS5364676A JPS5364676A JP13957676A JP13957676A JPS5364676A JP S5364676 A JPS5364676 A JP S5364676A JP 13957676 A JP13957676 A JP 13957676A JP 13957676 A JP13957676 A JP 13957676A JP S5364676 A JPS5364676 A JP S5364676A
- Authority
- JP
- Japan
- Prior art keywords
- gas phase
- treating apparatus
- uniform
- make
- treating chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Physical Or Chemical Processes And Apparatus (AREA)
- Chemical Vapour Deposition (AREA)
- Drying Of Semiconductors (AREA)
Abstract
PURPOSE: To make gas circulation at each part in a treating chamber uniform so as to make treating effect for material to be treated uniform by installing plural gas feeeding holes at nearly symmetrical position on both sides of inside wall of cylindrical treating chamber along the bus bar.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13957676A JPS5364676A (en) | 1976-11-22 | 1976-11-22 | Treating apparatus in gas phase |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13957676A JPS5364676A (en) | 1976-11-22 | 1976-11-22 | Treating apparatus in gas phase |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5364676A true JPS5364676A (en) | 1978-06-09 |
Family
ID=15248468
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13957676A Pending JPS5364676A (en) | 1976-11-22 | 1976-11-22 | Treating apparatus in gas phase |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5364676A (en) |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5717134A (en) * | 1980-07-04 | 1982-01-28 | Kokusai Electric Co Ltd | Device for decompression and reaction |
JPS5956576A (en) * | 1982-08-27 | 1984-04-02 | Yokogawa Hewlett Packard Ltd | Formation of thin film |
JPS5969494A (en) * | 1982-10-14 | 1984-04-19 | Ulvac Corp | Reaction and treatment apparatus for low pressure gas or vapor |
JPS6010715A (en) * | 1983-06-30 | 1985-01-19 | Fujitsu Ltd | Device for chemical gas-phase growth |
JPS6033352A (en) * | 1983-08-02 | 1985-02-20 | Kokusai Electric Co Ltd | Vacuum cvd apparatus |
JPS60219747A (en) * | 1984-04-16 | 1985-11-02 | Plasma Syst:Kk | Controlling method for vacuum degree in treatment chamber of semiconductor production equipment and device therefor |
JPS60243272A (en) * | 1984-05-04 | 1985-12-03 | アニコン・インコーポレーテツド | Chemically vapor deposition wafer boat |
JPS6144179A (en) * | 1984-07-06 | 1986-03-03 | アニコン・インコ−ポレ−テツド | Chemical vapor deposition wafer boat |
-
1976
- 1976-11-22 JP JP13957676A patent/JPS5364676A/en active Pending
Cited By (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5717134A (en) * | 1980-07-04 | 1982-01-28 | Kokusai Electric Co Ltd | Device for decompression and reaction |
JPS5956576A (en) * | 1982-08-27 | 1984-04-02 | Yokogawa Hewlett Packard Ltd | Formation of thin film |
JPS5969494A (en) * | 1982-10-14 | 1984-04-19 | Ulvac Corp | Reaction and treatment apparatus for low pressure gas or vapor |
JPS631388B2 (en) * | 1982-10-14 | 1988-01-12 | Ulvac Corp | |
JPS6010715A (en) * | 1983-06-30 | 1985-01-19 | Fujitsu Ltd | Device for chemical gas-phase growth |
JPH0241166B2 (en) * | 1983-06-30 | 1990-09-14 | Fujitsu Ltd | |
JPS6033352A (en) * | 1983-08-02 | 1985-02-20 | Kokusai Electric Co Ltd | Vacuum cvd apparatus |
JPS60219747A (en) * | 1984-04-16 | 1985-11-02 | Plasma Syst:Kk | Controlling method for vacuum degree in treatment chamber of semiconductor production equipment and device therefor |
JPS60243272A (en) * | 1984-05-04 | 1985-12-03 | アニコン・インコーポレーテツド | Chemically vapor deposition wafer boat |
JPS6257709B2 (en) * | 1984-05-04 | 1987-12-02 | Anicon Inc | |
JPS6144179A (en) * | 1984-07-06 | 1986-03-03 | アニコン・インコ−ポレ−テツド | Chemical vapor deposition wafer boat |
JPS6260466B2 (en) * | 1984-07-06 | 1987-12-16 | Anicon Inc |
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